JPS6327721B2 - - Google Patents
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- Publication number
- JPS6327721B2 JPS6327721B2 JP56183254A JP18325481A JPS6327721B2 JP S6327721 B2 JPS6327721 B2 JP S6327721B2 JP 56183254 A JP56183254 A JP 56183254A JP 18325481 A JP18325481 A JP 18325481A JP S6327721 B2 JPS6327721 B2 JP S6327721B2
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- Prior art keywords
- deviation
- signal
- flow rate
- control
- controller
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D9/00—Level control, e.g. controlling quantity of material stored in vessel
- G05D9/12—Level control, e.g. controlling quantity of material stored in vessel characterised by the use of electric means
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Feedback Control In General (AREA)
Description
【発明の詳細な説明】
本発明は例えば濃縮器の液位制御等に使用する
多変数系プロセス制御装置の改良に関する。
従来、多変数系プロセス制御装置において古典
的なP・I・D制御方式(いわゆるP・I・D調
節計)を用いたものでは次のような問題点があ
る。
多変数系プロセスの入出力信号は1入力1出
力制御系の組み合わせで割り振らなければなら
ない。
多変数系プロセスの入出力間は、1対1で対
応せず、相互に干渉を持つ場合には全体を同時
に考慮してパラメータを決定する必要があるた
め煩雑である。
多変数系プロセスは1入力1出力系でのパラ
メータの選定しかできないため、安定性の範囲
が全体から見ると狭くなり、また試行錯誤の状
態で決定する必要があるため最適性を評価する
ことが難しい。
以上のような問題点は特に蒸発缶液位制御系の
場合に顕著である。以下、その蒸発缶液位制御系
にP・I・D調節計を用いたプロセス制御装置に
ついて第1図を参照して説明する。即ち、このプ
ロセス制御装置は、給液流量を給液流量調節弁1
を介して蒸発缶2に供給するとともに、同蒸発缶
2内の液位を液位検出器3で検出し、この検出値
を偏差演算器4で設定値lと比較して偏差を求め
る。そして、この偏差をP・I・D調節計5で
P・I・D演算を行なつて操作量を求めた後、こ
の操作量を用いて、加熱蒸気流量調節弁6を操作
し適切な加熱蒸気流量を蒸発缶2に供給すること
により、蒸発缶2内の液位を制御するものであ
る。図中7は給液流量設定器、8は蒸発蒸気流量
排出管、9は濃縮液排出弁である。
しかし、このプロセス制御装置は、給液流量と
加熱蒸気流量との両方が蒸発缶液位の操作量とな
るために、P・I・D調節計5では同時に2つの
量を制御できず安定なプロセス制御が望めない。
また、蒸発缶液位を一定制御する一方、給液流量
は濃縮器の処理量として任意に設定しなければな
らない問題がある。さらに給液流量調節弁1は設
定器7により半固定で一定値制御とし、蒸発缶液
位の制御は専ら加熱蒸気流量の操作だけに頼らな
ければならないため給液流量の設定変更や蒸発缶
内濃縮液の一部分排出などの液位への外乱発生時
の液位制御の応答性及び安定性に大きな影響を及
ぼす。
第2図は濃縮器プロセスを計算機によりシユミ
レートし、加熱蒸気流量のみを操作した場合の蒸
発缶液位の外乱特性を示している。但し、給液流
量0.1l/min変動時の例である。
一方、現代制御理論の一手法を採り入れた最適
レギユレータ法によれば、システムを下記する(1)
式の状態方程式で表わし、この方程式を(2)式のリ
ツカチ方程式で解くと最適制御の評価関数は(3)式
により最適解として求めることができる。
x=Ax+Bv …(1)
v=R-1BTπx …(2)
J=∫∞ 0(xPxT+vQvT)dt …(3)
但しA,Bはシステムを表わす行列,vは入
力、xは出力、Rはリツカチ方程式の正定行列、
πはリツカチ方程式の解,PQは正定行列である。
ところが、この最適レギユレータ法は、以下に
述べる問題点を有することから全面的に適用する
には問題が多い。
先ずシステムを完全に状態方程式で表わすこ
とが難しいこと。
リツカチ方程式の解により評価関数を最小に
する上でシステムの過渡応答性と安定性の比重
を決める評価関数中の荷重係数行列P,Qの値
を求めるのは、人間の試行錯誤によらねばなら
なく容易でない。
最適レギユレータ法を多変数率プロセスに全
面的に適用しようとすると、状態方程式の次数
が高くなり、リツカチ方程式の解を計算にて正
確に得ることが難しい。
たとえ解が得られたとしても、状態方程式の
パラメータは実プラントで計測できないシステ
ムの内部状態(エンタルピーなど)であること
が多く、またリツカチ方程式の解の次数が高く
なるとそれを実現する演算器を製作することが
難しいなどのハードウエア上の問題がある。
以上の問題点は蒸発缶液位制御系に於ても妥当
する。この場合、(1)式で表わすプロセス制御装置
において液位および給液流量と設定値との偏差を
最小とするには第3図に示すように給液流量流入
管路11に新たに給液流量検出器12を設け、そ
れぞれの検出器3,12の出力と設定値m・lと
の偏差を求め、これらの偏差と積分器13,14
の出力とを多変数制御部15に入力し、ここで給
液流量と加熱蒸気流量の操作量を求めた後、それ
ぞれの操作量を調節弁1,6に加えて制御する4
次入力システムとしている。図中、16は偏差演
算器である。
従つて、以上のように従来の古典的制御系にお
きかえた場合、制御パラメータは最低限P(比
例),I(積分),D(微分),D2(2次微分)の4
つが必要となる。この結果、最適解を求める計算
が難しくなる。第4図は第2図の古典的制御手段
と同じ条件下で得た過渡応答特性図である。
