JPS6320668B2 - - Google Patents
Info
- Publication number
- JPS6320668B2 JPS6320668B2 JP59092778A JP9277884A JPS6320668B2 JP S6320668 B2 JPS6320668 B2 JP S6320668B2 JP 59092778 A JP59092778 A JP 59092778A JP 9277884 A JP9277884 A JP 9277884A JP S6320668 B2 JPS6320668 B2 JP S6320668B2
- Authority
- JP
- Japan
- Prior art keywords
- cutting edge
- knife
- polishing
- ultramicrotome
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Sampling And Sample Adjustment (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、人工のサフアイヤ単結晶からなる超
ミクロトーム用ナイフの製作法、特にその仕上げ
研磨法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a knife for an ultramicrotome made of an artificial single crystal of sapphire, and particularly to a method for final polishing the knife.
現在超ミクロトーム用ナイフとしては、ダイヤ
モンドナイフ及び硝子製ナイフが主として使用さ
れている。前者は品質的には問題がないが、価格
の点と製作技術者が少なく入手困難であることに
難点があり、後者は安価であるが、寿命が短く、
且つその都度実験者が自らナイフを製作せねばな
らない欠点がある。これらの欠点を除去すべく近
年人工のサフアイヤ単結晶を素材として超ミクロ
トーム用ナイフが開発され市販されている(特開
昭57−46141号公報)。
Currently, diamond knives and glass knives are mainly used as knives for ultramicrotomes. The former has no problems in terms of quality, but it has the disadvantages of price and the fact that there are few manufacturing engineers and it is difficult to obtain.The latter is cheap, but has a short lifespan.
Another drawback is that the experimenter must make his own knife each time. In order to eliminate these drawbacks, a knife for an ultramicrotome has recently been developed and commercially available using artificial sapphire single crystal as a material (Japanese Patent Laid-Open No. 57-46141).
その製作法の要点は、高品質の人工サフアイヤ
単結晶を素材として超ミクロトーム用ナイフの刃
先を構成する2面には、低指数面、例えば(11
00)を以てし、ダイヤモンド工具を用いてナイフ
を造形・研磨し、次いでシリカ微粒子をラツプ材
として所謂機械化学研磨(メカノケミカルポリシ
ング)し、次いで燐酸水溶液を用い320℃で10分
間化学研磨(ケミカルポリシング)して製作する
方法である。 The key point of the manufacturing method is that the two surfaces that make up the cutting edge of the ultramicrotome knife, which is made of high-quality artificial sapphire single crystal, have low index surfaces, such as (11
00), the knife is shaped and polished using a diamond tool, then so-called mechanochemical polishing (mechanochemical polishing) is performed using fine silica particles as a wrapping material, and then chemical polishing (chemical polishing) is performed at 320°C for 10 minutes using an aqueous phosphoric acid solution. ).
このサフアイヤナイフでエポキシ樹脂で包埋さ
れた生物組織のブロツを薄切りする時、所謂シル
バーの厚さ(600〜900Åの厚さ)の超薄切片が得
られる。 When a blot of biological tissue embedded in epoxy resin is sliced with this saphire knife, ultrathin sections with a so-called silver thickness (600 to 900 Å thick) are obtained.
この超薄切片を透過型電子顕微鏡で詳しく観察
する時、チヤターと称せられる刃の進行方向と直
角に入る縞模様のビビリ現象によると思われる縞
模様の欠陥、又はスダレ状メスマークと称される
刃の進行方向と平行に生じ特に赤血球等によく見
られるスジ状の小さい傷の現れる頻度が、名人芸
で仕上げられた極上品質のダイヤモンドナイフに
よつて得られる超薄切片に比較してやや多く、こ
れらの点において見劣りする。 When this ultra-thin section is closely observed with a transmission electron microscope, defects in the striped pattern, which is thought to be due to the chattering phenomenon of the striped pattern perpendicular to the direction of blade movement, called chatter, or the blade edge called a sag-like scalpel mark are observed. The frequency of small streak-like scratches that occur parallel to the direction of movement of red blood cells, which are often seen in red blood cells, is slightly higher than in ultra-thin sections obtained with an expertly finished diamond knife of the highest quality. It is inferior in this respect.
