JPS63244873A - Semiconductor input protective device - Google Patents

Semiconductor input protective device

Info

Publication number
JPS63244873A
JPS63244873A JP62078714A JP7871487A JPS63244873A JP S63244873 A JPS63244873 A JP S63244873A JP 62078714 A JP62078714 A JP 62078714A JP 7871487 A JP7871487 A JP 7871487A JP S63244873 A JPS63244873 A JP S63244873A
Authority
JP
Japan
Prior art keywords
potential
transistor
input
output terminal
terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62078714A
Other languages
Japanese (ja)
Other versions
JPH0370379B2 (en
Inventor
Kazuyuki Uchida
内田 和幸
Yukihiro Saeki
佐伯 幸弘
Hiroaki Nakamura
浩章 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP62078714A priority Critical patent/JPS63244873A/en
Publication of JPS63244873A publication Critical patent/JPS63244873A/en
Publication of JPH0370379B2 publication Critical patent/JPH0370379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
    • H10D89/601Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
    • H10D89/811Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To provide input protection without the change of input characteristics caused by an input protector by a method wherein a negative potential or a potential higher than a VSS potential is applied to the gate electrode of a protective transistor. CONSTITUTION:The output of an oscillation circuit 1 is connected to the input terminal of a charge pump capacitor 2 through an amplifier 9. The output terminal 3 of the capacitor 2 is connected to two terminals of a 1st transistor 4 and one terminal of a 2nd transistor 5. The other one terminal of the transistor 4 is connected to a reference potential 6 and the other two terminals of the transistor 5 are connected to the output terminal 7 of a substrate bias generating circuit. When the potential of the output terminal 3 becomes higher than the reference potential 6, the transistor 4 is turned ON and a current is applied to the reference potential 6 to make the potential of the output terminal 3 a reference potential.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、半導体入力保護装置に関するもので、特に基
板バイアスの電位が接地電位または供給電位と異なる電
位である半導体装置の入力保護に使用されるものである
Detailed Description of the Invention [Object of the Invention] (Industrial Application Field) The present invention relates to a semiconductor input protection device, and particularly to a semiconductor device in which the substrate bias potential is different from the ground potential or the supply potential. It is used for input protection.

(従来の技術) 従来の半導体入力保護装置を第2図に示す。(Conventional technology) A conventional semiconductor input protection device is shown in FIG.

すなわち入力保護装置となるトランジスタT1およびT
2のゲートは、接地6(Vss)に接続されており、入
力端子11の電位が通常の動作範囲(Vc a −Vs
 sの範囲)ならば、トランジスタT1およびT2はカ
ット・オフ状態であり、本来、内部回路12へ影響を与
えない。
In other words, the transistors T1 and T which serve as input protection devices
2 is connected to the ground 6 (Vss), and the potential of the input terminal 11 is within the normal operating range (Vc a -Vs
s range), transistors T1 and T2 are in a cut-off state and essentially do not affect the internal circuit 12.

仮に入力端子11の電位が電源VCCよりも非常に高い
場合、主にトランジスタT1あるいはT2のブレークダ
ウン特性及びトランジスタアクションによって、V S
 SあるいはVCCに主にトランジスタT1あるいはT
2を介して電流を流し、内部回路12へ高エネルギーの
負担をなくす。
If the potential of the input terminal 11 is much higher than the power supply VCC, V S
Mainly transistor T1 or T is connected to S or VCC.
2, thereby eliminating the burden of high energy on the internal circuit 12.

入力端子11の電位が接地Vssよりも非常に低い場合
には、主にMOSトランジスタT2あるいはT1がオン
して電流を流し、内部回路12への保護を行なう。
When the potential of the input terminal 11 is much lower than the ground Vss, the MOS transistor T2 or T1 is mainly turned on and current flows to protect the internal circuit 12.

(発明が解決しようとする問題点) 本来入力保護装置は、通常のスペック(仕様)範囲の条
件のもとでは、トランジスタT1およびT2は完全にカ
ット・オフ状態となって、入力端子11および内部回路
12に影響を与えないことが必要であるのに対して、温
度が高いとき、保護トランジスタのチャンネル長が製造
バラツキ上狭くなってしまったとき、MOSトランジス
タのしきい値電圧ythが低目めになっているとき等、
上記温度、チャネル長、しきい値電圧等が許容範囲の中
にあっても、この入力保護装置のMOSトランジスタの
リーク電流が増加してしまう問題をもっている。
(Problem to be Solved by the Invention) Originally, in an input protection device, under conditions within the normal specification range, transistors T1 and T2 are completely cut off, and the input terminal 11 and internal It is necessary not to affect the circuit 12, but when the temperature is high or the channel length of the protection transistor becomes narrow due to manufacturing variations, it is necessary to lower the threshold voltage yth of the MOS transistor. When the
Even if the above-mentioned temperature, channel length, threshold voltage, etc. are within the permissible range, there is a problem in that the leakage current of the MOS transistor of this input protection device increases.