このように従来の多変数系プロセス制御装置で
は、古典的P・I・D制御方式を用いると同時に
2つ以上の操作量を取扱えない不具合があり、ま
た最適レギユレータ法をそのまま用いるとシステ
ムの次数(次元)が高くなり、レギユレータの計
算が困難となる欠点がある。
本発明は上記実情にかんがみてなされたもの
で、古典的なP・I・D制御と現代的な制御とを
組合わせて同時に2以上の操作量を取扱かうこと
を可能とし、かつシステムの次数を低くしてレギ
ユレータの設計を容易にし、さらに外乱時におけ
る液位の過度応答特性および安定性の改善を図る
多変数系プロセス制御装置を提供することを目的
とする。
以下、本発明の一実施例について第5図ない
し、第7図を参照して説明する。なお、第5図は
本発明装置を2入力1出力多変数プロセスに適用
した原理構成図、第6図は蒸発缶液位制御系に適
用した一具体例を示す構成図、第7図は第6図の
一部を具体化した信号処理構成図である。先ず、
本発明装置は、第5図に示すように現在制御理論
に基づく最適制御系21と、この最適制御系21
の出力を用いて操作量を得る古典的制御器22と
からなり、最適制御系21はプロセス211と状
態変数フイードバツク形制御器212とで一巡フ
イードバツク制御系を構成し、前記プロセス21
1から出力された制御量bと設定値lとの偏差か
ら状態変数を考慮した操作量Cを求めてプロセス
211に入力する構成である。一方、古典的制御
器22は、最適制御系21を包括するフイードバ
ツクループを形成し、この制御器22で得た制御
信号で制御対象mを制御してプロセス211のも
う1つの操作量aを得る構成である。この時、古
典的制御器22はトータルフイードバツクとして
伝達関数の極及び零点の配置が最適になるよう根
軌跡法(又は極配置法)により演算式を求める。
次に、第6図は蒸発缶液位制御系に適用した一
具体例である。この制御系は給液流量m1を給液
流量調節弁31で流量調節を行つた後蒸発缶32
に供給する。この蒸発缶32内の流体は、加熱蒸
気流量調節弁33を介して加熱管34に導入され
る加熱蒸気m2によつて加熱蒸発され濃縮され
る。この加熱蒸気は加熱蒸気排出路35から出力
され、一方濃縮液は濃縮液排出弁36を通つて排
出される。37は液位検出器であつて、この検出
器37から出力された蒸発缶32内の流体液位信
号は偏差演算器38に送られ、ここで液位設定値
lと比較して偏差信号が得られる。39は状態変
数フイードバツク形制御器であつて、これは偏差
信号を入力とし、かつシステムの次数(この場合
1入力1出力)より1次高い信号を積分器40よ
り得て状態変数形フイードバツク演算式により操
作量を求め、この操作量を加熱蒸気流量調節弁3
3に導入し加熱蒸気流量を制御する構成である。
また、41は前記古典制御器22に相当する制御
器であつて、前記状態変数フイードバツク形制御
器39の出力および偏差信号を用いて演算を行つ
た後、この制御器41の出力を偏差演算器42に
入れ給液流量設定値hと比較して偏差を求め、こ
の偏差信号を給液流量調節弁31に供給して給液
流量の操作の用に供する構成である。なお、第7
図は第6図に示す制御器39、積分器40および
制御器41で行なう演算式および信号処理構成を
示す図である。なお、第7図において51は状態
変数フイードバツク形制御器を用いて最適レギユ
レータ法により状態フイードバツク出力を得る部
分であつて、第5図の最適制御系21に相当す
る。52,53は状態変数フイードバツク形制御
器の出力および偏差信号を受け、古典制御器を用
いて根軌跡法により安定解析を行うものであつ
て、第5図の古典制御器22に相当する。53は
状態変数合成マトリクスを意味する。
次に、以上のように構成される装置の作用を説
明する。先ず、液位検出器37で得た蒸発缶32
の液位信号は偏差演算器38に入力され、ここで
液位設定値lと比較して液位偏差信号を得、この
信号をそのままおよび積分器40を介して状態変
数フイードバツク形制御器39に入力する。ここ
で同制御器39は蒸発缶32の液位偏差信号およ
び偏差積分信号を最小にすべく第7図に表わす
Kp1(1fT1・1/S+TD1・S)なる演算式を用いて
演算を行ない操作量を求める。
ここで、状態変数フイードバツク形制御器39
の作用を説明する。
つまり上述した様に蒸発缶液位ループとして
は、加熱蒸気を入力、液位を出力とする状態方程
式で記述し、その評価関数を最小にする値がリツ
カチの方程式の解により与えられるわけである。
具体的には、制御器39の演算式は蒸発缶液位の
偏差および偏差積分信号を最小にするような加熱
蒸気流量の操作量との関係から求まる。このと
き、状態の検出を実際測定される量(例えば流
量、液位)に換算するため、給液流量と加熱蒸気
流量の2入力を第7図に示す状態変数合成マトリ
ツクス53により合成している。また制御器41
の特性として負の係数(TD2)をもつ微分動作を
挿入したことも特徴とする所である。制御器39
は給液流量を外乱とし、加熱蒸気流量を制御入力
(操作量)とした蒸発缶液位制御系が最適に決定
されるわけであるが、実際は加熱蒸気流量を操作
するだけでは充分な過渡応答性のもつた液位制御
とすることは難しい。そこで、制御器39を含む
範囲を制御対象とした1入力1出力システム(入
力:給液流量、出力:蒸発缶液位)を考え、この
制御を制御器41により実行する。
なお、制御器41の演算式としては、1入力1
出力システムの極及び零点から考えると右平面の
極の存在をなくし、安定な左平面へ極を移すには
p動作だけではなく負の係数を持つP・D動作と
し、右平面に零点を配置した方がシステムの収束
性にすぐれていることがわかる。D動作の係数
TD2は−∞から+∞まで変化させた時の適当な負
の値に選んで、その根軌跡図から、ゲイン(p定
数)を決定することにより制御器41の演算式を
定める。
この制御器41は、積分動作を含まないため液
位偏差入力が零で安定な時に出力が零となり、給
液流量との偏差出力信号は給液流量のみとなるた
めに定常時は給液流量設定が任意に行なえるシス
テムでもある。
ここに、本制御方式を用いれば、外乱等の過渡
変化時に、結果的には、加熱蒸気流量と給液流量
の両方を同時に操作可能な制御系の設計が達成さ
れることになり、良好な制御結果が期待できる。
なお、第8図は第2図、第4図と同一外乱条件で
の制御結果を示す図である。
従つて、本発明は以上のように構成したので、
古典制御方式では達成できない、2入力1出力の
制御系の構成が可能であり、より良い制御結果が
得られる。また現代制御理論の適用を効果的に行