このような現象の見られる原因は、サフアイヤ
ナイフの製造工程で化学薬品によつてサフアイヤ
を溶解させる所謂化学研磨を行うため刃先の先端
の丸み半径がある限度で平衡に達し、この丸み半
径は最高品質のダイヤモンドナイフのそれに比べ
て大きいためであると思われる。 The reason for this phenomenon is that during the manufacturing process of sapphire knives, so-called chemical polishing is performed to dissolve the sapphire using chemicals, so the rounding radius of the tip of the cutting edge reaches an equilibrium within a certain limit, and this rounding radius This seems to be because it is larger than that of the highest quality diamond knife.
本発明の目的は、サフアイヤナイフの刃先を損
なうことなく刃先の丸み半径をより小さくするた
めの研磨仕上げ方法を提供することである。
An object of the present invention is to provide a polishing method for reducing the rounding radius of the cutting edge of a sapphire knife without damaging the cutting edge.
即ち、本発明は、人工のサフアイヤ単結晶を素
材とした超ミクロトーム用ナイフを研磨材微粒子
を懸濁した溶液中で球状又は円柱状の弾性体を刃
先の直後の面に近接た状態において刃先に向けて
回転せしめ、研磨材微粒子を研磨面に平行に刃先
の背後から滑らせて、刃先形成面の少なくとも一
面を弾性放出研磨するこにより刃先の丸み半径を
小とする仕上研磨に付すことを特徴とする超ミク
ロトーム用ナイフの製作法に関するものである。 That is, in the present invention, an ultramicrotome knife made of artificial sapphire single crystal is attached to the cutting edge by placing a spherical or cylindrical elastic body close to the surface immediately behind the cutting edge in a solution in which fine abrasive particles are suspended. The cutting edge is rotated toward the grinding surface, and fine abrasive particles are slid from behind the cutting edge parallel to the grinding surface, and at least one surface of the cutting edge forming surface is elastically released and polished to reduce the rounding radius of the cutting edge. The present invention relates to a method for manufacturing a knife for an ultramicrotome.
本発明の方法によれば、研磨材微粒子を刃先の
背後から刃の研磨面に平行に滑らせる弾性放出研
磨(EEM、Elastic Emisson Machining)によ
り、刃先の刃線における破損を生じさせることな
く、又研磨面に歪を与えることなく極めて平滑な
仕上げ面で刃先の丸み半径を減少することがで
き、刃を鋭利にすることができる。これによりチ
ヤター及びスダレ状のメスマークを一級品のダイ
ヤモンドナイフと同等にまで減少し得るサフアイ
ヤナイフが得られる。
According to the method of the present invention, elastic emission machining (EEM) in which fine abrasive particles are slid from behind the cutting edge parallel to the grinding surface of the cutting edge can be used to eliminate damage to the cutting line of the cutting edge. The rounding radius of the cutting edge can be reduced with an extremely smooth finished surface without causing distortion to the polished surface, making the blade sharp. As a result, a sapphire knife capable of reducing chatter and sagging scalpel marks to the same level as a first-class diamond knife is obtained.
以下に本発明を具体的に説明する。 The present invention will be specifically explained below.
第1図は、本発明の方法を模式的に示したもの
であり、1はサフアイヤナイフ、2はその刃先、
3はその研磨面、4は弾性体円柱又は球、5は4
の回転軸、6は研磨材微粒子溶液、7は研磨材微
粒子、8は研磨除去部を示す。矢印は円柱又は球
の回転方向、及び粒子の進行方向を示す。 FIG. 1 schematically shows the method of the present invention, in which 1 is a sahuaiya knife, 2 is its cutting edge,
3 is its polished surface, 4 is an elastic cylinder or sphere, and 5 is 4
, 6 is an abrasive fine particle solution, 7 is an abrasive fine particle, and 8 is an abrasive removal section. The arrows indicate the direction of rotation of the cylinder or sphere and the direction of movement of the particles.
研磨材としてはは、シリカ、アルミナ、ジルコ
ニヤ等の微粒子が用いられる。中でもシリカの微
粒子が好ましい。その平均粒径は約0.5〜0.01μm
のものが好ましい。 As the abrasive material, fine particles of silica, alumina, zirconia, etc. are used. Among these, silica fine particles are preferred. Its average particle size is about 0.5~0.01μm
Preferably.