入力リーク(入力端子11におけるリーク電流)壷 のベツクがLSIでは規定されているため、トランジス
タTl、T2のリークがある゛と、なおざら上記スペッ
クを満足しにくくなる。
Since the input leakage (leakage current at the input terminal 11) base is specified in the LSI, if there is leakage from the transistors Tl and T2, it becomes even more difficult to satisfy the above specifications.

又、スペックを満足するため、保護トランジスタT1お
よびT2のチャンネル長をあらかじめ大きく設定してお
くと、本来の目的である保護としての役割不足になって
しまう。
Furthermore, if the channel lengths of the protection transistors T1 and T2 are set large in advance in order to satisfy the specifications, the protection transistors will not be able to fulfill their original purpose of protection.

本発明は、入力保護装置によって入力特性を変えること
な(、入力保護を行なうことを目的とする。
An object of the present invention is to perform input protection without changing input characteristics using an input protection device.

[発明の構成] (問題点を解決するための手段と作用)本発明は、第1
の電位と第2の電位の間で動作する半導体装置において
、入力端子と前記第1の電位あるいは第2の電位との間
に1個以上のトランジスタが接続され、かつ前記トラン
ジスタの入力ゲート端に第3の電位が接続され、前記第
3の電位は、前記第1の電位と第2の電位の間の範囲外
にあり、通常動作時は前記トランジスタをカット・オフ
状態にせしめ、前記入力端子に前記範囲外の電圧が印加
されたとき前記トランジスタに電流を流すことを特徴と
する半導体入力保護装置である。即ち例えば入力保護用
トランジスタがNチャンネルの場合、そのトランジスタ
T1及びT2の入力ゲートに、接地電位よりも低い電位
Vssを供給し、通常動作時にはT1.T2を完全にカ
ットオフ状態とし、入力リーク電流等のLSIの緒特性
に影響をおよぼさないようにした回路である。なお、通
常のNMO8LSIではマイナス電位発生回路を内蔵し
て動作スピードのアップ化をはかっており、上記保護回
路のために、上記マイナス電位発生回路を準備する必要
はない。
[Structure of the invention] (Means and effects for solving the problems) The present invention has the following features:
and a second potential, in which one or more transistors are connected between an input terminal and the first potential or the second potential, and an input gate terminal of the transistor is connected to the first potential or the second potential. a third potential is connected, the third potential being outside the range between the first potential and the second potential, causing the transistor to be cut off during normal operation; The semiconductor input protection device is characterized in that a current flows through the transistor when a voltage outside the range is applied to the semiconductor input protection device. That is, for example, when the input protection transistor is an N-channel transistor, a potential Vss lower than the ground potential is supplied to the input gates of the transistors T1 and T2, and during normal operation, T1. This is a circuit in which T2 is completely cut off so that it does not affect the LSI characteristics such as input leakage current. Note that a normal NMO8LSI has a built-in negative potential generation circuit to increase the operation speed, and there is no need to prepare the negative potential generation circuit for the protection circuit.