いかつ、最小限に押えることにより、システムの
次数を少なくし、制御系の設計を容易にすること
ができる。
また、制御結果の成績を最適レギユーレータだ
けに頼らず、極配置法も併用することにより、現
状ハードウエアで達成可能な制御系を構成するこ
とができた。
特に、蒸発缶液位制御系においては、液位偏差
の収束性(過渡応答性)、安定性を向上させるだ
けでなく、定常時には給液流量の任意・設定も可
能であり、単位時間当りの蒸発処理量を定めるた
め、運転操作上も優れた制御システム、を実現で
きる多変数系プロセス制御装置を提供できる。 DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a multivariable process control device used, for example, to control the liquid level of a concentrator. Conventionally, multivariable process control devices using the classic P.I.D control method (so-called P.I.D. controller) have the following problems. The input and output signals of a multivariable process must be allocated in combinations of one input and one output control system. There is no one-to-one correspondence between the inputs and outputs of a multivariable process, and if there is mutual interference, it is necessary to determine parameters by considering the whole at the same time, which is complicated. In a multivariable process, parameters can only be selected for a one-input, one-output system, so the range of stability is narrow overall, and it is difficult to evaluate optimality because decisions need to be made through trial and error. difficult. The above-mentioned problems are particularly noticeable in the case of the evaporator liquid level control system. Hereinafter, a process control device using a P.I.D controller in the evaporator liquid level control system will be described with reference to FIG. That is, this process control device controls the supply liquid flow rate by adjusting the supply liquid flow rate control valve 1.
At the same time, the liquid level in the evaporator 2 is detected by a liquid level detector 3, and this detected value is compared with a set value l by a deviation calculator 4 to obtain a deviation. Then, after performing P-I-D calculation on this deviation using the P-I-D controller 5 to obtain a manipulated variable, the heated steam flow rate control valve 6 is operated using this manipulated variable to achieve appropriate heating. The liquid level in the evaporator 2 is controlled by supplying the vapor flow rate to the evaporator 2. In the figure, 7 is a liquid supply flow rate setting device, 8 is an evaporated steam flow rate discharge pipe, and 9 is a concentrated liquid discharge valve. However, in this process control device, since both the feed liquid flow rate and the heated steam flow rate are the manipulated variables for the evaporator liquid level, the P/I/D controller 5 cannot control the two quantities at the same time, resulting in unstable stability. Process control is not possible.
