JPS63222437A - Member of electric circuit - Google Patents
Member of electric circuitInfo
- Publication number
- JPS63222437A JPS63222437A JP62055501A JP5550187A JPS63222437A JP S63222437 A JPS63222437 A JP S63222437A JP 62055501 A JP62055501 A JP 62055501A JP 5550187 A JP5550187 A JP 5550187A JP S63222437 A JPS63222437 A JP S63222437A
- Authority
- JP
- Japan
- Prior art keywords
- electric circuit
- metal
- connection
- electrical connection
- circuit component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by conductive adhesives
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/536—Shapes of wire connectors the connected ends being ball-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/5363—Shapes of wire connectors the connected ends being wedge-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/736—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、電気回路部材に関する。[Detailed description of the invention] [Industrial application field] TECHNICAL FIELD The present invention relates to electrical circuit members.
[従来技術]
従来、電気回路部品同士を電気的に接続して構成される
電気回路部材に関する技術としては以下に述べる技術が
知られている。[Prior Art] Conventionally, the following techniques are known as techniques related to electric circuit members configured by electrically connecting electric circuit components.
■ワイヤポンディング方法。■Wire bonding method.
第13図及び第14図はワイヤボンディング方法によっ
て接続され、封止された半導体装置の代表例を示してお
り、以下、第13図及び第14図に基づきワイヤボンデ
ィング方法を説明する。FIGS. 13 and 14 show typical examples of semiconductor devices connected and sealed by the wire bonding method, and the wire bonding method will be explained below based on FIGS. 13 and 14.
この方法は、Agペースト3等を用いて半導体素子4を
素子搭載部2に固定支持し1次いで、半導体素子4の接
続部5と、リードフレームlの所望の接続部6とを金等
の極細金属線7を用いて電気的に接続する方法である。In this method, the semiconductor element 4 is fixedly supported on the element mounting part 2 using Ag paste 3 or the like, and then the connection part 5 of the semiconductor element 4 and the desired connection part 6 of the lead frame l are connected with ultrafine material such as gold. This is a method of electrically connecting using metal wires 7.
なお、接続後は、トランスファーモールド法等の方法で
樹脂8を用いて半導体素子4とリードフレーム1を封止
し、その後、樹脂封止部分から外に伸びたリードフレー
ム1の不要部分を切断し。After the connection, the semiconductor element 4 and the lead frame 1 are sealed using a resin 8 using a method such as a transfer molding method, and then the unnecessary portion of the lead frame 1 extending outside the resin-sealed portion is cut off. .
所望の形に曲げ半導体装置9を作る。A semiconductor device 9 is made by bending it into a desired shape.
■T A B (Tape Automated Bo
nding)法(例えば、特開昭59−139636号
公報)第15図はTAB法により接続され封止された半
導体装置の代表例を示す。■T A B (Tape Automated Bo
FIG. 15 shows a typical example of a semiconductor device connected and sealed by the TAB method.
この方法は、テープキャリア方式による自動ボンディン
グ方法である。すなわち、第15図に基づいて説明する
と、キャリアフィルム基板16と半導体素子4とを位置
決めした後、キャリアフィルム基板16のインナーリー
ド部17と半導体素子4の接続部5とを熱圧着すること
により接続する方法である。接続後は、樹脂20乃至樹
脂21で封止し半導体装置9とする。This method is an automatic bonding method using a tape carrier method. That is, to explain based on FIG. 15, after positioning the carrier film substrate 16 and the semiconductor element 4, the inner lead part 17 of the carrier film substrate 16 and the connecting part 5 of the semiconductor element 4 are connected by thermocompression bonding. This is the way to do it. After the connection, the semiconductor device 9 is sealed with resins 20 and 21.
■CCB (Controlled Co11apse
Bonding )法(例えば、特公昭42−209
6号、特開昭60−57944号公報)
第16図はCCB法によって接続され封止された半導体
装置の代表例を示す、この方法を第16図に基づき説明
する。なお、本方法はクリップチップボンディング法と
も1tわれている。■CCB (Controlled Co11apse
Bonding) law (for example, Special Publication Act 1977
(No. 6, Japanese Unexamined Patent Publication No. 60-57944) FIG. 16 shows a typical example of a semiconductor device connected and sealed by the CCB method. This method will be explained based on FIG. 16. Note that this method is also referred to as a clip chip bonding method.
半導体素子4の接続部5に予め半田バンプ31を設け、
半田バンプ31が設けられた半導体素子4を1回路基板
32上に位置決めして搭載する。Solder bumps 31 are provided in advance on the connection portion 5 of the semiconductor element 4,
A semiconductor element 4 provided with solder bumps 31 is positioned and mounted on one circuit board 32.
その後、半田を加熱溶解することにより回路基板32と
に半導体素子4とを接続させ、フラックス洗浄後封止し
て半導体装置9を作る。Thereafter, the semiconductor element 4 is connected to the circuit board 32 by heating and melting the solder, and the semiconductor device 9 is manufactured by sealing after washing with flux.
■第17及び第18図に示す方法
すなわち、第1の半導体素子4の接続部5以外の部分に
ポリイミド等よりなる絶縁膜71を形成せしめ、接続部
5にはAu等よりなる金属材7゜を設け、次いで、金属
材7o及び絶縁膜71の露出面73.72を平らにする
。一方、第2の半導体素子4°の接続部5°以外の部分
にポリイミド等よりなる絶縁膜71”を形成せしめ、接
続部5′にはAu等よりなる金属材70′を設け1次い
で、金属材70°及び絶縁膜71’の露出面73°、7
2′を平らにする。(2) The method shown in FIGS. 17 and 18, that is, an insulating film 71 made of polyimide or the like is formed on a portion of the first semiconductor element 4 other than the connection portion 5, and a metal material 7° made of Au or the like is formed on the connection portion 5. Then, the exposed surfaces 73 and 72 of the metal material 7o and the insulating film 71 are flattened. On the other hand, an insulating film 71'' made of polyimide or the like is formed on a portion of the second semiconductor element 4° other than the connection portion 5°, and a metal material 70′ made of Au or the like is provided on the connection portion 5′. material 70° and exposed surface 73° of insulating film 71', 7
Flatten 2'.
しかる後、第18図に示すように第1の半導体素子4と
第2の半導体素子4′とを位置決めし、位置決め後、熱
圧着することにより第1の半導体素子4の接続部5と第
2の半導体素子4′の接続部5°を金属材70 、70
’を介して接続する。Thereafter, as shown in FIG. 18, the first semiconductor element 4 and the second semiconductor element 4' are positioned, and after positioning, the connection part 5 of the first semiconductor element 4 and the second The connecting portion 5° of the semiconductor element 4' is connected to metal materials 70, 70
Connect via '.
■第19図に示す方法
すなわち、第1の回路基材75と第2の回路基材75°
の間に、絶縁物質77中に導電粒子79を分散させた異
方性導電!1I78を介在させ、第1の回路基材75と
第2の回路基材75°を位置決めしたのち、加圧もしく
は、加圧・加熱し、第1の回路基材75の接続部76と
第2の回路基材75′の接続部76′を接続する方法で
ある。■The method shown in FIG. 19, that is, the first circuit substrate 75 and the second circuit substrate 75°
Anisotropic conduction in which conductive particles 79 are dispersed in an insulating material 77 during! After positioning the first circuit substrate 75 and the second circuit substrate 75° with the 1I78 interposed, pressure is applied or pressure and heat is applied to connect the connecting portion 76 of the first circuit substrate 75 and the second circuit substrate 75. This is a method of connecting the connecting portion 76' of the circuit board 75'.
■第20図に示す方法
すなわち、第1の回路基材75と第2の回路基材75”
の間に、絶縁物質81中に一定方向にFe、Cu等の金
属!182を配したエラスチックコネクター83を介在
させ、第1の回路基材75と第2の回路基材75°を位
置決めしたのち、加圧し、第1の回路基材75の接続部
76と第2の回路基材75′の接続部76′を接続する
方法である。■The method shown in FIG. 20, that is, the first circuit substrate 75 and the second circuit substrate 75''
During this period, metals such as Fe and Cu are distributed in a certain direction in the insulating material 81! After positioning the first circuit base material 75 and the second circuit base material 75° by interposing the elastic connector 83 with a 182, pressure is applied to connect the connecting portion 76 of the first circuit base material 75 and the second circuit base material 75. This is a method of connecting the connecting portion 76' of the circuit board 75'.
[問題点が解決しようとする問題点]
ところで上記した従来のポンディング法には次のような
問題点がある。[Problems to be Solved] The conventional bonding method described above has the following problems.
■ワイヤポンディング法
■半導体素子4の接続部5を半導体素子4の内部にくる
ように設計すると、極細金属線7は、その線径が極めて
小さいために、半導体素子4の外周縁部10あるいはリ
ードフレームlの素子搭載部2の外周縁部11に接触し
易くなる。極細金属線7がこれら外周縁部10乃至11
に接触すると短絡する。さらに、極細金属線7の長さを
長くせざるを得す、その長さを長くすると、トランスフ
ァーモールド成形時に極細金属線7が変形しやすくなる
。■ Wire bonding method ■ If the connection part 5 of the semiconductor element 4 is designed to be inside the semiconductor element 4, the ultrafine metal wire 7 has an extremely small wire diameter, This makes it easier to contact the outer peripheral edge 11 of the element mounting portion 2 of the lead frame l. The ultra-fine metal wire 7 is attached to these outer peripheral edges 10 to 11.