(実施例) 以下図面を参照して本発明の一実施例を説明する。第1
図は同実施例の回路図であるが、これは前記のものと対
応させた場合の例であるから、対応個所には同一符号を
用いる。ここで基板バイアス発生回路21は、Nチャン
ネル・トランジスタの場合、基準電位(Vs s )よ
り低い電位を基板バイアスとして与えるものであり、多
くの製品出力を、増幅器9を介してチャージ・ポンプ・
キャパシタ2の入力端に接続する。前記チャージ・ポン
プ・キャパシタ2の出力端3を、第1のトランジスタ4
の2端子および第2のトランジスタ5の1端子に接続し
、第1のトランジスタ4の他の1端子を基準電位6に接
続し、第2のトランジスタ5の別の2端子を基板バイア
ス発生回路の出力すなわち、前記発4回路1によって発
生した連続パルスを、前記キャパシタ2によって前記出
力端3を遷移させる。前記出力端3の電位が前記基準電
位6よりも高くなった場合、前記第1のトランジスタ4
がオン状態になり、前記基準電位6に電流を流し、前記
出力端3の電位を前記基準電位にする。逆に、前記出力
端3の電位が前記基準電位6よりも低い場合、前記第1
のトランジスタ4はオフ状態になり、前記出力端3の電
位を保持する。
(Example) An example of the present invention will be described below with reference to the drawings. 1st
The figure is a circuit diagram of the same embodiment, but since this is an example in which it corresponds to the one described above, the same reference numerals are used for corresponding parts. Here, in the case of an N-channel transistor, the substrate bias generation circuit 21 provides a potential lower than the reference potential (Vs s ) as a substrate bias, and many product outputs are sent to the charge pump via the amplifier 9.
Connect to the input terminal of capacitor 2. The output terminal 3 of the charge pump capacitor 2 is connected to a first transistor 4.
and one terminal of the second transistor 5, the other one terminal of the first transistor 4 is connected to the reference potential 6, and the other two terminals of the second transistor 5 are connected to the substrate bias generating circuit. The output, ie, the continuous pulses generated by the generator circuit 1, is caused to transition at the output terminal 3 by the capacitor 2. When the potential of the output terminal 3 becomes higher than the reference potential 6, the first transistor 4
turns on, current flows through the reference potential 6, and the potential of the output terminal 3 is set to the reference potential. Conversely, when the potential of the output terminal 3 is lower than the reference potential 6, the first
The transistor 4 is turned off and the potential of the output terminal 3 is maintained.

次に、前記基板バイアス発生回路の出力端7の電位が前
記出力端3より高い場合、前記第2のトランジスタ5が
オン状態になり、前記基板バイアス出力端7の電位を、
前記出力端3の電位にする。
Next, when the potential of the output terminal 7 of the substrate bias generation circuit is higher than the output terminal 3, the second transistor 5 is turned on, and the potential of the substrate bias output terminal 7 is changed to
The potential of the output terminal 3 is set.

逆に、前記基板バイアス出力端7の電位が前記出力端3
よりも低い場合、前記第2のトランジスタ5はオフ状態
になり、前記基板バイアス出力端7の電位を保持する。
Conversely, the potential of the substrate bias output terminal 7 is the same as that of the output terminal 3.
If the voltage is lower than , the second transistor 5 is turned off and the potential of the substrate bias output terminal 7 is maintained.

以上のようにして、前記基板バイアス回路出力端子7の
電位はマイナス電位V日Bに保持される。
As described above, the potential of the substrate bias circuit output terminal 7 is held at the negative potential VB.

しかして上記NチャンネルトランジスタT1およびT2
の入力ゲートをVssよりも低い電位のvseと接続す
ることによって、通常の動作電位範囲においては、トラ
ンジスタT1およびT2のゲート−ソース間電位をマイ
ナス電位になるようにして、トランジスタT1およびT
2をリーク電流のない完全なカット・オフ状態にする。
Therefore, the N-channel transistors T1 and T2
By connecting the input gate of transistors T1 and T2 to VSE, which has a potential lower than VSS, the gate-source potential of transistors T1 and T2 becomes a negative potential in the normal operating potential range.
2 into a complete cut-off state with no leakage current.

入力端子11の電位が電源■。。よりも非常に高い場合
は、トランジスタT1またはT2のブレークダウン特性
及びトランジスタアクションによって、VssまたはV
。Cにトランジスタを介して電流を流し、内部回路12
へ高エネルギーを与えず吸収する。
The potential of input terminal 11 is the power supply ■. . Vss or Vss, depending on the breakdown characteristics and transistor action of transistor T1 or T2.
. A current is passed through the transistor through the internal circuit 12.
Absorbs high energy without giving it to.

又、入力端子11の電位がVssより非常に低い場合に
は、MOS トランジスタT1.T2が動作して電流を
流し、内部回路12の保護をする。
Further, when the potential of the input terminal 11 is much lower than Vss, the MOS transistor T1. T2 operates to pass current and protect the internal circuit 12.

基板バイアス発生回路(マイナス電位VBB発生)21
は通常のNMO8LSIでは具備されており、基板電位
をマイナスにすることにより、拡散容量を下げて動作ス
ピードの向上をはかつている。
Substrate bias generation circuit (minus potential VBB generation) 21
is provided in a normal NMO8LSI, and by making the substrate potential negative, the diffusion capacitance is lowered and the operation speed is improved.

そのため、この入力保護装置のマイナス電位供給に対し
て、あらたに準備するものではない。
Therefore, no new preparations are made for the supply of negative potential to this input protection device.