Another problem is that while the evaporator liquid level is controlled to be constant, the flow rate of liquid supplied must be arbitrarily set as the throughput of the concentrator. Furthermore, the liquid supply flow rate control valve 1 is semi-fixed and controlled at a constant value by the setting device 7, and the control of the evaporator liquid level must rely solely on the operation of the heated steam flow rate. This has a significant impact on the responsiveness and stability of liquid level control when a disturbance to the liquid level occurs, such as when a part of the concentrated liquid is discharged. FIG. 2 shows the disturbance characteristics of the evaporator liquid level when the concentrator process is simulated by a computer and only the heated steam flow rate is manipulated. However, this is an example when the liquid supply flow rate fluctuates by 0.1l/min. On the other hand, according to the optimal regulator method, which incorporates a method of modern control theory, the system is as follows (1)
By solving this equation using the Ritsukachi equation (2), the optimal control evaluation function can be determined as an optimal solution using equation (3). x=Ax+Bv …(1) v=R -1 B T π x …(2) J=∫ ∞ 0 (xPx T +vQv T )dt …(3) However, A and B are matrices representing the system, v is the input, x is the output, R is the positive definite matrix of Ritsukachi equation,
π is the solution to Ritsukachi's equation, and PQ is a positive definite matrix. However, this optimal regulator method has many problems to be fully applied due to the following problems. First, it is difficult to completely represent a system using an equation of state. The values of the weighting coefficient matrices P and Q in the evaluation function, which determine the weight of the transient response and stability of the system when minimizing the evaluation function by solving the Ritsukachi equation, must be determined by human trial and error. It's not easy. If the optimal regulator method is applied completely to a multivariate rate process, the order of the state equation becomes high, making it difficult to accurately obtain a solution to the Ritsukachi equation by calculation. Even if a solution is obtained, the parameters of the state equation are often internal states of the system (such as enthalpy) that cannot be measured in the actual plant, and if the order of the solution to the Ritsukachi equation becomes high, the calculation unit that realizes it is required. There are hardware problems such as difficulty in manufacturing. The above problems also apply to the evaporator liquid level control system. In this case, in order to minimize the deviation between the liquid level, the feed liquid flow rate, and the set value in the process control device expressed by equation (1), it is necessary to newly supply liquid to the feed liquid flow inflow pipe 11 as shown in Fig. 3. A flow rate detector 12 is provided, the deviation between the output of each of the detectors 3 and 12 and the set value m·l is determined, and these deviations and the integrators 13 and 14 are calculated.