It will short circuit if it comes into contact with. Furthermore, the length of the ultra-fine metal wire 7 has to be increased, and when the length is increased, the ultra-fine metal wire 7 becomes easily deformed during transfer molding.
従って、半導体素子4の接続部5は半導体素子4上の周
辺に配置する必要が生じ1回路設計上の制限を受けざる
を得なくなる。Therefore, the connecting portion 5 of the semiconductor element 4 needs to be placed around the semiconductor element 4, and is subject to limitations in one circuit design.
■ワイヤポンディング法においては、隣接する極細金属
線7同士の接触等を避けるためには半導体素子4上の接
続部5のピッチ寸法(隣接する接続部の中心間の距ta
)としである程度の間隔をとらざるを得ない、従って、
半導体素子4の大きさが決まれは必然的に接続部5の最
大数が決まる。■In the wire bonding method, in order to avoid contact between adjacent ultrafine metal wires 7, the pitch dimension of the connecting portions 5 on the semiconductor element 4 (distance between the centers of adjacent connecting portions ta) is required.
) and have no choice but to maintain a certain amount of distance, therefore,
When the size of the semiconductor element 4 is determined, the maximum number of connection portions 5 is also determined.
しかるに、ワイヤポンディング法では、このピッチ寸法
が通常0.2mm程度と大きいので。However, in the wire bonding method, this pitch dimension is usually as large as about 0.2 mm.
接続部5の数は少なくせざるを得なくなる。The number of connection parts 5 has to be reduced.
■半導体素子4上の接続部5から測った極細金属線7の
高さhは通常0.2〜0.4mmであるが、0.2mm
以下にし薄型化することは比較的困難であるので薄型化
を図れない。■The height h of the ultrafine metal wire 7 measured from the connection part 5 on the semiconductor element 4 is usually 0.2 to 0.4 mm, but it is 0.2 mm.
Since it is relatively difficult to make the device thinner than below, the device cannot be made thinner.
■ワイヤボンディング作業に時間がかかる。特に接続点
数が多くなるとポンディング時間が長くなり生産効率が
悪くなる。■Wire bonding takes time. In particular, when the number of connection points increases, the bonding time increases and production efficiency deteriorates.
■何らかの1f!因でトランスファーモールド条件範囲
を越すと、極細金属線7が変形したり最悪の場合には切
断したりする。■Some kind of 1f! If the transfer molding condition range is exceeded, the ultrafine metal wire 7 may be deformed or, in the worst case, may be cut.
また半導体素子4上の接続部5においては、極細金属線
7と合金化されないAiが露出しているためAn腐食が
生じ易くなり、信頼性の低下が生じる。Furthermore, in the connection portion 5 on the semiconductor element 4, since A that is not alloyed with the ultrafine metal wire 7 is exposed, An corrosion tends to occur, resulting in a decrease in reliability.
■TAB法
■半導体素子4の接続部5を半導体素子の内側にくるよ
うに設計すると、キャリアフィルム基板16のインナー
リード部17の長さ文が長くなるため、インナーリード
部17が変形し易くなりインナーリード部を所望の接続
部5に接続できなかったり、インナーリード部17が半
導体素子4の接続部5以外の部分に接触したりする。こ
れを避けるためには半導体素子4の接続部5を半導体素
子4上の周辺に持ってくる必要が生じ、設計上の制限を
受ける。■TAB method■ If the connection part 5 of the semiconductor element 4 is designed to be inside the semiconductor element, the length of the inner lead part 17 of the carrier film substrate 16 becomes longer, and the inner lead part 17 becomes easily deformed. The inner lead portion may not be connected to the desired connection portion 5, or the inner lead portion 17 may come into contact with a portion of the semiconductor element 4 other than the connection portion 5. In order to avoid this, it is necessary to bring the connecting portion 5 of the semiconductor element 4 to the periphery above the semiconductor element 4, which is subject to design limitations.
■TAB法においても、半導体素子4上の接続部のピッ
チ寸法は0.09〜0.15mm程度とる必要があり、
従ってワイヤポンディング法の問題点■で述べたと同様
に、接続部数を増加させることはむずかしくなる。■Even in the TAB method, the pitch dimension of the connection parts on the semiconductor element 4 must be approximately 0.09 to 0.15 mm.
Therefore, similar to the problem (2) of the wire bonding method, it is difficult to increase the number of connections.
■キャリアフィルム基板16のインナーリード部17が
半導体素子4の接続部5以外の部分に接触しないように
させるため所望のインナーリード部17の接続形状が要
求されコスト高となる。(2) In order to prevent the inner lead portions 17 of the carrier film substrate 16 from coming into contact with portions other than the connection portions 5 of the semiconductor element 4, a desired connection shape of the inner lead portions 17 is required, which increases costs.
■半導体i子4の接続部5とインナーリード部17とを
接続するためには、半導体素子は4の接続部またはイン
ナーリード部17の接続部に金バンプをつけなければな
らずコスト高になる。■In order to connect the connection part 5 of the semiconductor i-shaped element 4 and the inner lead part 17, gold bumps must be attached to the connection part of the semiconductor element 4 or the connection part of the inner lead part 17 of the semiconductor element, which increases the cost. .
■CCB法
■半導体素子4の接続部5に半田バンプ31を形成させ
なければならないためコスト高になる。■ CCB method ■ Solder bumps 31 must be formed on the connection portions 5 of the semiconductor element 4, which increases costs.
■バンプの半田量が多いと隣接する半田バンプとブリッ
ジ(隣接する半田バンプ同士が接触する現象)が生じ、
逆に少いと半導体素子4の接続部5と基板32の接続部
33が接続しなくなり電気的導通がとれなくなる。すな
わち、接続の信頼性が低くなる。さらに、半田量、接続
の半田形状が接続の信頼性に影響する(ろう核技術研究
会技術資料、No、017− ’84、ろう接技術研究
会発行)という問題がある。■If the amount of solder on a bump is large, bridges (a phenomenon in which adjacent solder bumps come into contact with each other) will occur between adjacent solder bumps.
On the other hand, if the amount is too small, the connecting portion 5 of the semiconductor element 4 and the connecting portion 33 of the substrate 32 will not be connected and electrical continuity will not be established. In other words, the reliability of the connection becomes low. Furthermore, there is a problem that the amount of solder and the solder shape of the connection affect the reliability of the connection (Technical data of the Brazing Technology Research Group, No. 017-'84, published by the Brazing Technology Research Group).
このように、半田バンプの量の多少が接続の信頼性に影
響するため半田バンプ31の量のコントロールが必要と
されている。As described above, the amount of solder bumps 31 needs to be controlled because the amount of solder bumps affects the reliability of the connection.
■半田バンプ31が半導体素子4の内側に存在すると接
続が良好に行なわれたか否かの目視検査がむずかしくな
る。(2) If the solder bumps 31 are present inside the semiconductor element 4, it becomes difficult to visually inspect whether or not the connection has been made well.
■半導体素子の放熱特性が悪い(参考資料;Elect
ronic Packaging Technolog
y l 987−1 (Vol、3.No、1)P、6
6〜71゜NIKKEI MICRODEVICI’;
、 1986 + 5月、P、97〜108)ため、放
熱特性を良好たちしめるだめの多大な工夫が必要とされ
る。■Poor heat dissipation characteristics of semiconductor elements (reference material; Elect
ronic Packaging Technology
y l 987-1 (Vol, 3. No, 1) P, 6
6~71゜NIKKEI MICRODEVICI';
, May 1986, P. 97-108), therefore, great efforts are required to improve the heat dissipation characteristics.
■第17図及び第18図に示す技術
■絶縁lll71の面72と金属材70の面73、さら
に絶縁1971”の露出面72°と金属材70′の露出
面73′を平らにしなければならず、そのための工数が
増し、コスト高になる。■Technique shown in FIGS. 17 and 18■ Surface 72 of the insulator 71 and surface 73 of the metal material 70, as well as the exposed surface 72° of the insulator 1971" and the exposed surface 73' of the metal material 70' must be made flat. First, the number of man-hours required increases, leading to higher costs.
■絶縁[171の露出面72と金属材70の露出面73
あるいは絶縁[171’の露出面72°と金属材70”
の露出面73°に凹凸があると金属材70と金属材70
’とが接続しなくなり、信頼性が低下する。■Insulation [exposed surface 72 of 171 and exposed surface 73 of metal material 70]
Or insulation [171' exposed surface 72° and metal material 70''
If there is unevenness on the exposed surface 73°, the metal material 70 and the metal material 70
' will no longer connect, reducing reliability.
■第19図に示す技術
■位置決め後に、接続部76と接続部76°とを加圧し
て接続する際に、圧力が一定にはかかりにくいため、接
続状態にバラツキが生じ、その結果、接続部における接
触抵抗値のバラツキが大きくなる。そのため、接続の信
頼性が乏しくなる。■Technology shown in Fig. 19■ After positioning, when applying pressure to connect the connecting portion 76 and the connecting portion 76°, it is difficult to apply constant pressure, so the connection state varies, and as a result, the connecting portion The variation in contact resistance value becomes large. Therefore, the reliability of the connection becomes poor.
また、多量の電流を流すと、発熱等の現象が生じるので
、多量の電流を流したい場合には不向きである。In addition, when a large amount of current is passed, phenomena such as heat generation occur, so it is not suitable when a large amount of current is desired to be passed.
■圧力が一定にか区すられたとしても、異方性導電[7
8の導電粒子79の配列により抵抗値のバラツキが大き
くなる。そのため、接続の信頼性に乏しくなる。また、
大電流容量が要求される接続には不向きである。■Even if the pressure is kept constant, anisotropic conduction [7
The arrangement of the conductive particles 79 of No. 8 increases the variation in resistance value. Therefore, the reliability of the connection becomes poor. Also,
It is not suitable for connections that require large current capacity.