なお本発明は実施例のみに限られることなく種々の応用
が可能である。例えば実施例では、入力保護トランジス
タT1.T2をNチャンネルとしたが、Pチャンネルを
用いた基板バイアス発生回路の場合、トランジスタT1
.T2をPチャンネルMOSトランジスタとすることも
できる。また本発明にあってはトランジスタT1.T2
のうちいずれか一方を用いる場合にも適用できる。
Note that the present invention is not limited to the embodiments, and can be applied in various ways. For example, in the embodiment, input protection transistors T1. Although T2 is an N-channel, in the case of a substrate bias generation circuit using a P-channel, the transistor T1
.. T2 can also be a P-channel MOS transistor. Further, in the present invention, the transistor T1. T2
It can also be applied when using either one of them.

〔発明の効果〕〔Effect of the invention〕

従来の保護回路方式であると保護回路としての役割は果
たすが、温度条件が厳しくなった場合、保護トランジス
タのチャンネル幅が狭くなったとき、MoSトランジス
タのしきい値電圧が低目であるとき等、動作条件がスペ
ックの範囲内であっこれに対し、本発明は保護トランジ
スタのゲート電極に、マイナス電位(NチャンネルMO
Sトランジスタの場合)またはVSS電位より高い電位
(PチャンネルMOSトランジスタの場合)を供給する
ことにより、通常の動作時において、まったく緒特性に
影響をおよぼさない利点をもった入力保護装置である。
The conventional protection circuit method fulfills its role as a protection circuit, but it can be used when temperature conditions become severe, when the channel width of the protection transistor becomes narrow, or when the threshold voltage of the MoS transistor is low. , the operating conditions are within the specification range, whereas the present invention has a negative potential (N-channel MO) applied to the gate electrode of the protection transistor.
This is an input protection device that has the advantage of not affecting the initial characteristics at all during normal operation by supplying a potential higher than the VSS potential (for P-channel MOS transistors) or VSS potential (for P-channel MOS transistors). .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す回路図、第2図は従来
装置の回路図である。 11・・・入力端子、12・・・内部回路、21・・・
マイナス電位発生回路、T1.T2・・・入力保護トラ
ンジスタ。 出願人代理人 弁理士 鈴 江 武 愚策1図 第2図
FIG. 1 is a circuit diagram showing an embodiment of the present invention, and FIG. 2 is a circuit diagram of a conventional device. 11...Input terminal, 12...Internal circuit, 21...
Negative potential generation circuit, T1. T2...Input protection transistor. Applicant's agent Patent attorney Takeshi Suzue Foolish plan Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 第1の電位と第2の電位の間で動作する半導体装置にお
いて、入力端子と前記第1の電位あるいは第2の電位と
の間に1個以上のトランジスタが接続され、かつ前記ト
ランジスタの入力ゲート端に第3の電位が接続され、前
記第3の電位は、前記第1の電位と第2の電位の間の範
囲外にあり、通常動作時は前記トランジスタをカット・
オフ状態にせしめ、前記入力端子に前記範囲外の電圧が
印加されたとき前記トランジスタに電流を流すことを特
徴とする半導体入力保護装置。
In a semiconductor device that operates between a first potential and a second potential, one or more transistors are connected between an input terminal and the first potential or the second potential, and an input gate of the transistor is connected to the semiconductor device. A third potential is connected to the end, the third potential is outside the range between the first potential and the second potential, and cuts the transistor during normal operation.
A semiconductor input protection device characterized in that the transistor is turned off and a current flows through the transistor when a voltage outside the range is applied to the input terminal.
JP62078714A 1987-03-31 1987-03-31 Semiconductor input protective device Granted JPS63244873A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62078714A JPS63244873A (en) 1987-03-31 1987-03-31 Semiconductor input protective device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62078714A JPS63244873A (en) 1987-03-31 1987-03-31 Semiconductor input protective device

Publications (2)

Publication Number Publication Date
JPS63244873A true JPS63244873A (en) 1988-10-12
JPH0370379B2 JPH0370379B2 (en) 1991-11-07

Family

ID=13669539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62078714A Granted JPS63244873A (en) 1987-03-31 1987-03-31 Semiconductor input protective device

Country Status (1)

Country Link
JP (1) JPS63244873A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03232269A (en) * 1990-02-07 1991-10-16 Mitsubishi Electric Corp Input circuit of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03232269A (en) * 1990-02-07 1991-10-16 Mitsubishi Electric Corp Input circuit of semiconductor device

Also Published As

Publication number Publication date
JPH0370379B2 (en) 1991-11-07

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