4 is inputted into the multivariable control unit 15, where the manipulated variables of the supply liquid flow rate and the heated steam flow rate are determined, and then the respective manipulated variables are added to the control valves 1 and 6 to control the control valves 1 and 6.
This is the next input system. In the figure, 16 is a deviation calculator. Therefore, when replacing the conventional classical control system as described above, the control parameters are at least 4: P (proportional), I (integral), D (differential), and D 2 (secondary derivative).
is required. As a result, calculations to find the optimal solution become difficult. FIG. 4 is a transient response characteristic diagram obtained under the same conditions as the classical control means of FIG. As described above, conventional multivariable process control equipment has the disadvantage that it cannot handle two or more manipulated variables at the same time when using the classic P-I-D control method, and if the optimal regulator method is used as is, the system This has the disadvantage that the order (dimension) becomes high, making it difficult to calculate the regulator. The present invention has been made in view of the above-mentioned circumstances, and it combines classical P-I-D control and modern control, making it possible to handle two or more manipulated variables at the same time, and increasing the order of the system. It is an object of the present invention to provide a multivariable process control device that facilitates the design of a regulator by lowering the temperature, and further improves transient response characteristics and stability of liquid level during disturbances. Hereinafter, one embodiment of the present invention will be described with reference to FIGS. 5 to 7. Furthermore, Fig. 5 is a principle block diagram of the device of the present invention applied to a two-input, one-output multivariable process, Fig. 6 is a block diagram showing a specific example of application to an evaporator liquid level control system, and Fig. 6 is a signal processing configuration diagram embodying a part of FIG. 6; FIG. First of all,
As shown in FIG. 5, the device of the present invention includes an optimal control system 21 based on current control theory, and
The optimal control system 21 comprises a process 211 and a state variable feedback type controller 212 to form a one-loop feedback control system.
In this configuration, a manipulated variable C is determined from the deviation between the controlled variable b outputted from the controller 1 and the set value l, and is inputted to the process 211 in consideration of the state variables. On the other hand, the classical controller 22 forms a feedback loop that encompasses the optimal control system 21, and controls the controlled object m using the control signal obtained by this controller 22 to provide another manipulated variable a of the process 211. This is the configuration that obtains the following. At this time, the classical controller 22 calculates an arithmetic expression using the root locus method (or pole placement method) so that the placement of poles and zeros of the transfer function is optimal as a total feedback. Next, FIG. 6 shows a specific example applied to an evaporator liquid level control system. This control system adjusts the supply liquid flow rate m1 with the supply liquid flow rate control valve 31, and then the evaporator 32.
supply to. The fluid in the evaporator 32 is heated and evaporated and concentrated by the heated steam m2 introduced into the heating pipe 34 via the heated steam flow rate control valve 33. This heated steam is outputted from a heated steam discharge passage 35, while the concentrated liquid is discharged through a concentrated liquid discharge valve 36. 37 is a liquid level detector, and the fluid level signal in the evaporator 32 outputted from this detector 37 is sent to the deviation calculator 38, where it is compared with the liquid level setting value l and the deviation signal is determined. can get. Reference numeral 39 denotes a state variable feedback type controller which inputs a deviation signal and obtains a signal one order higher than the order of the system (in this case, 1 input and 1 output) from an integrator 40 to form a state variable type feedback calculation formula. The manipulated variable is determined by
3 to control the heating steam flow rate.