■隣接する接続部のピッチ(接続部に隣接する接続部中
心間の距離)を狭くすると隣接する接続部の間の抵抗値
が小さくなることから高密度な接続には不向きである。(2) If the pitch between adjacent connecting parts (the distance between the centers of adjacent connecting parts) is narrowed, the resistance value between adjacent connecting parts will decrease, which is not suitable for high-density connections.
■回路基材75 、75 ’の接続部76.76′の出
っ張り31hiのバラツキにより抵抗値が変化するため
、hlバラツキ量を正確に押さえることが必要である。(2) Since the resistance value changes due to variations in the protrusions 31hi of the connecting portions 76 and 76' of the circuit substrates 75 and 75', it is necessary to accurately suppress the amount of variation in hl.
(りさらに異方導電膜を、半導体素子と回路基材の接続
、また、第1の半導体素子と第2の半導体素子との接続
に使用した場合、上記■〜■の欠点の他、半導体素子の
接続部にバンブを設けなければならなくなり、コスト高
になるという欠点が生じる。(Furthermore, when an anisotropic conductive film is used to connect a semiconductor element and a circuit substrate, or to connect a first semiconductor element and a second semiconductor element, in addition to the drawbacks It is necessary to provide a bump at the connection part of the connector, which has the disadvantage of increasing costs.
■第20図に示す技術 ■加圧が必要であり、加圧治具が必要となる。■Technology shown in Figure 20 ■Pressure is required, and a pressure jig is required.
[相]エラスチフクコネクタ83の金属線82と第1の
回路基材75の接続部76また。第2の回路基材75′
の接続部76′との接触抵抗は加圧力及び表面状態によ
り変化するため接続の信頼性は乏しい。[Phase] Connection portion 76 between metal wire 82 of elastic connector 83 and first circuit board 75. Second circuit board 75'
Since the contact resistance with the connecting portion 76' changes depending on the pressing force and surface condition, the reliability of the connection is poor.
■エラスチックコネクタ83の金属線82は剛体である
ため、加圧力が大であるとエラスチックコネクタ83、
第1の回路基材75.第2の回路基材75゛の表面が破
損する可能性が大きい、また、加圧力が小であると、接
続の信頼性が乏しくなる。■Since the metal wire 82 of the elastic connector 83 is a rigid body, if the pressing force is large, the elastic connector 83
First circuit substrate 75. There is a high possibility that the surface of the second circuit board 75' will be damaged, and if the pressing force is small, the reliability of the connection will be poor.
■さらに、回路基材75,75°の接続部76.76’
の出っ張り量h2、またエラスチックコネクタ83の金
属線82の出っ張り量h3とそのバラツキが抵抗値変化
及び破損に影響を及ぼすので、バラツキを少なくする工
夫が必要とされる。■Furthermore, circuit board 75, 75° connection part 76.76'
The protrusion amount h2 of the metal wire 82 of the elastic connector 83 and the protrusion amount h3 of the metal wire 82 of the elastic connector 83 and their variations affect resistance value change and damage, so it is necessary to take measures to reduce the variation.
■さらに、エラスチックコネクターを半導体素子と回路
基材の接続、また、第1の半導体素子と第2の半導体素
子との接続に使用した場合、■〜@と同様な欠点を生ず
る。(2) Furthermore, when an elastic connector is used to connect a semiconductor element and a circuit substrate, or to connect a first semiconductor element and a second semiconductor element, the same drawbacks as in (2) to (@) occur.
本発明は、以上のような問題点をことごとく解決し、高
密度で高信頼性でしかも、低コストの新電気回路部材を
提案するものであり、従来の接続方式を置き変え得るこ
とはもちろん、高密度多重接続が得られ、熱等諸特性を
向上させ得るものである。The present invention solves all of the above-mentioned problems and proposes a new electrical circuit member that is high in density, highly reliable, and low in cost. High-density multiple connections can be obtained, and various characteristics such as heat can be improved.
(以下余白)
[発明を解決するためのrlよ]
本発明は、接続部を有する第1の電気回路部品と、接続
部を有する第2の電気回路部品とを両電気回路部品を電
気的に接続するための電気的接続部材を両者の間に介入
させて、両電気回路部品の接続部において接続して構成
される電気回路部材において、
該電気的接続部材は、金属または合金よりなる複数の金
属部材を、それぞれの金属部材同士を電気的に絶縁し、
かつ、該金属部材の一端を第1の電気部品側に露出させ
て、一方、該金属部材の他端を該第2の電気回路部品側
に露出させて、絶縁体中に埋設して構成されており、か
つ、該絶縁体は外部に開口する少なくとも1つの穴を有
しており、
第1の電気回路部品の接続部と第1の電気回路部品側に
露出した金属部材の一端とを合金化することにより接続
するか、または、第2の電気回路部品の接続部と第2の
電気回路部品側に露出した金属部材の一端とを合金化す
ることにより接続したことを特徴と丈る電気回路部材に
その要旨を有する。(Margins below) [rl for solving the invention] The present invention provides a first electrical circuit component having a connecting portion and a second electrical circuit component having a connecting portion by electrically connecting both electric circuit components. In an electric circuit member configured by intervening an electric connection member for connection between the two and connecting the two electric circuit components at the connection part, the electric connection member is made of a plurality of metals or alloys. Electrically insulating the metal members from each other,
and one end of the metal member is exposed to the first electric component side, while the other end of the metal member is exposed to the second electric circuit component side, and is embedded in an insulator. and the insulator has at least one hole opening to the outside, and the connecting portion of the first electric circuit component and one end of the metal member exposed on the side of the first electric circuit component are connected by an alloy. or by alloying the connection part of the second electric circuit component and one end of the metal member exposed on the second electric circuit component side. The gist is in the circuit member.
本発明における電気回路部品としては、例えば、半導体
素子、樹脂回路基板、セラミック基板、金属基板等の回
路基板(以下単に回路基板ということがある)、リード
フレーム等があげられる。すなわち、第1の電気回路部
品としてこれらの中のいずれかの部品を用い、第2の電
気回路部品としてこれらの中のいずれかの部品を用いれ
ばよい。Examples of the electric circuit components in the present invention include semiconductor elements, circuit boards such as resin circuit boards, ceramic boards, and metal boards (hereinafter sometimes simply referred to as circuit boards), lead frames, and the like. That is, any one of these components may be used as the first electrical circuit component, and any one of these components may be used as the second electrical circuit component.
電気回路部品として接続部を有する部品が本発明の対象
となる。接続部の数は問わないが、接続部の数が多けれ
ば多いほど本発明の効果が顕著となる。The object of the present invention is a component having a connection part as an electric circuit component. Although the number of connection parts does not matter, the greater the number of connection parts, the more remarkable the effects of the present invention will be.
また、接続部の存在位置も問わないが、電気回路部品の
内部に存在するほど本発明の効果が顕著となる。Further, although the location of the connection portion does not matter, the effect of the present invention becomes more pronounced as the connection portion is located inside the electric circuit component.
本発明では第1の電気回路部品と第2の電気回路部品と
を電気的接続部材を用いて接続する。In the present invention, a first electrical circuit component and a second electrical circuit component are connected using an electrical connection member.
本発明に係る電気的接続部材は、絶縁体中に複数の金属
部材を埋設して構成されている。金属部材同士はそれぞ
れ絶縁体により絶縁されており、また、金属部材の一端
は第1の電気回路部品側に露出しており、他の一端は第
2の電気回路部品側に露出している。さらに、該絶縁体
はその外部に開口する少なくとも1つの穴を有している
。The electrical connection member according to the present invention is constructed by embedding a plurality of metal members in an insulator. The metal members are each insulated by an insulator, and one end of the metal member is exposed to the first electric circuit component side, and the other end is exposed to the second electric circuit component side. Furthermore, the insulator has at least one hole opening to its exterior.
ここで、金属部材の材質としては、金が好ましいが、全
以外の任意の金属あるいは合金を使用することもできる
0例えば、Cu、All、Sn。Here, as the material of the metal member, gold is preferable, but any metal or alloy other than gold may also be used. For example, Cu, All, Sn.
Pb−3n等の金属あるいは合金があげられる。Examples include metals or alloys such as Pb-3n.
さらに、金属部材の断面は、円形、四角形その他任意の
形状とすることができる。Furthermore, the cross section of the metal member can be circular, square, or any other arbitrary shape.
また、金属部材の太さは特に限定されない、電気回路部
品の接続部のピッチを考慮して、例えば20I1.mφ
以上あるいは20Bmφ以下にしてもよい。Further, the thickness of the metal member is not particularly limited, and may be, for example, 20I1. mφ
It may be greater than or equal to 20 Bmφ.
なお、金属部材の露出部は絶縁体と同一面としてもよい
し、また、絶縁体の面から突出させてもよい、この突出
は片面のみでもよいし両面でもよい、さらに突出させた
場合はバンプ状にしてもよい。Note that the exposed portion of the metal member may be on the same surface as the insulator, or it may be made to protrude from the surface of the insulator. It may be made into a shape.
また、金属部材の間隔は、電気回路部品の接続部同士の
間隔と同一間隔としてもよいし、それより狭い間隔とし
てもよい、狭い間隔とした場合には電気回路部品と電気
的接続部材との位置決めを要することなく、電気回路部
品と電気的接続部材とを接続することが可能となる。Furthermore, the spacing between the metal members may be the same as the spacing between the connecting parts of the electrical circuit components, or may be narrower than that, and when the spacing is narrower, the spacing between the electrical circuit components and the electrical connecting members may be the same. It becomes possible to connect the electrical circuit component and the electrical connection member without requiring positioning.
