JPS63249145A - mask cleaning equipment - Google Patents
mask cleaning equipmentInfo
- Publication number
- JPS63249145A JPS63249145A JP62083153A JP8315387A JPS63249145A JP S63249145 A JPS63249145 A JP S63249145A JP 62083153 A JP62083153 A JP 62083153A JP 8315387 A JP8315387 A JP 8315387A JP S63249145 A JPS63249145 A JP S63249145A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- arm
- chuck
- mask cleaning
- cleaning equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、ウェハを製造するときに使用するマスクを
洗浄するためのマスク洗浄装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a mask cleaning apparatus for cleaning masks used when manufacturing wafers.
第６図および第４図は従来のマスク洗浄装置のマスク搬
送部の一例を示す模式構成歯で、（１）はマスク、（４
）は上方にあるシリンダー等（図示せず）で矢印方向に
開閉するアームＢ％（５）はマスク（１）を収納可能な
溝を有しかつアームＢ（４）に固定されているチャック
Ｂである。FIGS. 6 and 4 are schematic configuration teeth showing an example of a mask conveying section of a conventional mask cleaning device, in which (1) is a mask, (4)
) is an arm B that opens and closes in the direction of the arrow with a cylinder or the like (not shown) located above (5) is a chuck B that has a groove that can accommodate the mask (1) and is fixed to arm B (4). It is.
次に動作について説明する。マスクを洗浄する際には、
マスクを装置内で移動させる必要がある。それで、マス
ク（１）を保持するために、アームＢ（４）がマスク（
１）のおかれているところまで移動してからアームＢ（
４）が閉じ、チャックＢ（５）にもうけられた溝にマス
ク（１）をはさみこんでから移動する。Next, the operation will be explained. When cleaning the mask,
The mask must be moved within the device. So, in order to hold the mask (1), arm B (4)
1), then move arm B (
4) is closed, the mask (1) is inserted into the groove made in the chuck B (5), and then moved.
従来のマスク洗浄装置では、以上のように構成されてい
るため異なるサイーズのマスクを搬送するためには、ア
ームＢ（４）の閉じ清および、チャックＢ（５）のアー
ムＢ（４）への取付位置を変更する必要があった。Conventional mask cleaning equipment is configured as described above, so in order to transport masks of different sizes, it is necessary to close and clean arm B (4) and move chuck B (5) to arm B (4). It was necessary to change the mounting position.
この発明は上記のような問題点を解消するためになされ
たもので、異なるサイズのマスクをアーム等の調整なし
に搬送できるマスク洗浄装置を得ることを目的とする。The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a mask cleaning device that can transport masks of different sizes without adjusting the arm or the like.
この発明に係るマスク洗浄装置はマスクを搬送アームが
すくいあげ、マスク下方端面の２点にてマスクを支える
構造にしたものである。The mask cleaning device according to the present invention has a structure in which a transport arm scoops up the mask and supports the mask at two points on the lower end surface of the mask.
この発明においては、マスク下方端面の２点にてマスク
を支えて保持搬送するため、基本的にフリーサイズのマ
スクを同一の搬送アームで何ら調整変更せずとも保持搬
送できる。In this invention, since the mask is supported and conveyed at two points on the lower end surface of the mask, basically a free-size mask can be held and conveyed with the same conveyance arm without any adjustment changes.
以下、この発明の一実施例を図について説明する。第１
図において、（１）はマスク、（２）はマスク（１）を
ささえるアームＡｍ（３）はマスク（１）を収納可能な
溝を有しかつアームＡ（２）に固定されているチャック
Ａである。An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, (1) is a mask, (2) is an arm Am (3) that supports the mask (1), and has a groove that can accommodate the mask (1), and a chuck A that is fixed to the arm A (2). It is.
このような構、成において、マスクを洗浄のため装置内
で移動させる際には、マスク（１）を保持するために、
アームＡ（２）がマスク（１）のおかれているところま
で移動してから、アーム（２）が上昇し、チャックＡ（
５）の溝にマスク（１）がはいりこみ、その後マスク搬
送部が移動する。In such a configuration, when moving the mask within the apparatus for cleaning, in order to hold the mask (1),
After arm A (2) moves to the place where mask (1) is placed, arm (2) rises and chuck A (
The mask (1) fits into the groove 5), and then the mask transport section moves.
なお、上記実施例では、アームＡ（２）にチャックＡ（
３）をとりつけたものを示したが、チャックＡ（３）に
設けた溝を直接アームＡ（２）に設けてもよい。In the above embodiment, arm A (2) is equipped with chuck A (
3) is shown, but the groove provided in chuck A (3) may be provided directly in arm A (2).
