JPS6312937B2 - - Google Patents

Info

Publication number
JPS6312937B2
JPS6312937B2 JP59262388A JP26238884A JPS6312937B2 JP S6312937 B2 JPS6312937 B2 JP S6312937B2 JP 59262388 A JP59262388 A JP 59262388A JP 26238884 A JP26238884 A JP 26238884A JP S6312937 B2 JPS6312937 B2 JP S6312937B2
Authority
JP
Japan
Prior art keywords
plastic film
deposited
film
evaporation
melted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59262388A
Other languages
Japanese (ja)
Other versions
JPS61139661A (en
Inventor
Yasuzumi Oki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Reiko Co Ltd
Original Assignee
Reiko Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Reiko Co Ltd filed Critical Reiko Co Ltd
Priority to JP26238884A priority Critical patent/JPS61139661A/en
Publication of JPS61139661A publication Critical patent/JPS61139661A/en
Publication of JPS6312937B2 publication Critical patent/JPS6312937B2/ja
Granted legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は真空蒸着方法に関し、詳細にはプラ
スチツクフイルム、金属板等の被蒸着物表面への
蒸着材の蒸着において、被蒸着物と蒸着膜との密
着力の極めて強いものを得ることができる真空蒸
着方法に係るものである。
Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a vacuum evaporation method, and more specifically, in the evaporation of a evaporation material onto the surface of an evaporation target such as a plastic film or a metal plate, the evaporation process is carried out between the evaporation target and the evaporation film. The invention relates to a vacuum evaporation method that can provide extremely strong adhesion to the substrate.

(従来の技術とその問題点) プラスチツクフイルム、金属板等の被蒸着物の
表面にAl等各種の金属をあるいはその他の蒸着
材を蒸着する場合に、例えばプラスチツクフイル
ムと蒸着膜との密着力を向上さすために、プラス
チツクフイルムにあらかじめアンダーコート層を
設けたり、プラスチツクフイルム表面をコロナ放
電処理したりしている。しかしこれらの方法によ
つてもプラスチツクフイルムと蒸着膜との界面で
は両者は接触しているにすぎず、あるいは蒸着材
の原子が強くプラスチツクフイルムにあたるとき
でもせいぜい原子がプラスチツクフイルムにある
程度くいこんでいるにすぎない。従つて蒸着膜の
プラスチツクフイルムとの密着力には大きな限界
があり、蒸着膜の密着力は常に問題となつてい
る。また、金属板等への蒸着にはあらかじめ脱脂
処理等をしているが、蒸着膜の密着力に関しては
プラスチツクフイルムの場合と同様である。
(Prior art and its problems) When depositing various metals such as Al or other deposition materials on the surface of an object to be deposited such as a plastic film or a metal plate, for example, it is necessary to improve the adhesion between the plastic film and the deposited film. In order to improve the performance, an undercoat layer is provided on the plastic film in advance, or the surface of the plastic film is subjected to corona discharge treatment. However, even with these methods, the plastic film and the evaporated film are only in contact with each other at the interface, or even when the atoms of the evaporation material strongly hit the plastic film, at most the atoms are wedged into the plastic film to some extent. It's nothing more than that. Therefore, there is a large limit to the adhesion of the vapor-deposited film to the plastic film, and the adhesion of the vapor-deposited film is always a problem. Furthermore, although a degreasing treatment or the like is performed beforehand for vapor deposition on a metal plate, etc., the adhesion of the vapor-deposited film is similar to that of a plastic film.

(問題点を解決するための手段) この発明は、プラスチツクフイルム、金属板等
の被蒸着物の表面に蒸着材を蒸着するに際し、プ
ラスチツクフイルム、金属板等の被蒸着物の表面
をレーザー光により融解させながら蒸着材を蒸着
することを特徴とする真空蒸着方法である。以
下、被蒸着物としてプラスチツクフイルムをピツ
クアツプし、この発明を詳細に説明する。むろ
ん、プラスチツクフイルム以外でも、レーザー光
により表面を融解させることができる被蒸着物で
あれば、プラスチツクフイルムにかえて使用でき
るものである。
(Means for Solving the Problems) This invention provides a method for depositing a deposition material onto the surface of an object to be deposited such as a plastic film or a metal plate using a laser beam. This is a vacuum deposition method characterized by depositing a deposition material while melting it. Hereinafter, the present invention will be explained in detail by picking up a plastic film as an object to be deposited. Of course, other than plastic film, any material to be deposited whose surface can be melted by laser light can be used instead of plastic film.

