JPS6311728Y2 - - Google Patents
Info
- Publication number
- JPS6311728Y2 JPS6311728Y2 JP1983092975U JP9297583U JPS6311728Y2 JP S6311728 Y2 JPS6311728 Y2 JP S6311728Y2 JP 1983092975 U JP1983092975 U JP 1983092975U JP 9297583 U JP9297583 U JP 9297583U JP S6311728 Y2 JPS6311728 Y2 JP S6311728Y2
- Authority
- JP
- Japan
- Prior art keywords
- case
- photomask
- lid
- mask
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000059 patterning Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 6
- 239000011651 chromium Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Packaging For Recording Disks (AREA)
- Packaging Frangible Articles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983092975U JPS60923U (ja) | 1983-06-17 | 1983-06-17 | マスクケ−ス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983092975U JPS60923U (ja) | 1983-06-17 | 1983-06-17 | マスクケ−ス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60923U JPS60923U (ja) | 1985-01-07 |
| JPS6311728Y2 true JPS6311728Y2 (de) | 1988-04-05 |
Family
ID=30223482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1983092975U Granted JPS60923U (ja) | 1983-06-17 | 1983-06-17 | マスクケ−ス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60923U (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4276195B2 (ja) * | 2005-03-04 | 2009-06-10 | Tdk株式会社 | 基板の保管方法及びコイル部品の製造方法 |
-
1983
- 1983-06-17 JP JP1983092975U patent/JPS60923U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60923U (ja) | 1985-01-07 |
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