以上のように、この発明によれば異なるサイズのマスク
を一種類のマスク搬送部により搬送することが可能にな
るため、装置が安価にでき、またマスクのサイズを変え
るたびに搬送部の調整をやりなおす手間を省略できるた
め生産性が向上する。As described above, according to the present invention, it is possible to transport masks of different sizes using one type of mask transport section, which makes the device inexpensive and requires adjustment of the transport section every time the mask size is changed. Productivity is improved because the trouble of redoing can be omitted.
第１図はこの発明の一実施例によるマスク洗浄装置のマ
スク搬送部を示す図、第２図はマスクがはいる溝を有す
るチャックの斜視図、第５図は従来のマスク洗浄装置の
マスク搬送部を示す図、第４図は従来のチャックを示す
斜視図である。
図において、（１）はマスク、（２）はアームＡ％（３
）はチャックＡ、（４）はアームＢ％（５）はチャック
Ｂである。
なお図中、同一符号は同一または相当部分を示す。
代理人 弁理士 大 岩 増 雄埠１図
第３図
５＋ｒｙりＢFIG. 1 is a diagram showing a mask conveying section of a mask cleaning apparatus according to an embodiment of the present invention, FIG. 2 is a perspective view of a chuck having a groove into which a mask is inserted, and FIG. 5 is a mask conveying section of a conventional mask cleaning apparatus. FIG. 4 is a perspective view showing a conventional chuck. In the figure, (1) is the mask, (2) is the arm A% (3
) is chuck A, (4) is arm B, and (5) is chuck B. In the drawings, the same reference numerals indicate the same or corresponding parts. Agent: Patent Attorney Masu Oiwa
Claims (3)
浄装置において、マスク下方端面の２点にてマスクをさ
さえて移動させることを特徴としたマスク洗浄装置。(1) A mask cleaning device that moves a mask while standing vertically, characterized in that the mask is moved while being supported at two points on the lower end surface of the mask.
に広がつた部分を有するように支持される特許請求の範
囲第１項記載のマスク洗浄装置。(2) The mask cleaning device according to claim 1, wherein the mask is supported so as to have a portion extending further downward between two points on the lower end face of the mask.
はマスクの縁部が挿入される溝を有している特許請求の
範囲第１項または第２項記載のマスク洗浄装置。(3) The mask cleaning device according to claim 1 or 2, wherein each portion supporting the mask at two points on the lower end face of the mask has a groove into which an edge of the mask is inserted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62083153A JPS63249145A (en) | 1987-04-03 | 1987-04-03 | mask cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62083153A JPS63249145A (en) | 1987-04-03 | 1987-04-03 | mask cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63249145A true JPS63249145A (en) | 1988-10-17 |
Family
ID=13794290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62083153A Pending JPS63249145A (en) | 1987-04-03 | 1987-04-03 | mask cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63249145A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100770147B1 (en) | 2006-01-04 | 2007-10-30 | 코리아테크노(주) | Mask take out device |
-
1987
- 1987-04-03 JP JP62083153A patent/JPS63249145A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100770147B1 (en) | 2006-01-04 | 2007-10-30 | 코리아테크노(주) | Mask take out device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR950034476A (en) | Processing device of the object | |
| EP1146159A3 (en) | Mattress handling apparatus | |
| DE3889473D1 (en) | Device for handling a wafer. | |
| KR970072292A (en) | Wafer Transfer Device | |
| JPH045837A (en) | Apparatus and method for conveying semiconductor frame | |
| DE69113553D1 (en) | Interface device for transporting substrates between processing devices. | |
| DE69103748D1 (en) | Carrier cassette for semiconductor wafers. | |
| JPS63249145A (en) | mask cleaning equipment | |
| DE3577820D1 (en) | ROBOT GRIPPER FOR FRAME FROM INTEGRATED CIRCUITS. | |
| JPH02174244A (en) | Tool frame for wafer carrier and wafer shifting device | |
| JPS62136428A (en) | Rectangular mask substrate transfer device | |
| JP2846423B2 (en) | Disk centering device | |
| JPH07153816A (en) | Substrate transferring method and equipment | |
| DE69031212D1 (en) | Edge exposure process for semiconductor wafers | |
| JP3269702B2 (en) | Lead frame positioning method and transport method in semiconductor device manufacturing | |
| KR100641497B1 (en) | Transfer arm of the transport robot with fixed protrusion | |
| JP2001217597A (en) | Fixing method for electronic component mounting board | |
| JPS6334947A (en) | Jig for wafer transport | |
| JP3042598B2 (en) | Substrate transfer device | |
| JPH034029Y2 (en) | ||
| JPH04365534A (en) | Workpiece reversal conveyance device | |
| JPH0325903Y2 (en) | ||
| JP3173038B2 (en) | Mounter for irregular shaped wafers | |
| DE69112613D1 (en) | Carrier cassette for semiconductor wafers. | |
| KR0117497Y1 (en) | Position measurement apparatus of handle arm |