また、金属部材は絶縁体中に垂直に配する必要はなく、
第1の電気回路部品側から第2の電気回路部品側に向か
って斜行していてもよい。Also, metal members do not need to be placed vertically in the insulator;
It may run obliquely from the first electric circuit component side toward the second electric circuit component side.
さらに電気的接続部材は、l居あるいは2層以上の多層
からなるものでもよい。Further, the electrical connection member may be made of one layer or multiple layers of two or more layers.
電気的接続部材が有する穴は1つでもよいし複数でもよ
い、その穴の大きさ、形状、位置は、穴のために絶縁体
中に埋設されている金属部材同士が接触し、短絡しない
範囲内ならば任意である。The electrical connection member may have one or more holes, and the size, shape, and position of the hole should be such that the metal members buried in the insulator come into contact with each other and do not cause a short circuit. If it is within, it is optional.
穴は第1の電気回路部品側から第2の電気回路部品側に
貫通していてもよいし、閉塞していてもよい。この穴の
開口方向は、金属部材の露出方向と平行でもよいし、ま
た、垂直でもよい。The hole may penetrate from the first electric circuit component side to the second electric circuit component side, or may be closed. The opening direction of this hole may be parallel to or perpendicular to the direction in which the metal member is exposed.
電気的接続部材の絶縁体は絶縁性物質ならば特に限定さ
れない0例えば絶縁性の樹脂を用いればよい、さらに、
樹脂を用いる場合には樹脂の種類も問わない、熱硬化性
樹脂、熱可塑性樹脂のいずれでもよい。例えば、ポリイ
ミド樹脂、ポリフェニレンサルファイド樹脂、ポリエー
テルサルフォン樹脂、ポリエーテルイミド樹脂、ポリサ
ル7オン樹脂、シリコーン樹脂、フッ素樹脂、ポリカー
ボネート樹脂、ポリジフェニールエーテル樹脂、ポリベ
ンジルイミダゾール樹脂、フェノール樹脂、尿素樹脂、
メラミン樹脂、アルキッド樹脂、エポキシ樹脂、ポリア
ミドイミド樹脂、ポリプロブレン#7M脂、ポリ塩化ビ
ニル樹脂、ポリスチレン樹脂その他あ樹脂を使用するこ
とができる。なお、これらの樹脂の中から、熱伝導性の
よい樹脂を使用すれば1回路基板が熱を持ってもその熱
を樹脂を介して放熱することができるのでより好ましい
、さらに、樹脂として、回路基板と同じかあるいは同程
度の熱膨張率を有するものを選択すれば、熱1膨張・熱
収縮に基づく、装鐙の信頼性の低下を一層防止すること
が可能となる。The insulator of the electrical connection member is not particularly limited as long as it is an insulating material; for example, an insulating resin may be used;
When a resin is used, the type of resin is not limited and may be either a thermosetting resin or a thermoplastic resin. For example, polyimide resin, polyphenylene sulfide resin, polyethersulfone resin, polyetherimide resin, polysal 7one resin, silicone resin, fluororesin, polycarbonate resin, polydiphenyl ether resin, polybenzylimidazole resin, phenol resin, urea resin,
Melamine resin, alkyd resin, epoxy resin, polyamideimide resin, polyproblene #7M resin, polyvinyl chloride resin, polystyrene resin and other resins can be used. Among these resins, it is more preferable to use a resin with good thermal conductivity because even if one circuit board has heat, the heat can be dissipated through the resin. By selecting a material that has the same or similar coefficient of thermal expansion as the substrate, it becomes possible to further prevent the reliability of the stirrup from decreasing due to thermal expansion and contraction.
本発明ではさらに、第1の電気回路部品の接続部と第1
の電気回路部品側に露出した電気接続部材の金属部材の
一端とを合金化することにより接続するか、又は、第2
の電気回路部品の接続部と第2の電気回路部品側に露出
した電気接続部材の金属部材の一端とを合金化すること
により接続する。すなわち1本発明では、第1の電気回
路部品か第2の電気回路部品かのいずれか一方を合金化
する。In the present invention, the connection portion of the first electric circuit component and the first
connection by alloying one end of the metal member of the electrical connection member exposed on the side of the electrical circuit component, or
The connecting portion of the electrical circuit component and one end of the metal member of the electrical connection member exposed to the second electrical circuit component are connected by alloying. That is, in one aspect of the present invention, either the first electric circuit component or the second electric circuit component is alloyed.
なお、合金化方法としては1例えば、それぞれ対応する
接続部を接触させた後、適宜の温度において加熱すれば
よい、加熱により、接続部において原子の拡散等が起こ
り、接続部表面に固溶体あるいは金属間化合物よりなる
層が形成され、接続部同士が合金化される。なお、電気
的接続部材の金属部材にAuを使用し、電気回路部品の
接続部にAnを使用した場合には、200〜350℃の
加熱温度が好ましい。In addition, as an alloying method, for example, after bringing the corresponding connection parts into contact, heating may be performed at an appropriate temperature.Heating causes diffusion of atoms in the connection part, and a solid solution or metal is formed on the surface of the connection part. A layer of intercalary compound is formed and the connections are alloyed. In addition, when Au is used for the metal member of the electrical connection member and An is used for the connection part of the electric circuit component, the heating temperature is preferably 200 to 350°C.
なお、合金化しない方の接続は公知の任意の方法を用い
ればよい1例えば、電気回路部品と電気的接続部材とを
押圧して接続すればよい。Note that any known method may be used for the connection without alloying. For example, the connection may be made by pressing the electrical circuit component and the electrical connection member.
[作用]
本発明では、上述の電気的接続部材を使用しているので
、Tl!l囲気部品の接続部を内部に配置することも可
能となり、接続部の数を増加させることができ、ひいて
は高密度化が可能となる。[Function] Since the above-described electrical connection member is used in the present invention, Tl! It is also possible to arrange the connection parts of the surrounding parts inside, which makes it possible to increase the number of connection parts and thus to achieve higher density.
また、m気的接続部材は薄くすることが可能であり、こ
の面からも薄型化が可能となる。Furthermore, the mechanical connection member can be made thinner, and from this point of view as well, it is possible to make it thinner.
さらに、電気的接続部材に使用する金属部材の量は少な
いため、たとえ、高価な金を金属部材として使用したと
してもコストが安いものとなる。Furthermore, since the amount of metal members used for the electrical connection member is small, the cost is low even if expensive gold is used as the metal member.
電気回路部品の一方は、電気接続部材を介して合金化さ
れているので、接触抵抗のバラツキはなく、接続の信頼
性が高くなる。Since one of the electrical circuit components is alloyed via the electrical connection member, there is no variation in contact resistance and the reliability of the connection is high.
また、合金化をして接続するのは第1の電気回路部品か
第2の電気回路部品のいずれか一方であるため、いずれ
かの電気回路部品に合金化による品質の劣化(例えば、
加熱による合金化を行なう場合熱による劣化)を生じる
ようなli!%回路部品を用いる場合には、その電気回
路部品の方を合金化せずに例えば、押圧して接続すれば
、かかる劣化を防止することができる。また、用途によ
っては電気回路部品を着脱自在にしておきたい場合があ
り、かかる場合にその電気回路部品を合金化せず1例え
ば押圧して接続すれば、その電気回路部品は着脱自在と
することもできる。In addition, since either the first electric circuit component or the second electric circuit component is alloyed and connected, quality deterioration due to alloying (for example,
When alloying by heating, li! % circuit components, such deterioration can be prevented by connecting the electrical circuit components by pressing, for example, without alloying them. Furthermore, depending on the application, there are cases where it is desired to make the electric circuit parts removable, and in such cases, the electric circuit parts can be connected by pressing, for example, without alloying them, and the electric circuit parts can be made removable. You can also do it.
さらに1本発明においては、電気的接続部材の絶縁体中
に穴が存在するので、電気回路部材あるいは電気的接続
部材に熱が加わっても(組立工程中、あるいは製品の信
頼性試験を行なう際に熱が加わることがある)、穴が熱
応力を緩和するので、熱応力によって生じることのある
電気的接続部材の切断あるいは、電気的接続部材と電気
回路部材部材との接続部の切断・接触不良を防止するこ
とができ、シJ断争接触不良によって生じる導通不良あ
るいは導通困難という事態を防止することが可能となる
。Furthermore, in the present invention, since the holes are present in the insulator of the electrical connection member, even if heat is applied to the electrical circuit member or the electrical connection member (during the assembly process or during product reliability testing) (heat may be applied to the electrical circuit member), the hole relieves thermal stress, thereby preventing disconnection of electrical connection members that may occur due to thermal stress, or disconnection or contact between electrical connection members and electrical circuit members. It is possible to prevent defects, and it is possible to prevent poor conduction or difficulty in conduction caused by poor contact.
[実施例]
(第1実施例)
本発明の第1実施例を第1図及び第2図に基づいて説明
する。[Example] (First Example) A first example of the present invention will be described based on FIGS. 1 and 2.
本実施例では、接続部102を有する第1の電気回路部
品である回路基板101と、接続部105を有する第2
の電気回路部品である回路基板104とを、両回路基板
101,104を電気的に接続するための電気的接続部
材125を両者の間に介在させて、両回路基板101,
104の接続部102,105において接続して構成さ
れる電気回路部品造において。In this embodiment, a circuit board 101, which is a first electric circuit component having a connection part 102, and a second circuit board 101 having a connection part 105 are used.