研磨材微粒子は液体、特に水に懸濁して用い
る。溶液の微粒子濃度は特に規定されないが、余
り高過ぎてはEEM研磨が行われ難くなるので避
けなければならない。約1〜5重量%の範囲が好
ましい。 The abrasive particles are used by being suspended in a liquid, especially water. Although the concentration of fine particles in the solution is not particularly specified, it must be avoided if it is too high, as this will make it difficult to perform EEM polishing. A range of about 1-5% by weight is preferred.
回転弾性体の材質としては、適当なゴム状弾
性、一例を示せば等価弾性係数約10500g/mm2、
を有するものであれば良いが、材質としては、加
熱成形が容易でかつ常温において適当なゴム状弾
性を示すポリウレタンゴムが有利である。 The material of the rotating elastic body should be one with suitable rubber-like elasticity, for example, an equivalent elastic modulus of about 10,500 g/mm 2 ,
Any material having the following properties may be used, but polyurethane rubber, which can be easily heat-molded and exhibits appropriate rubber-like elasticity at room temperature, is advantageous.
回転弾性体の形状は球状でも円柱状でもよい。
球状の場合は回転しながら回転球又は刃を刃線と
平行に移動させて刃線全体にわたつて研磨するよ
うにしなければならない。円筒状の場合は全刃線
にわたつて面の研磨が行われるので回転体又は刃
を移動させる必要はない。 The shape of the rotational elastic body may be spherical or cylindrical.
If it is spherical, the rotating ball or blade must be moved parallel to the blade line while rotating to polish the entire blade line. In the case of a cylindrical shape, the surface is polished over the entire blade line, so there is no need to move the rotating body or the blade.
回転弾性体の大きさも特に限定しないが、サフ
アイヤナイフそのものが小さいので、極く小さな
ものでよく、30〜60mmの直径のものが好ましく用
いられるが、その回転速度は2000〜3000mm/秒と
なるように回転数を定めなければならない。 The size of the rotating elastic body is not particularly limited either, but since the sapphire knife itself is small, it can be extremely small, and those with a diameter of 30 to 60 mm are preferably used, and the rotation speed is 2000 to 3000 mm/sec. The rotation speed must be determined as follows.
EEM研磨を行うためには、回転弾性体を研磨
面に大きな荷重をかけて接触せしめてはならな
い。好ましい一例として、回転弾性体を一方の極
とし他方にもう一つの極を設けたバランスとして
極くわずかな荷重がかかるようにしておくとか、
回転体に下から被研磨面を近ずけて一定荷重の所
で止めるようにするとよい。この荷重は例えば約
200g位であるのが望ましい。このような荷重で
は、回転体の回転中は、その弾性により回転体の
研磨面近辺では、流体くさびにより発生する動圧
力による変形が起こり、回転体自体は研磨面に直
接触れず、例えば回転体と研磨面の間に約1〜
3μmの流体膜ができ非接触となる。そして水溶液
中の進行研磨材微粒子が研磨面にかける圧力はご
く軽いものになり、従つて研磨面に何らの歪も与
えずに原子オーダーの剥離が生じる。その結果研
磨面は極めて平滑な鏡面となる。 In order to perform EEM polishing, the rotating elastic body must not be brought into contact with the polishing surface under a large load. A preferable example is to use a rotating elastic body as a balance with one pole and the other pole so that an extremely slight load is applied.
It is best to approach the surface to be polished from below to the rotating body and stop at a constant load. For example, this load is approximately
Ideally it should be around 200g. Under such a load, while the rotating body is rotating, deformation occurs near the polishing surface of the rotating body due to the dynamic pressure generated by the fluid wedge due to its elasticity, and the rotating body itself does not directly touch the polishing surface. Approximately 1 ~ between and the polished surface
A 3μm fluid film is created and there is no contact. The pressure exerted on the polishing surface by the advanced abrasive particles in the aqueous solution becomes very light, so that atomic-order peeling occurs without any strain on the polishing surface. As a result, the polished surface becomes an extremely smooth mirror surface.
具体例を示すと、微粒子としては径60Åのコロ
イダルシリカ粒子を純水に2〜3%分散したもの
を用いる。この方法による研磨速度は1時間当た
り1700Å即ち約30Å/分であり、表面粗さはタリ
ステツプによる測定によれば約20Åである。 To give a specific example, the fine particles used are colloidal silica particles with a diameter of 60 Å dispersed in pure water at a rate of 2 to 3%. The polishing rate by this method is 1700 Å per hour or about 30 Å/min, and the surface roughness is about 20 Å as measured by Talystep.