A controller 41 corresponds to the classical controller 22, and after performing calculations using the output of the state variable feedback type controller 39 and the deviation signal, the output of the controller 41 is transferred to the deviation calculator. 42 and compares it with the liquid supply flow rate set value h to find a deviation, and this deviation signal is supplied to the liquid supply flow rate control valve 31 for use in controlling the liquid supply flow rate. In addition, the seventh
This figure is a diagram showing the arithmetic expressions and signal processing configuration performed by the controller 39, integrator 40, and controller 41 shown in FIG. 6. In FIG. 7, reference numeral 51 is a section for obtaining a state feedback output by the optimal regulator method using a state variable feedback type controller, and corresponds to the optimal control system 21 in FIG. Reference numerals 52 and 53 receive the output and deviation signal of the state variable feedback type controller, and perform stability analysis by the root locus method using a classical controller, and correspond to the classical controller 22 in FIG. 53 means a state variable composition matrix. Next, the operation of the device configured as described above will be explained. First, the evaporator 32 obtained by the liquid level detector 37
The liquid level signal is input to the deviation calculator 38, where it is compared with the liquid level set value l to obtain a liquid level deviation signal, and this signal is sent as it is and via the integrator 40 to the state variable feedback type controller 39. input. Here, the controller 39 minimizes the liquid level deviation signal and deviation integral signal of the evaporator 32 as shown in FIG.
Calculation is performed using the formula Kp 1 (1fT 1・1/S+T D1・S) to find the manipulated variable. Here, the state variable feedback type controller 39
Explain the effect of In other words, as mentioned above, the evaporator liquid level loop is described by an equation of state with heated steam as input and liquid level as output, and the value that minimizes the evaluation function is given by the solution to Ritsukachi's equation. .
Specifically, the arithmetic expression of the controller 39 is determined from the relationship between the deviation of the evaporator liquid level and the manipulated variable of the heated steam flow rate that minimizes the deviation integral signal. At this time, in order to convert the detected state into an actually measured quantity (for example, flow rate, liquid level), the two inputs of the feed liquid flow rate and the heated steam flow rate are synthesized using a state variable synthesis matrix 53 shown in FIG. . Also, the controller 41
Another feature is that a differential operation with a negative coefficient (T D2 ) is inserted as a characteristic. Controller 39
The evaporator level control system using the feed liquid flow rate as a disturbance and the heated steam flow rate as the control input (operated variable) is optimally determined, but in reality, simply manipulating the heated steam flow rate does not provide sufficient transient response. It is difficult to control the liquid level with good performance. Therefore, a one-input, one-output system (input: liquid supply flow rate, output: evaporator liquid level) is considered, in which the range including the controller 39 is controlled, and this control is executed by the controller 41. Note that the arithmetic expression of the controller 41 is 1 input, 1
Considering the poles and zeros of the output system, to eliminate the existence of poles on the right plane and move the poles to the stable left plane , use not only p operation but also P/D operation with negative coefficients and place the zero on the right plane. It can be seen that the convergence of the system is better when Coefficient of D action
T D2 is selected to be an appropriate negative value when varied from -∞ to +∞, and the arithmetic expression of the controller 41 is determined by determining the gain ( p constant) from the root locus diagram. Since this controller 41 does not include an integral operation, the output is zero when the liquid level deviation input is zero and stable, and the deviation output signal from the liquid supply flow rate is only the liquid supply flow rate, so in a steady state, the liquid supply flow rate is It is also a system that can be configured as desired. If this control method is used, a control system design that can operate both the heating steam flow rate and the feed liquid flow rate simultaneously during transient changes such as disturbances will be achieved, resulting in a good design. Control results can be expected.
Note that FIG. 8 is a diagram showing control results under the same disturbance conditions as FIGS. 2 and 4. Therefore, since the present invention is configured as described above,
It is possible to configure a control system with two inputs and one output, which cannot be achieved with the classical control method, and better control results can be obtained. Furthermore, by effectively applying modern control theory and keeping it to a minimum, the order of the system can be reduced and the design of the control system can be made easier. In addition, by not relying solely on the optimal regulator for control results, but also using the pole placement method, we were able to construct a control system that can be achieved with the current hardware. In particular, in the evaporator liquid level control system, it not only improves the convergence (transient response) and stability of liquid level deviation, but also allows the supply liquid flow rate to be arbitrarily set during steady state. In order to determine the evaporation throughput, it is possible to provide a multivariable process control device that can realize a control system that is excellent in terms of operation and operation.