The circuit board 104, which is an electric circuit component of the circuit board 101,
In an electric circuit component structure configured by connecting at connecting portions 102 and 105 of 104.
該電気的接続部材125は、金属又は合金よりなる複数
の金属部材107を、それぞれの金属部材107同士を
電気的に絶縁し、か一つ、該金属部材107の一端を第
1の回路基板101側に露出させて、一方、該金属部材
107の他端を#第2の回路部基板104側に露出させ
て、絶縁体111中に埋設されて構成されており、かつ
、絶縁体111はその外部に開口している穴(第1図に
は図示せず)を有しており、
第1の回路基板101の接続部102と第1の回路基板
101側に露出した金属部材107の一端とを合金化す
ることにより接続するか、または、第2の回路基板10
4の接続部105と第2の回路基板104側に露出した
金属部材107の一端とを合金化することにより接続し
である。The electrical connection member 125 electrically insulates the plurality of metal members 107 made of metal or alloy from each other, and connects one end of the metal member 107 to the first circuit board 101. On the other hand, the metal member 107 is embedded in an insulator 111 with the other end exposed to the second circuit board 104 side, and the insulator 111 is embedded in the insulator 111. It has a hole (not shown in FIG. 1) that opens to the outside, and connects the connecting portion 102 of the first circuit board 101 and one end of the metal member 107 exposed on the first circuit board 101 side. or the second circuit board 10
The connection is made by alloying the connecting portion 105 of No. 4 and one end of the metal member 107 exposed on the second circuit board 104 side.
以下に本実施例をより詳細に説明する。This example will be explained in more detail below.
まず、電気的接続部材125の一製造例を説明しつつ電
気的接続部材125を説明する。First, the electrical connection member 125 will be explained while explaining one manufacturing example of the electrical connection member 125.
第2図に一製造例を示す。FIG. 2 shows one manufacturing example.
まず、第2図(a)に示すように、20pmφの金等の
金属あるいは合金よりなる金属線121を、ピッチ40
pmとして棒122に巻き付け、巻き付は後、金属線
121に接触しないように、金属線121の間に棒12
7を差し込む、その後ポリイミド等の樹脂123中に上
記金属線121および棒127を埋め込む、埋め込み後
上記樹脂123を硬化させる。硬化した樹脂123は絶
縁体となる。硬化後、棒127を抜き去る。その後1点
線124の位置でスライス切断し、電気的接続部材12
5を作成する。また、棒127を抜き去った後、その位
置に穴120が形成される。First, as shown in FIG. 2(a), metal wires 121 made of a metal such as gold or an alloy with a diameter of 20 pm are wired at a pitch of 40.
After wrapping, the rod 12 is wrapped between the metal wires 121 so as not to touch the metal wires 121.
After that, the metal wire 121 and rod 127 are embedded in a resin 123 such as polyimide, and after embedding, the resin 123 is hardened. The cured resin 123 becomes an insulator. After curing, the rod 127 is removed. Thereafter, the electrical connection member 12 is cut into slices at the position of the one-dot line 124.
Create 5. Furthermore, after the rod 127 is removed, a hole 120 is formed at that position.
このようにして作成された電気的接続部材125を第2
図(b)、(C)に示す。The electrical connection member 125 created in this way is
Shown in Figures (b) and (C).
このように作成された電気的接続部材125において、
金属線121が金属部材107を構成し、樹脂123が
絶縁体l11を構成する。In the electrical connection member 125 created in this way,
The metal wire 121 constitutes the metal member 107, and the resin 123 constitutes the insulator l11.
なお、棒127は上記金属線121と同じ金属線でもよ
いし他の任意の材質・材料でもよい、また棒127を差
し込んでもよいし、棒122に巻き付けてもよい、さら
に、棒127はスライス切断後に抜き去ってもよい。The rod 127 may be the same metal wire as the metal wire 121, or may be made of any other material.The rod 127 may be inserted or wound around the rod 122.Furthermore, the rod 127 may be cut into slices. You can remove it later.
この電気的接続部材125においては金属部材となる金
属線121同士は樹脂123により電気的に絶縁されて
いる。また、金属線121の一端は回路基板101側に
露出し、他端は回路基板104側に露出している。この
露出している部分はそれぞれ回路基板101.104と
の接続部108.109となる。In this electrical connection member 125, metal wires 121 serving as metal members are electrically insulated from each other by resin 123. Further, one end of the metal wire 121 is exposed to the circuit board 101 side, and the other end is exposed to the circuit board 104 side. These exposed portions become connection portions 108 and 109 with circuit boards 101 and 104, respectively.
次に、第1の回路基板101.電気的接続部材125、
第グの回路基板104を用意する0本例で使用する回路
基板101,104は、第1図に示すように、その内部
に多数の接続部102゜105を有している。Next, the first circuit board 101. electrical connection member 125,
The circuit boards 101 and 104 used in this example have a large number of connection parts 102 and 105 therein, as shown in FIG.
なお、第1の回路基板101の接続部102は、第2の
回路基板104の接続部105及び電気的接続部材12
5の接続部108,109に対応する位置に金属が露出
している。Note that the connection portion 102 of the first circuit board 101 is connected to the connection portion 105 of the second circuit board 104 and the electrical connection member 12.
Metal is exposed at positions corresponding to the connection parts 108 and 109 of No. 5.
第1の回路基板101の接続部102と、電気的接続部
材125の接続部108とを、又は、第2の回路基板1
04の接続部105と電気的接続部材125の接続部1
09が対応゛するように位置決めを行ない、位置決め後
、いずれか一方を合金化して接続し、他方を他の方法に
より接続する。Connecting portion 102 of first circuit board 101 and connecting portion 108 of electrical connecting member 125, or
Connection part 1 between the connection part 105 of 04 and the electrical connection member 125
After positioning, one of them is alloyed and connected, and the other is connected by another method.
ここで、上記第1の回路基板lot、電気的接続部材1
25、第2の回路基板104を接続するには次の2方式
が存在するが、そのいずれの方式によってもよい。Here, the first circuit board lot, electrical connection member 1
25. There are the following two methods for connecting the second circuit board 104, and either method may be used.
■第1の回路ノふ板101と電気的接続部材125とを
位置決めした後、′第1の回路基板101の接続部10
2と電気的接続部材125の接続部108とを合金化し
て接続した後、第2の回路基板104を位置決めし、第
2の回路基板104の接続部105と電気接続部材12
5の接続部109とを押圧して接続する方式。■After positioning the first circuit board 101 and the electrical connection member 125, 'the connection part 10 of the first circuit board 101
2 and the connecting portion 108 of the electrical connecting member 125 are alloyed and connected, the second circuit board 104 is positioned, and the connecting portion 105 of the second circuit board 104 and the electrical connecting member 12 are alloyed and connected.
A method of connecting by pressing the connection part 109 of No. 5.
■第2の回路基板104と電気的接続部材125とを位
置決めした後、第2の回路基板104の接続部105と
電気的接続部材125の接続部109とを合金化して接
続した後、第1の回路基板101を位置決めし、第1の
回路基板101のvL続郡部102電気接続部材125
の接続部108とを押圧して接続する方式。■ After positioning the second circuit board 104 and the electrical connection member 125, and after alloying and connecting the connection part 105 of the second circuit board 104 and the connection part 109 of the electrical connection member 125, The first circuit board 101 is positioned, and the first circuit board 101 is connected to the vL connecting portion 102 of the electrical connection member 125.
A method in which the connection is made by pressing the connection part 108 of the
以上のようにして作成した電気回路部材につきその接続
部の接続性を調べたところ高い信頼性をもって接続され
ていた。When the connectivity of the connection portions of the electrical circuit members produced as described above was examined, the connections were found to be highly reliable.
また、加熱によっても導通不良・困難という事態は発生
しなかった。In addition, no conduction failure or difficulty occurred due to heating.
(第2実施例) 第3図に第2実施例を示す。(Second example) FIG. 3 shows a second embodiment.
本例は、接続部52を有する第1の電気回路部品として
回路基板51を、第2の電気回路部品として内部に多数
の接続部5を有する半導体素子4を使用した。In this example, a circuit board 51 is used as a first electric circuit component having a connection part 52, and a semiconductor element 4 having a large number of connection parts 5 therein is used as a second electric circuit component.
合金化は、半導体素子4の接続部5と穴120を有する
電気的接続部材125の接続部54との間で行なった。Alloying was performed between the connection portion 5 of the semiconductor element 4 and the connection portion 54 of the electrical connection member 125 having the hole 120.
なお、穴120を持った電気的接続部材125としては
半導体素子4に対応する寸法のものを使用した。Note that as the electrical connection member 125 having the hole 120, one having a size corresponding to the semiconductor element 4 was used.
合金化して接続後は回路基板51の下面にリードフレー
ム55を接続した。After alloying and connecting, a lead frame 55 was connected to the lower surface of the circuit board 51.
他の点は第1実施例と同様である。Other points are similar to the first embodiment.
本例においても接続部は高い信頼性な持って接続されて
いた。また、加熱によっても導通不良・困難という事態
は発生しなかった。In this example as well, the connections were made with high reliability. In addition, no conduction failure or difficulty occurred due to heating.
(第3実施例) 第4図に第3実施例を示す。(Third example) FIG. 4 shows a third embodiment.
本例は、第1の電気回路部品が半導体素子4であり、第
2の電気回路部品が回路基板51である例である。In this example, the first electric circuit component is the semiconductor element 4, and the second electric circuit component is the circuit board 51.