この方法によつて加工した面は、光の比較反射
率スペクトル測定によつて評価した所によると、
表面は化学研磨の面と同等の完全なものであり、
本発明の目的に合致するものである。 The surface processed by this method was evaluated by comparative light reflectance spectrometry, and the results showed that:
The surface is as perfect as a chemically polished surface,
This meets the purpose of the present invention.
又、研磨材微粒子は刃先の背後から刃先に向け
て一方向に平行移動するので、刃線の欠けは起こ
らない。 Furthermore, since the abrasive fine particles move in parallel in one direction from behind the cutting edge toward the cutting edge, chipping of the cutting edge line does not occur.
刃先の研磨は一面だけでも、二面共に行なつて
もよい。一面の場合はいずれの面でもよいが、所
謂掬角面を研磨する方が一般的であろう。 The cutting edge may be polished on one side or on both sides. In the case of one surface, either surface may be used, but it is more common to polish the so-called scooped angle surface.
本発明の方法は、ナイフの刃先を形成せしめた
後いきなりこのEEM研磨だけで研磨することも
可能であるが、機械研磨後、更にその後の機械化
学研磨後、更にその後の化学研磨を行つた後のナ
イフにこのEEM研磨を施すこともできる。殆ど
仕上げられたサフアイヤナイフの刃先、例えば、
特開昭57−46141号公報開示の方法により、ダイ
ヤモンド工具による成形研磨、シリカ粉末による
メカノケミカル研磨、燐酸処理によるケミカル研
磨等により仕上げられた刃先をこのEEM研磨に
よる仕上げを行うことは好ましいことである。こ
れにより刃先をよりシヤープにして、一級品のダ
イヤモンドナイフ並みのサフアイヤナイフを得る
ことができる。 In the method of the present invention, it is possible to polish the knife by just EEM polishing immediately after forming the cutting edge of the knife, but it is also possible to polish the knife using only EEM polishing, but it is also possible to polish the knife after mechanical polishing, then after mechanical chemical polishing, and then after chemical polishing. This EEM polishing can also be applied to knives. The edge of a nearly finished sahuaiya knife, for example,
According to the method disclosed in JP-A No. 57-46141, it is preferable to finish the cutting edge by EEM polishing, which has been finished by forming polishing with a diamond tool, mechanochemical polishing with silica powder, chemical polishing with phosphoric acid treatment, etc. be. This makes the cutting edge sharper, making it possible to obtain a sahuaiya knife that is comparable to a first-class diamond knife.
次ぎに実施例を示す。 Next, examples will be shown.
実施例 1
特開昭57−46141号公報記載の方法により製作
されたサフアイヤナイフの刃先より0.75mmの所に
半径28mmのポリウレタン円柱の回転軸をセツト
し、回転速度を3000mm/秒、回転方向は刃先を背
後から粒子を滑走させて切削するように駆動す
る。研磨液は純水中に70Å径のシリカ粒子を2重
量%懸濁させた液とし、この液中で刃先を研磨す
る。研磨時間は10分で所定の研磨を完了する。Example 1 A rotating shaft of a polyurethane cylinder with a radius of 28 mm was set 0.75 mm from the cutting edge of a sapphire knife manufactured by the method described in JP-A No. 57-46141, and the rotating speed was set at 3000 mm/sec in the direction of rotation. Drives the cutting edge to cut particles by sliding them from behind. The polishing liquid is a liquid in which 2% by weight of silica particles with a diameter of 70 Å are suspended in pure water, and the cutting edge is polished in this liquid. The required polishing time is 10 minutes.
このようにして得られたサフアイヤナイフにて
超薄切片を切出し、透過型電子顕微鏡(×3000
倍)で検査した所、このような研磨をしないもの
に比してチヤター、スダレ状メスマーク共に減少
し、高品質ダイヤモンドナイフに匹敵するものが
得られた。 Ultra-thin sections were cut using the thus obtained saphire knife, and were examined using a transmission electron microscope (×3000).
When inspected at 100% accuracy, both chatter and sag-like scalpel marks were reduced compared to those without such polishing, and a knife comparable to a high-quality diamond knife was obtained.
第1図は本発明の方法を示す模式的側面図であ
る。
1……サフアイヤナイフ、2……刃先、3……
研磨面、4……弾性体円柱又は球、5……回転
軸、6……研磨材微粒子溶液、7……研磨材微粒
子、8……研磨除去部。
FIG. 1 is a schematic side view showing the method of the present invention. 1...Sahuaia knife, 2...blade tip, 3...