プラスチツクフイルムは表面のみをレーザー光
により融解させる。プラスチツクフイルムの膜厚
方向において蒸着膜の密着力に関係するのはプラ
スチツクフイルムの表面だからである。プラスチ
ツクフイルムの表面のみを融解させることはま
た、プラスチツクフイルム全体に熱による歪みを
与えないためにも必要である。プラスチツクフイ
ルムの表面をどの程度の深さまで融解させるかに
ついては、プラスチツクフイルムの種類やその厚
さにより異なるが一般的にはÅ(オングストロー
ム)〜μm(マイクロメートル)の単位である。
Only the surface of plastic film is melted using laser light. This is because it is the surface of the plastic film that is related to the adhesion of the deposited film in the thickness direction of the plastic film. Melting only the surface of the plastic film is also necessary to avoid thermal distortion of the entire plastic film. The depth to which the surface of the plastic film is melted varies depending on the type of plastic film and its thickness, but is generally on the order of angstroms (Å) to micrometers (μm).

プラスチツクフイルムの表面をレーザー光によ
り融解させながら蒸着材を蒸着すると、蒸着材の
蒸発した原子はその融解した部分に付着すること
になるから、プラスチツクフイルムと蒸着材の蒸
発した原子を融着させることになり、プラスチツ
クフイルムと蒸着材の原子とが一体化し、密着力
が非常に強固になるものである。
When the evaporation material is evaporated while the surface of the plastic film is melted by laser light, the evaporated atoms of the evaporation material will adhere to the melted part, so it is possible to fuse the evaporation atoms of the plastic film and the evaporation material. As a result, the plastic film and the atoms of the vapor deposition material become integrated, resulting in extremely strong adhesion.

蒸着中にプラスチツクフイルムの表面のみを融
解させることは、レーザー光を利用することによ
り初めてなし得たことである。レーザー光による
以外に、蒸着中のプラスチツクフイルムの表面を
融解させることができれば、何もレーザー光を利
用する必要はないが、現在のところは他の方法は
見当らない。レーザー光をあてる位置や角度、強
さなどは具体的に使用するプラスチツクフイルム
や蒸着材の種類により制御すればよい。
Melting only the surface of plastic film during vapor deposition was achieved for the first time by using laser light. If the surface of the plastic film being deposited can be melted other than by laser light, there is no need to use laser light at all, but there is no other method available at present. The position, angle, intensity, etc. of the laser beam may be controlled depending on the type of plastic film or vapor deposition material used.

この発明は、長尺なプラスチツクフイルムに連
続的又は半連続的に蒸着する場合にも、非長尺な
プラスチツクフイルムに蒸着する場合にも使用で
きる。また、この発明はレーザー光の制御によ
り、プラスチツクフイルムでない被蒸着物に蒸着
する場合にも使用でき、さらには、フイルム状で
ない被蒸着物に蒸着する場合にも使用できるのは
もちろんである。
The present invention can be used for continuous or semi-continuous deposition on long plastic films, as well as for non-long plastic film deposition. Furthermore, by controlling laser light, the present invention can be used for vapor deposition on objects other than plastic films, and can of course also be used for vapor deposition on objects other than film-like objects.

(発明の効果) この発明は以上説明した通りであるから、プラ
スチツクフイルムを例にとれば、蒸着時にプラス
チツクフイルムの表面が融解しており、その結果
そこに付着した蒸着材の原子とプラスチツクフイ
ルムの表面とが融着一体となり、極めて密着力の
強い蒸着膜をプラスチツクフイルムの表面に形成
させることができるものである。
(Effects of the Invention) Since the present invention has been explained above, taking a plastic film as an example, the surface of the plastic film is melted during vapor deposition, and as a result, the atoms of the vapor deposition material adhering thereto are separated from the plastic film. The plastic film can be fused to the surface of the plastic film to form a vapor deposited film with extremely strong adhesion.

Claims (1)

【特許請求の範囲】[Claims] 1 プラスチツクフイルム、金属板等の被蒸着物
の表面に蒸着材を蒸着するに際し、プラスチツク
フイルム、金属板等の被蒸着物の表面をレーザー
光により融解させながら蒸着材を蒸着することを
特徴とする真空蒸着方法。
1. When depositing a deposition material on the surface of an object to be deposited such as a plastic film or a metal plate, the material is deposited while melting the surface of the object to be deposited such as a plastic film or metal plate with a laser beam. Vacuum deposition method.
JP26238884A 1984-12-11 1984-12-11 Vacuum deposition method Granted JPS61139661A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26238884A JPS61139661A (en) 1984-12-11 1984-12-11 Vacuum deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26238884A JPS61139661A (en) 1984-12-11 1984-12-11 Vacuum deposition method

Publications (2)

Publication Number Publication Date
JPS61139661A JPS61139661A (en) 1986-06-26
JPS6312937B2 true JPS6312937B2 (en) 1988-03-23

Family

ID=17375065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26238884A Granted JPS61139661A (en) 1984-12-11 1984-12-11 Vacuum deposition method

Country Status (1)

Country Link
JP (1) JPS61139661A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100311796B1 (en) * 1997-12-20 2001-11-15 이구택 Manufacturing method of iron vapor deposition alloyed hot dip galvanized steel sheet

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5782475A (en) * 1980-11-12 1982-05-22 Toshiba Corp Dry etching method

Also Published As

Publication number Publication date
JPS61139661A (en) 1986-06-26

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