なお、接続後は回路基板51の上面にリードフレーム1
を接続し、封止剤63により封止した。Note that after connection, the lead frame 1 is placed on the top surface of the circuit board 51.
were connected and sealed with a sealant 63.
他の点は第1実施例と同様である。Other points are similar to the first embodiment.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良・困難という事態
は発生しなかった。In this example as well, the connection section was connected with high reliability. In addition, no conduction failure or difficulty occurred due to heating.
(第4実施例) 第5図に第4実施例を示す。(Fourth example) FIG. 5 shows a fourth embodiment.
本例は、第1の電気回路部品が半導体素子4′であり、
第2の電気回路部品が半導体素子4である例であり、本
例では、電気的接続部材として半導体素子4に対応した
寸法のものを使用し、リードフレーム1を電気的接続部
材125の第1の半導体素子4′側に露出した金属部材
に接続している。In this example, the first electric circuit component is a semiconductor element 4',
This is an example in which the second electric circuit component is the semiconductor element 4. In this example, an electrical connection member having a size corresponding to the semiconductor element 4 is used, and the lead frame 1 is connected to the first electrical connection member 125. It is connected to the metal member exposed on the semiconductor element 4' side.
他は第3実施例と同様である。The rest is the same as the third embodiment.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良・困難というTs
態は発生しなかった。In this example as well, the connection section was connected with high reliability. In addition, heating may also cause poor conduction or difficulty in Ts.
No symptoms occurred.
(第5実施例) 第6図に第5実施例を示す。(Fifth example) FIG. 6 shows a fifth embodiment.
第5実施例は、第1の電気回路部品、第2の電気回路部
品として、接続部以外の部分が絶縁膜103.108で
覆われている回路基板lot。The fifth embodiment is a circuit board lot in which parts other than the connecting portions are covered with insulating films 103 and 108 as the first electric circuit component and the second electric circuit component.
104を使用している例である。This is an example in which 104 is used.
また、電気的接続部材としては第7図に示すものを使用
した。すなわち、第7図に示す、穴120を有する電気
的接続部材125は、金属部材107の露出している部
分が樹脂絶縁体111の面から突出している。このよう
な電気的接続部材125の作成は、例えば、次の方法に
よればよい。Further, as an electrical connection member, one shown in FIG. 7 was used. That is, in the electrical connection member 125 having the hole 120 shown in FIG. 7, the exposed portion of the metal member 107 protrudes from the surface of the resin insulator 111. Such electrical connection member 125 may be created, for example, by the following method.
まず、第1実施例で述べた方法により、第2図(b)、
(c)に示す電気的接続部材を用意する0次にこの電気
的接続部材の両面を、金属線121が、ポリイミド樹脂
123から1107z程度突出するまでエツチングすれ
ばよい。First, by the method described in the first embodiment, as shown in FIG. 2(b),
After preparing the electrical connection member shown in (c), both surfaces of this electrical connection member may be etched until the metal wire 121 protrudes from the polyimide resin 123 by about 1107z.
なわ、本実施例では金属線121の突出量を10gmと
したが、いかなる量でもよい。In this embodiment, the amount of protrusion of the metal wire 121 was set to 10 gm, but any amount may be used.
また、金属線121を突出させる方法としてはエツチン
グに限らず、他の化学的な方法又は機械的な方法を使用
してもよい。Furthermore, the method for making the metal wire 121 protrude is not limited to etching, and other chemical or mechanical methods may be used.
他の点は第1実施例と同様である。Other points are similar to the first embodiment.
なお、突出部を、電気的接続部材125を金属線121
の位置に四部を持った型に挟み込み、金属線121の突
起126をつぶすことにより第8図に示すようなバンブ
150を形成してもよい。Note that the protruding portion and the electrical connection member 125 are connected to the metal wire 121.
A bump 150 as shown in FIG. 8 may be formed by inserting the metal wire 121 into a mold having four parts and crushing the protrusion 126 of the metal wire 121.
この場合金属線121は絶縁体111かう脱落しにくく
なる。In this case, the metal wire 121 is less likely to fall off than the insulator 111.
なお、本例でも、金属線121が金属部材107を構成
し、さらに、樹脂123が絶縁体111を構成する。Note that in this example as well, the metal wire 121 constitutes the metal member 107, and furthermore, the resin 123 constitutes the insulator 111.
なお、バンブを作成するのには突起を熱で溶融させ、バ
ンブを作成してもよいし、他のいかなる方法でもよい。Note that the bumps may be created by melting the protrusions with heat, or any other method may be used.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良・困難という事態
は発生しなかった・
(第6実施例)
第9図に第6実施例を示す。In this example as well, the connection section was connected with high reliability. Moreover, no conduction failure or difficulty occurred even when heated. (Sixth Example) A sixth example is shown in FIG. 9.
本例は、第1の電気回路部品として半導体素子4を使用
し、第2の電気部品としてリードフレーム1を使用した
例である。In this example, a semiconductor element 4 is used as the first electrical circuit component, and a lead frame 1 is used as the second electrical component.
他の点は第5実施例と同様である。Other points are similar to the fifth embodiment.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良O困難という事態
は発生しなかった。In this example as well, the connection section was connected with high reliability. In addition, no conduction failure occurred due to heating.
(第7実施例) 第10図に第7実施例を示す。(Seventh Example) FIG. 10 shows a seventh embodiment.
本例においては、電気的接続部材125は、第5実施例
に示した電気的接続部材と異なる。すなわち、本例の電
気的接続部材125においては、金属部材同士のピッチ
が第5実施例で示したものよりも狭くなっている。すな
わち、本例では、第1の回路基板接続部の間隔よりも狭
い間隔に金属部材107同士のピッチを設定しである。In this example, the electrical connection member 125 is different from the electrical connection member shown in the fifth embodiment. That is, in the electrical connection member 125 of this example, the pitch between the metal members is narrower than that shown in the fifth example. That is, in this example, the pitch between the metal members 107 is set to be narrower than the interval between the first circuit board connecting portions.
つまり、第5実施例では、第1の回路基板101と第2
の回路基板104との接続位置に電気的接続部材125
の接続位置を配設したため、電気的接続部材125の位
置決めが必要であったが1本例では、第1の回路基板l
O1と第2の回路基板104との位置決めは必要である
が、電気的接続部材125との位置決めは不要となる。That is, in the fifth embodiment, the first circuit board 101 and the second
An electrical connection member 125 is located at the connection position with the circuit board 104.
Since the connection position of the first circuit board l was arranged, it was necessary to position the electrical connection member 125.
Although it is necessary to position O1 and the second circuit board 104, positioning with the electrical connection member 125 becomes unnecessary.
そのため、第1の回路基板101と第2の回路基板10
4の接続寸法(dll、pH)と電気的接続部材の接続
寸法(d12.P12)を適切な値に選ぶことにより位
置決めなしで接続することも可能である。Therefore, the first circuit board 101 and the second circuit board 10
It is also possible to connect without positioning by selecting appropriate values for the connection dimensions (dll, pH) of No. 4 and the connection dimensions (d12.P12) of the electrical connection member.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良・困難という事態
は発生しなかった。In this example as well, the connection section was connected with high reliability. In addition, no conduction failure or difficulty occurred due to heating.
(第8実施例)
第11図に第8実施例に使用する電気的接続部材を示す
。(Eighth Example) FIG. 11 shows an electrical connection member used in the eighth example.
第11図(a)は電気的接続部材の斜視図、第11図(
b)は上記電気的接続部材の断面図である。FIG. 11(a) is a perspective view of the electrical connection member, FIG.
b) is a sectional view of the electrical connection member.
かかる電気的接続部材の作成例を次に述べる。An example of making such an electrical connection member will be described below.
まず、第1実施例に示した製法で、穴120を有する電
気的接続部材128,129,130を3枚用意する。First, three electrical connection members 128, 129, and 130 having holes 120 are prepared using the manufacturing method shown in the first embodiment.
1枚目128の金属線121の位置はm行nil目で、
ma、nbだけ中心から変位している。2枚目129の
金属線121の位置はm行n列目でmac、nbcだけ
中心から変位している。3枚目130の金属線121の
位置はmin列でmad、nbdだけ中心から変位して
いる。a。The position of the metal wire 121 in the first sheet 128 is at the nilth row of m rows,
It is displaced from the center by ma and nb. The position of the metal wire 121 in the second sheet 129 is in the mth row and nth column, and is displaced from the center by mac and nbc. The position of the third metal wire 121 is in the min column and is displaced from the center by mad and nbd. a.
b、c、dの値は上下の金属121は導通するが左右に
は互いに電気的に導通しないような値をとる。3枚の電
気的接続部材を位置決めし、熱圧着等の方法を用い積層
し、電気的接続部材125を作成する。The values of b, c, and d are such that the upper and lower metals 121 are electrically conductive, but the left and right sides are not electrically conductive with each other. The three electrical connection members are positioned and laminated using a method such as thermocompression bonding to create the electrical connection member 125.
なお、本例においては、電気的接続部材の金属の位置を
m行n列というように規則をもった位置を選んだが、上
下の金属が導通し、左右にはカニいに電気的に導通しな
いようにすればランダムでもよい。In addition, in this example, the positions of the metals of the electrical connection members were selected according to rules such as m rows and n columns, but the upper and lower metals are conductive, and there is no electrical conduction to the left and right sides. It can be random if you do this.
