JPS63138730U - - Google Patents

Info

Publication number
JPS63138730U
JPS63138730U JP3162687U JP3162687U JPS63138730U JP S63138730 U JPS63138730 U JP S63138730U JP 3162687 U JP3162687 U JP 3162687U JP 3162687 U JP3162687 U JP 3162687U JP S63138730 U JPS63138730 U JP S63138730U
Authority
JP
Japan
Prior art keywords
varicap
tuning
connect
coupling capacitor
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3162687U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3162687U priority Critical patent/JPS63138730U/ja
Publication of JPS63138730U publication Critical patent/JPS63138730U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Channel Selection Circuits, Automatic Tuning Circuits (AREA)
  • Superheterodyne Receivers (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)

Description

【図面の簡単な説明】
第１図は本考案の一実施例を示す電気回路図、
第２図は他の実施例を示す電気回路図、第３図は
さらに他の実施例を示す電気回路図、第４図は従
来例を示す電気回路図である。 Ｑｏ……発振用トランジスタ、ＤＴ……同調用
バリキヤツプダイオード、ＣＤ……バリキヤツプ
結合コンデンサ、ＲＴ……バリキヤツプバイアス
抵抗、ＬＨ，ＬＬ……同調コイル、ＢＶ……電源
電圧供給端子、ＶＴ……同調電圧供給端子、ＢＨ
……ハイチヤンネル選択電圧供給端子、ＢＬ……
ローチヤンネル選択電圧供給端子。

Claims (1)

    【実用新案登録請求の範囲】
  1. 発振回路に固定の電源電圧を供給し、中間接続
    点にバリキヤツプバイアス抵抗が接続される同調
    用バリキヤツプダイオードとバリキヤツプ結合コ
    ンデンサの直列回路を、バリキヤツプ結合コンデ
    ンサ側を接地して接続するとともに、同調用コイ
    ルの一端を接地して前記同調用バリキヤツプダイ
    オードの放電回路を形成したことを特徴とするチ
    ユーナの局部発振回路。
JP3162687U 1987-03-03 1987-03-03 Pending JPS63138730U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3162687U JPS63138730U (ja) 1987-03-03 1987-03-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3162687U JPS63138730U (ja) 1987-03-03 1987-03-03

Publications (1)

Publication Number Publication Date
JPS63138730U true JPS63138730U (ja) 1988-09-13

Family

ID=30837536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3162687U Pending JPS63138730U (ja) 1987-03-03 1987-03-03

Country Status (1)

Country Link
JP (1) JPS63138730U (ja)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6986975B2 (en) 2000-07-16 2006-01-17 Board Of Regents, The University Of Texas System Method of aligning a template with a substrate employing moire patterns
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7432634B2 (en) 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US9223202B2 (en) 2000-07-17 2015-12-29 Board Of Regents, The University Of Texas System Method of automatic fluid dispensing for imprint lithography processes

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7098572B2 (en) 1999-10-29 2006-08-29 Board Of Regents, The University Of Texas System Apparatus to control displacement of a body spaced-apart from a surface
US6986975B2 (en) 2000-07-16 2006-01-17 Board Of Regents, The University Of Texas System Method of aligning a template with a substrate employing moire patterns
US7303383B1 (en) 2000-07-16 2007-12-04 Board Of Regents, The University Of Texas System Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
US9223202B2 (en) 2000-07-17 2015-12-29 Board Of Regents, The University Of Texas System Method of automatic fluid dispensing for imprint lithography processes
US7432634B2 (en) 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices

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