JPS6322628B2 - - Google Patents
Info
- Publication number
- JPS6322628B2 JPS6322628B2 JP57079327A JP7932782A JPS6322628B2 JP S6322628 B2 JPS6322628 B2 JP S6322628B2 JP 57079327 A JP57079327 A JP 57079327A JP 7932782 A JP7932782 A JP 7932782A JP S6322628 B2 JPS6322628 B2 JP S6322628B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum
- semiconductor
- insulating film
- region
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57079327A JPS58196056A (ja) | 1982-05-11 | 1982-05-11 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57079327A JPS58196056A (ja) | 1982-05-11 | 1982-05-11 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58196056A JPS58196056A (ja) | 1983-11-15 |
| JPS6322628B2 true JPS6322628B2 (2) | 1988-05-12 |
Family
ID=13686787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57079327A Granted JPS58196056A (ja) | 1982-05-11 | 1982-05-11 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58196056A (2) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63169264A (ja) * | 1987-01-06 | 1988-07-13 | Citizen Watch Co Ltd | 傾斜制御可能なワ−ク取付台を有する加工機 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1601059A (en) * | 1978-05-31 | 1981-10-21 | Secr Defence | Fet devices and their fabrication |
-
1982
- 1982-05-11 JP JP57079327A patent/JPS58196056A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58196056A (ja) | 1983-11-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0058548A1 (en) | Method of producing MOSFET type semiconductor device | |
| JP3277533B2 (ja) | 半導体装置の製造方法 | |
| JPH0228902B2 (2) | ||
| JP2751237B2 (ja) | 集積回路装置及び集積回路装置の製造方法 | |
| JPS58116764A (ja) | 半導体装置の製造方法 | |
| JPS6256670B2 (2) | ||
| JPH0325949B2 (2) | ||
| JPS58196056A (ja) | 半導体装置の製造方法 | |
| JP2821598B2 (ja) | 半導体集積回路装置の製造方法 | |
| JPS6381948A (ja) | 多層配線半導体装置 | |
| JPS6342417B2 (2) | ||
| JPS63169755A (ja) | 積層型半導体装置の製造方法 | |
| JPH0329321A (ja) | 半導体集積回路デバイスのコンタクトメタライゼーション | |
| JPH0376017B2 (2) | ||
| JPS6262056B2 (2) | ||
| JPH0127589B2 (2) | ||
| JPH0214791B2 (2) | ||
| JPS6360551B2 (2) | ||
| JP2553231B2 (ja) | 半導体装置及びその製造方法 | |
| JPS621269B2 (2) | ||
| KR940005707B1 (ko) | Al전극 배선의 평탄화 방법 | |
| JPH0257337B2 (2) | ||
| JPS6120141B2 (2) | ||
| KR100217916B1 (ko) | 반도체 소자의 베리어 금속층 형성방법 | |
| JPH07131029A (ja) | 薄膜トランジスタの製造方法 |