また、本例では3層積層する場合について述べたが、2
枚以上であれば何枚でもよい、また、熱圧着の方法を用
いて積層すると述べたが、圧着、接着等の方法を用いて
もよい、さらに、本例の電気的接続部材を加工して第7
図に示すように突起を設けてもよいし、第8図に示した
ようにバンブ150を設けてもよい。In addition, although this example describes the case where three layers are laminated, two
Any number of layers may be used as long as the electrical connection member of this example is laminated using a thermocompression bonding method. 7th
A protrusion may be provided as shown in the figure, or a bump 150 may be provided as shown in FIG.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良・困難という事態
は発生しなかった。In this example as well, the connection section was connected with high reliability. In addition, no conduction failure or difficulty occurred due to heating.
(第9実施例)
第12図に第9実施例に使用する電気的接続部材を示す
。(Ninth Example) FIG. 12 shows an electrical connection member used in the ninth example.
第12図(&)は電気的接続部材の製造途中の断面図、
第12図(b)は上記電気的接続部材の斜視図、第12
図(c)は上記の断面図である。FIG. 12 (&) is a cross-sectional view of the electrical connection member during manufacture;
FIG. 12(b) is a perspective view of the electrical connection member,
Figure (c) is the above sectional view.
まず、金属線案内板131,132を用意する。そして
、金属線案内板131,132にあけられている所望の
穴133,134に金属線121および棒127を通し
、所望の張力で張る。その後、金属線案内板131.
、132間に樹脂123を流し込み、硬化させる。その
後、棒127を抜き去る。しかる後、案内板を取りはず
し、電気的接続部材125を作成する。棒127を抜き
去った後、その位置に穴120が形成される。なお、棒
127は上記した金属線121と同じ金属線でもよいし
、他の任意の材料でもよい。First, metal wire guide plates 131 and 132 are prepared. Then, the metal wire 121 and the rod 127 are passed through desired holes 133 and 134 made in the metal wire guide plates 131 and 132, and stretched to a desired tension. After that, the metal wire guide plate 131.
, 132 and harden the resin 123. After that, the rod 127 is removed. After that, the guide plate is removed and the electrical connection member 125 is created. After removing the rod 127, a hole 120 is formed at that position. Note that the rod 127 may be made of the same metal wire as the metal wire 121 described above, or may be made of any other material.
また、棒127は案内板を取りはずした後に抜き去って
もよい、また、本例の電気的接続部材を加工して、第7
図に示すように突起を設けてもよいし、第8図に示すよ
うにバンブ150を設けてもよい。Further, the rod 127 may be removed after removing the guide plate, or the electrical connection member of this example may be processed to form the seventh
A protrusion may be provided as shown in the figure, or a bump 150 may be provided as shown in FIG.
木実施例の第1の回路部品及び第2の電気回路部品は、
それぞれ、半導体素子、回路基板、リードフレーム等の
回路基材のうちの1つである。The first circuit component and the second electric circuit component of the wooden embodiment are:
Each of them is one of circuit base materials such as a semiconductor element, a circuit board, and a lead frame.
本例においても接続部は高い信頼性を持って接続されて
いた。また、加熱によっても導通不良・困難という事態
は発生しなかった。In this example as well, the connection section was connected with high reliability. In addition, no conduction failure or difficulty occurred due to heating.
[発明の効果]
本発明は以上のように構成したので次の数々の効果が得
られる。[Effects of the Invention] Since the present invention is configured as described above, the following numerous effects can be obtained.
1、半導体素子と回路基板、リードフレーム等の回路基
材の接続に関し、信頼性の高い接続が得られる。従って
、従来用いられてきたワイヤポンディング方式、TAB
方式、CCB方式を置き変えることが可能となる。1. Highly reliable connections between semiconductor elements and circuit substrates such as circuit boards and lead frames can be obtained. Therefore, the conventionally used wire bonding method, TAB
It becomes possible to replace the CCB method.
2、本発明によると電気回路部品の接続部をいかなる位
置(特に内部)にも配置することができることからワイ
ヤポンディング方式、TAB方式よりもさらに多点接続
が可能となり、多ビン数接続向きの方式となる。2. According to the present invention, the connection parts of electric circuit components can be placed in any position (especially inside), which enables more multi-point connections than the wire bonding method or TAB method, and is suitable for connection with a large number of bins. This is the method.
さらに電気的接続部材の隣接金属間に絶縁物質が存在す
ることにより隣接金属間の電気的導通しないことよりC
CB方式よりもさらに多点接続が可能となる。Furthermore, due to the presence of an insulating material between adjacent metals of the electrical connection member, there is no electrical conduction between the adjacent metals.
More multi-point connections are possible than with the CB method.
3、″W!、気的接続部材において使用される金属部材
の量は従来に比べ微量であるため、仮に金属部材に金等
の高価な金属を使用しても従来より安価となる。3. ``W!'' Since the amount of metal members used in the gas connection member is tiny compared to the conventional one, even if an expensive metal such as gold is used for the metal member, it will be cheaper than the conventional one.
4、高密度の半導体装置等が得られる。4. High-density semiconductor devices and the like can be obtained.
5、一方の電気回路部品を着脱自在とすることができる
。また、合金化に際し、品質の劣化を生じるような電気
回路部品でも劣化を招くことなく接続が可能となる。5. One of the electric circuit components can be detachably attached. In addition, it is possible to connect electrical circuit parts whose quality would otherwise deteriorate when alloyed without causing deterioration.
6、電気的接続部材の電気的絶縁物質として熱伝導性の
良い材料を選択することにより、電気回路部品からの放
熱性が良好となり、放熱性が良い半導体装置が得られる
。6. By selecting a material with good thermal conductivity as the electrical insulating material of the electrical connection member, heat dissipation from the electric circuit components becomes good, and a semiconductor device with good heat dissipation can be obtained.
7、電気回路部材あるいは電気的接続部材に熱が加わっ
た場合であっても、穴が熱応力を緩和し、熱応力によっ
て発生することのある金属部材の断線・接触不良を防止
することができる。なお、かかる効果は、第1の電気回
路部品と、第2の電気回路部品との熱膨張率に差がある
場合に顕著である。7. Even if heat is applied to electrical circuit members or electrical connection members, the holes can alleviate thermal stress and prevent disconnection and poor contact of metal members that can occur due to thermal stress. . Note that this effect is remarkable when there is a difference in coefficient of thermal expansion between the first electric circuit component and the second electric circuit component.
もちろん、電気的接続部材の電気的絶縁物質として半導
体素子及び回路基材と同じかあるいは同程度の熱膨張率
を持つ材料を選択することにより信頼性の良い半導体装
置が得られる。Of course, a highly reliable semiconductor device can be obtained by selecting a material having the same or similar coefficient of thermal expansion as the semiconductor element and the circuit substrate as the electrically insulating material of the electrical connection member.
なお、電気的接続部材の絶縁体中に他の物質を埋めこん
だり、積層することにより、放熱性の良い、低応力でし
かもシールド効率が得られる電気回路部材が得られる。By embedding or laminating other substances in the insulator of the electrical connection member, an electrical circuit member with good heat dissipation, low stress, and shielding efficiency can be obtained.
第1図は第1実施例を示す断面図である。第1図(a)
は接続前の状態を示し、第2図(b)は接続後の状態を
示す、第2図は第1実施例に使用する電気的接続部材の
一製造方法例を説明するための図であり、第2図(a)
は断面図、第2図(b)は斜視図、第2図(c)は断面
図である。
第3図は第2実施例を示し、第3図(a)は斜視図、第
3図(b)は断面図である。第4図は第3実施例を示す
断面図である。第5@は第4実施例を示す断面図である
。第6図は第5実施例を示し、第6図(L)は接続前の
状態を示す断面図であり第6図(b)は接続後の状態を
示す断面図である。第7図及び第8図も第5実施例を示
し、第7図(a)及び第8図(a)は斜視図であり、第
7図(b)及び第8図(b)は断面図である。第9図は
第6実施例を示し、第9図(a)は接続前の状態を示す
斜視図であり、第9図(b)は接続後の状態を示す断面
図である。第10図は第7実施例を示す断面図であり、
第1θ図(a)は接続前の状態を示し、第1θ図(b)
は接続後の状態を示す、第11図は第8実施例に係る電
気的接続部材を示し、第11図(a)は斜視図であり、
第11図(b)は断面図である。第12図は第9実施例
に係る電気的接続部材の一製造例を示し、第12図(a
)、(c)は断面図であり、第12図(b)は斜視図で
ある。第13図から第20図までは従来例を示し、第1
4図を除き断面図であり、第14図は平面透視図である
。
1・φリードフレーム、2・・リードフレームの素子搭
載部、3・・銀ペースト、4,4゛・・半導体素子、5
,5′・・半導体素子の接続部、6争・リードフレーム
の接続部、7−・極細金属線、3 e e樹脂、9・・
半導体装置、10・番卒導体素子の外周縁部、11・・
リードフレームの素子搭載部の外周縁部、l x5・・
キャリアフィルム基板、17・・キャリアフィルム基板
のインナーリード部、20・・樹脂、21・・樹脂、3
1脅・半田バンプ、32拳・基板、33・・基板の接続
部、54拳争電気的接続部材の接続部、55ΦΦリード
フレーム、63−−封止材、70゜70’・・金属材、
71.71’ ・・絶縁膜、72 、72 ’・・絶
縁膜の露出面、73.73”・・金属材の露出面、75
,75° ・・回路基材、76.76′ ・・回路基材
の接続部、77・・異方性導電膜の絶縁物質、78・・
異方性導電膜、79・・導電粒子、81・・エラスチッ
クコネクタの絶縁物質、82−−エラスチックコネクタ
の金属線、83・・エラスチックコネクタ、101・・
回路基板、102・−接続部、103・・絶縁膜210
6・・絶縁膜、104・・回路基板、105−・接続部
、107金属部材、108・・接続部% 109・・接
続部、111・φ絶縁体、120・・穴、121@−金
属線、122争・棒、123・φ樹脂、124・Φ点線
、125・・電気的接続部材、126・・突起、127
・φ棒、128,129,130・・電気的接続部材、
131,132・・金属線案内板、133,134・・
穴、150・拳バンプ。
第1図(a)
第1図(b)
第2図(c)
第3図(a)
第3図(b)
第4図
第5図
5 4 1δ
第6図(a)
第6図(b)
第7図(a)
第7図(b)
第10図(a)
第10図(b)
第11図(a)
第11図(b)
第12図(a)
!21
第13図
第14図
第15図
第16図
第17図
第旧図FIG. 1 is a sectional view showing a first embodiment. Figure 1(a)
2 shows the state before connection, and FIG. 2(b) shows the state after connection. FIG. 2 is a diagram for explaining an example of a manufacturing method of the electrical connection member used in the first embodiment. , Figure 2(a)
2(b) is a perspective view, and FIG. 2(c) is a sectional view. FIG. 3 shows a second embodiment, with FIG. 3(a) being a perspective view and FIG. 3(b) being a sectional view. FIG. 4 is a sectional view showing the third embodiment. 5th @ is a sectional view showing the fourth embodiment. FIG. 6 shows the fifth embodiment, FIG. 6(L) is a sectional view showing the state before connection, and FIG. 6(b) is a sectional view showing the state after connection. FIGS. 7 and 8 also show the fifth embodiment, with FIGS. 7(a) and 8(a) being perspective views, and FIGS. 7(b) and 8(b) being sectional views. It is. 9 shows a sixth embodiment, FIG. 9(a) is a perspective view showing the state before connection, and FIG. 9(b) is a sectional view showing the state after connection. FIG. 10 is a sectional view showing the seventh embodiment,
Figure 1θ (a) shows the state before connection, Figure 1θ (b)
11 shows the electrical connection member according to the eighth embodiment, and FIG. 11(a) is a perspective view,
FIG. 11(b) is a sectional view. FIG. 12 shows an example of manufacturing an electrical connection member according to the ninth embodiment, and FIG.