第1図は古典的P・I・D調節計を用いた従来
装置の構成図、第2図は第1図の装置における外
乱時の過渡応答特性図、第3図は現代制御理論の
1つである最適レギユレータ法を用いた従来装置
の構成図、第4図は第3図の装置における外乱時
の過渡応答特性図、第5図ないし第8図は本発明
に係る多変数系プロセス制御装置の一実施例を説
明するために示したもので、第5図は原理構成を
示す図、第6図は蒸発缶液位制御系に適用した一
具体例を示す構成図、第7図は第6図の一部の演
算式を示す図、第8図は第6図の装置における外
乱時の過渡応答特性図である。
31……給液流量調節弁、32……蒸発缶、3
3……加熱蒸気流量調節弁、37……液位検出
器、38……偏差演算器、39……状態変数フイ
ードバツク形制御器、40……積分器、41……
制御器、42……偏差演算器。
Figure 1 is a configuration diagram of a conventional device using a classic P-I-D controller, Figure 2 is a transient response characteristic diagram of the device shown in Figure 1 during disturbances, and Figure 3 is one of modern control theories. FIG. 4 is a diagram of the transient response characteristics of the device shown in FIG. 3 during disturbances, and FIGS. 5 to 8 show the multivariable process control device according to the present invention. These figures are shown to explain one embodiment, and FIG. 5 is a diagram showing the principle configuration, FIG. 6 is a configuration diagram showing a specific example applied to an evaporator liquid level control system, and FIG. 7 is a diagram showing the configuration. 6 is a diagram showing a part of the arithmetic expressions, and FIG. 8 is a transient response characteristic diagram at the time of disturbance in the apparatus of FIG. 6. 31... Liquid supply flow rate control valve, 32... Evaporator, 3
3... Heating steam flow rate control valve, 37... Liquid level detector, 38... Deviation calculator, 39... State variable feedback type controller, 40... Integrator, 41...
Controller, 42...deviation calculator.
Claims (1)
セスを制御する多変数系プロセス制御装置におい
て、 前記制御量検出信号と予め設定された設定信号
とから偏差信号を得る偏差演算部と、この偏差演
算部の偏差信号を積分する積分器と、この積分器
の偏差積分信号と前記偏差信号を受け、最適レギ
ユレータ法により前記偏差積分信号および前記偏
差信号が最小となるような1つの操作量を求める
状態変数フイードバツク形制御器と、この状態変
数フイードバツク形制御器の出力および前記偏差
演算部の偏差信号を用いて根軌跡法により安定解
析を行つて他の1の操作量を求める古典制御器と
を備えたことを特徴とする多変数系プロセス制御
装置。[Scope of Claims] 1. In a multivariable process control device that controls a process by determining two manipulated variables from one controlled variable, a deviation signal is obtained from the controlled variable detection signal and a preset setting signal. an arithmetic unit, an integrator that integrates the deviation signal of the deviation arithmetic unit, and an integrator that receives the deviation integral signal of the integrator and the deviation signal, and uses an optimal regulator method to minimize the deviation integral signal and the deviation signal. A state variable feedback type controller for calculating one manipulated variable, the output of this state variable feedback type controller, and the deviation signal of the deviation calculation section are used to perform stability analysis using the root locus method to calculate the other manipulated variable. A multivariable process control device characterized by being equipped with the desired classical controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18325481A JPS5884303A (en) | 1981-11-16 | 1981-11-16 | Process controller of multi-variable system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18325481A JPS5884303A (en) | 1981-11-16 | 1981-11-16 | Process controller of multi-variable system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5884303A JPS5884303A (en) | 1983-05-20 |
| JPS6327721B2 true JPS6327721B2 (en) | 1988-06-06 |
Family
ID=16132450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18325481A Granted JPS5884303A (en) | 1981-11-16 | 1981-11-16 | Process controller of multi-variable system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5884303A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02121333U (en) * | 1988-10-18 | 1990-10-02 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60147803A (en) * | 1984-01-12 | 1985-08-03 | Toshiba Mach Co Ltd | System for determining control constant of linked control area in multi-point temperature controller |
| JPS61249101A (en) * | 1985-04-27 | 1986-11-06 | Fuji Electric Co Ltd | Optimum control system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4734896U (en) * | 1971-05-08 | 1972-12-18 |
-
1981
- 1981-11-16 JP JP18325481A patent/JPS5884303A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02121333U (en) * | 1988-10-18 | 1990-10-02 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5884303A (en) | 1983-05-20 |
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