Polishing surface, 4... Elastic cylinder or sphere, 5... Rotating shaft, 6... Abrasive particle solution, 7... Abrasive particle, 8... Polishing removal section.
Claims (1)
ロトーム用ナイフを研磨材微粒子を懸濁した溶液
中で球状又は円柱状の弾性体を刃先の直後の面に
近接した状態において刃先に向けて回転せしめ、
研磨材微粒子を研磨面に平行に刃先の背後から滑
らせて、刃先形成面の少なくとも一面を弾性放出
研磨することにより刃先の丸み半径を小とする仕
上研磨に付すことを特徴とする超ミクロトーム用
ナイフの製作法。 2 研磨材がシリカの微粒子である特許請求の範
囲第1項記載の超ミクロトーム用ナイフの製作
法。[Scope of Claims] 1. An ultramicrotome knife made of artificial sapphire single crystal is prepared by holding a spherical or cylindrical elastic body close to the surface immediately behind the cutting edge in a solution containing fine abrasive particles. Rotate it towards the
For use in an ultramicrotome, characterized in that fine particles of abrasive material are slid from behind the cutting edge parallel to the polishing surface, and at least one surface of the cutting edge forming surface is subjected to elastic release polishing to reduce the rounding radius of the cutting edge. How to make a knife. 2. The method for manufacturing a knife for an ultramicrotome according to claim 1, wherein the abrasive material is fine particles of silica.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59092778A JPS60238262A (en) | 1984-05-11 | 1984-05-11 | Method of manufacturing ultra-microtome knife |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59092778A JPS60238262A (en) | 1984-05-11 | 1984-05-11 | Method of manufacturing ultra-microtome knife |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60238262A JPS60238262A (en) | 1985-11-27 |
| JPS6320668B2 true JPS6320668B2 (en) | 1988-04-28 |
Family
ID=14063876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59092778A Granted JPS60238262A (en) | 1984-05-11 | 1984-05-11 | Method of manufacturing ultra-microtome knife |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60238262A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6039510B2 (en) * | 1980-02-25 | 1985-09-06 | 松下電器産業株式会社 | Surface polishing method |
-
1984
- 1984-05-11 JP JP59092778A patent/JPS60238262A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60238262A (en) | 1985-11-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3605036B2 (en) | Optical polishing compound | |
| JP4185266B2 (en) | Manufacturing method of substrate for information recording medium | |
| JP2016104510A (en) | Production method of edge end part reinforced object | |
| CN109269867B (en) | Tungsten-nickel-iron alloy polishing liquid and alloy surface polishing and metallographic preparation method | |
| EP0121706A2 (en) | Method for polishing titanium carbide containing surfaces | |
| JP2017116573A (en) | Method for producing glass substrate and glass substrate | |
| CN111397987A (en) | Method for manufacturing concrete metallographic specimen | |
| JP2972830B1 (en) | Method of manufacturing glass substrate for magnetic recording medium | |
| JP5309692B2 (en) | Polishing method of silicon wafer | |
| CN1103511A (en) | Process for smoothing the edge of semiconductor wafers | |
| JPS6320668B2 (en) | ||
| CN115805509A (en) | A polishing and cleaning method for a scandium-containing target | |
| JP2001085371A (en) | Glazing abrasive for colloidal sillica | |
| EP3816259B1 (en) | Abrasive agent, method for grinding glass, and method for producing glass | |
| JP2003173518A (en) | Method for manufacturing glass substrate for magnetic recording medium, method for manufacturing magnetic recording medium | |
| JP2009087439A (en) | Manufacturing method of glass substrate for magnetic disk | |
| JPS63114866A (en) | Method of processing glass | |
| JPS6154169B2 (en) | ||
| JP6626694B2 (en) | Polishing pad and method of manufacturing the same | |
| CN1705982A (en) | Glass substrate for information recording medium and process for producing the same | |
| JP2606598B2 (en) | Ruby polishing method | |
| KR100491812B1 (en) | chemical reactive polishing grain | |
| EP4737416A1 (en) | Method for producing synthetic quartz glass substrate | |
| JPH0435868A (en) | Polishing method for rock sample | |
| JPH05285812A (en) | Grinding method |