) and (c) are cross-sectional views, and FIG. 12(b) is a perspective view. 13 to 20 show conventional examples, and the first
4 are cross-sectional views, and FIG. 14 is a plan perspective view. 1. φ lead frame, 2. Element mounting part of lead frame, 3. Silver paste, 4, 4゛... Semiconductor element, 5
, 5'... Connecting part of semiconductor element, 6 - Connecting part of lead frame, 7-- Microfine metal wire, 3 e e resin, 9...
Semiconductor device, 10th outer periphery of conductor element, 11...
Outer periphery of element mounting part of lead frame, l x5...
Carrier film substrate, 17...Inner lead portion of carrier film substrate, 20...Resin, 21...Resin, 3
1. Solder bump, 32. Board connection, 54. Connection portion of electrical connection member, 55ΦΦ lead frame, 63. Sealing material, 70°70'.. Metal material.
71.71'...Insulating film, 72, 72'...Exposed surface of insulating film, 73.73''...Exposed surface of metal material, 75
,75°...Circuit base material, 76.76'...Connection part of circuit base material, 77...Insulating material of anisotropic conductive film, 78...
Anisotropic conductive film, 79... Conductive particles, 81... Insulating material of elastic connector, 82-- Metal wire of elastic connector, 83... Elastic connector, 101...
Circuit board, 102 - connection part, 103... insulating film 210
6... Insulating film, 104... Circuit board, 105-... Connection part, 107 Metal member, 108... Connection part % 109... Connection part, 111 - φ insulator, 120... Hole, 121@-metal wire , 122 - rod, 123 - φ resin, 124 - φ dotted line, 125 - electrical connection member, 126 - protrusion, 127
・φ rod, 128, 129, 130... electrical connection member,
131,132...Metal wire guide plate, 133,134...
Hole, 150/fist bump. Figure 1 (a) Figure 1 (b) Figure 2 (c) Figure 3 (a) Figure 3 (b) Figure 4 Figure 5 5 4 1δ Figure 6 (a) Figure 6 (b ) Figure 7 (a) Figure 7 (b) Figure 10 (a) Figure 10 (b) Figure 11 (a) Figure 11 (b) Figure 12 (a)! 21 Figure 13 Figure 14 Figure 15 Figure 16 Figure 17 Old figure
Claims (1)
する第2の電気回路部品とを両電気回路部品を電気的に
接続するための電気的接続部材を両者の間に介入させて
、両電気回路部品の接続部において接続して構成される
電気回路部材において、 該電気的接続部材は、金属または合金よりなる複数の金
属部材を、それぞれの金属部材同士を電気的に絶縁し、
かつ、該金属部材の一端を第1の電気部品側に露出させ
て、一方、該金属部材の他端を該第2の電気回路部品側
に露出させて、絶縁体中に埋設して構成されており、か
つ、該絶縁体は外部に開口する少なくとも1つの穴を有
しており、 第1の電気回路部品の接続部と第1の電気回路部品側に
露出した金属部材の一端とを合金化することにより接続
するか、または、第2の電気回路部品の接続部と第2の
電気回路部品側に露出した金属部材の一端とを合金化す
ることにより接続したことを特徴とする電気回路部材。 2、第1の電気回路部品及び第2の電気回路部品は、そ
れぞれ半導体素子、回路基板やリードフレーム等の回路
基材のうち1つである特許請求範囲第1項記載の電気回
路部材。[Claims] 1. An electrical connection member for electrically connecting a first electric circuit component having a connecting portion and a second electric circuit component having a connecting portion to both of them. In an electric circuit member constructed by intervening between the two electric circuit parts and connecting them at the connecting part, the electric connecting member connects a plurality of metal members made of metal or an alloy to each other. electrically isolated,
and one end of the metal member is exposed to the first electric component side, while the other end of the metal member is exposed to the second electric circuit component side, and is embedded in an insulator. and the insulator has at least one hole opening to the outside, and the connecting portion of the first electric circuit component and one end of the metal member exposed on the side of the first electric circuit component are connected by an alloy. An electric circuit characterized in that the connection is made by alloying the connecting portion of the second electric circuit component and one end of the metal member exposed on the side of the second electric circuit component. Element. 2. The electric circuit member according to claim 1, wherein the first electric circuit component and the second electric circuit component are each one of a semiconductor element, a circuit substrate such as a circuit board, or a lead frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62055501A JPS63222437A (en) | 1987-03-11 | 1987-03-11 | Member of electric circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62055501A JPS63222437A (en) | 1987-03-11 | 1987-03-11 | Member of electric circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63222437A true JPS63222437A (en) | 1988-09-16 |
Family
ID=13000401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62055501A Pending JPS63222437A (en) | 1987-03-11 | 1987-03-11 | Member of electric circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63222437A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5135606A (en) * | 1989-12-08 | 1992-08-04 | Canon Kabushiki Kaisha | Process for preparing electrical connecting member |
| US5174766A (en) * | 1990-05-11 | 1992-12-29 | Canon Kabushiki Kaisha | Electrical connecting member and electric circuit member |
| US5323535A (en) * | 1991-02-25 | 1994-06-28 | Canon Kabushiki Kaisha | Electrical connecting member and method of manufacturing the same |
| US5379515A (en) * | 1989-12-11 | 1995-01-10 | Canon Kabushiki Kaisha | Process for preparing electrical connecting member |
| US5819406A (en) * | 1990-08-29 | 1998-10-13 | Canon Kabushiki Kaisha | Method for forming an electrical circuit member |
| US5860818A (en) * | 1991-02-22 | 1999-01-19 | Canon Kabushiki Kaisha | Electrical connecting member |
| US6015081A (en) * | 1991-02-25 | 2000-01-18 | Canon Kabushiki Kaisha | Electrical connections using deforming compression |
| JP2019175828A (en) * | 2018-03-30 | 2019-10-10 | 株式会社村田製作所 | Composite electronic component, constant temperature heating apparatus, and manufacturing method of composite electronic component |
-
1987
- 1987-03-11 JP JP62055501A patent/JPS63222437A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5135606A (en) * | 1989-12-08 | 1992-08-04 | Canon Kabushiki Kaisha | Process for preparing electrical connecting member |
| US5379515A (en) * | 1989-12-11 | 1995-01-10 | Canon Kabushiki Kaisha | Process for preparing electrical connecting member |
| US5174766A (en) * | 1990-05-11 | 1992-12-29 | Canon Kabushiki Kaisha | Electrical connecting member and electric circuit member |
| US5819406A (en) * | 1990-08-29 | 1998-10-13 | Canon Kabushiki Kaisha | Method for forming an electrical circuit member |
| US5860818A (en) * | 1991-02-22 | 1999-01-19 | Canon Kabushiki Kaisha | Electrical connecting member |
| US6511607B1 (en) | 1991-02-22 | 2003-01-28 | Canon Kabushiki Kaisha | Method of making an electrical connecting member |
| US5323535A (en) * | 1991-02-25 | 1994-06-28 | Canon Kabushiki Kaisha | Electrical connecting member and method of manufacturing the same |
| US6015081A (en) * | 1991-02-25 | 2000-01-18 | Canon Kabushiki Kaisha | Electrical connections using deforming compression |
| JP2019175828A (en) * | 2018-03-30 | 2019-10-10 | 株式会社村田製作所 | Composite electronic component, constant temperature heating apparatus, and manufacturing method of composite electronic component |
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