JPS63295491A - Metallizing composition - Google Patents
Metallizing compositionInfo
- Publication number
- JPS63295491A JPS63295491A JP12944187A JP12944187A JPS63295491A JP S63295491 A JPS63295491 A JP S63295491A JP 12944187 A JP12944187 A JP 12944187A JP 12944187 A JP12944187 A JP 12944187A JP S63295491 A JPS63295491 A JP S63295491A
- Authority
- JP
- Japan
- Prior art keywords
- parts
- cuo
- conductor
- metallizing
- airtightness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は、低温焼成セラミックスに金属化面を形成する
に際してセフミックスと同時焼成可能な低融点低抵抗導
体材料、就中高密度多層セラミック配線基板のスμmホ
ー〃内壁の導体材料に好適に利用される。Detailed Description of the Invention "Industrial Application Field" The present invention relates to a low melting point, low resistance conductive material that can be co-fired with CEFMIX when forming a metallized surface on low temperature fired ceramics, especially a high density multilayer ceramic wiring board. It is suitably used as a conductive material for the inner wall of a micrometer hole.
「従来の技術」
近年、ICパッケージ、多層配線基板等の超高密度化、
高性能化、低価格化の傾向に対処すべく、銅又は酸化鋼
を主成分とし導体部の気密性の良好なメタライズ組成物
が要請されている。"Conventional technology" In recent years, ultra-high densification of IC packages, multilayer wiring boards, etc.
In order to cope with the trend toward higher performance and lower prices, there is a demand for metallized compositions containing copper or oxidized steel as a main component and having good airtightness in conductor parts.
「発明が解決しようとする問題点」
しかし、酸化鋼を主成分とするものは、還元又は中性雰
囲気で加熱されてCuOがCuに還元され導体化する際
に体積収縮を生じる。他方、鋼を主成分とするものは、
大気中における脱脂工程段階でCuが酸化されて逆に体
積膨張を生じる。かかる体積収縮、膨張に伴い、セラミ
ックスや導体部にクツツクが入るおそれがあった。"Problems to be Solved by the Invention" However, steels whose main component is oxidized steel undergo volumetric contraction when heated in a reducing or neutral atmosphere to reduce CuO to Cu and make it conductive. On the other hand, those whose main component is steel,
During the degreasing step in the atmosphere, Cu is oxidized and conversely causes volumetric expansion. Due to such volumetric contraction and expansion, there was a risk that the ceramics and conductor parts would become punctured.
tた、メタライズ組成物がスルーホーμに充填されてい
る場合には、上記の収縮に加えてCuとセラミックスと
の焼成収縮率の不一致に起因して、72mホーμ内壁と
導体との間に空隙を生じたり、導体部にクツツクを生じ
て、導通不良を招来することがあった。In addition, when the metallized composition is filled in the through hole μ, a void is created between the conductor and the inner wall of the 72 m hole μ due to the above-mentioned shrinkage and the mismatch in firing shrinkage rate between Cu and ceramics. This may cause cracks in the conductor, resulting in poor continuity.
本発明は、かかる問題点を解決し、気密性の良好な導体
材料を提供することを目的とする。The present invention aims to solve these problems and provide a conductive material with good airtightness.
「問題点を解決するための手段」
その手段は重量基準で、CuO60〜90%及びCu
10〜50%よりなる主成分100部に対し、Pd及び
Ptのうちから選ばれる一種以上20〜80部並びにM
n(h 10部以下及びAg。"Means to solve the problem" The means are based on weight, CuO 60-90% and Cu
20 to 80 parts of one or more selected from Pd and Pt, and M
n (h 10 parts or less and Ag.
5部以下のうちから選ばれる一種以上を添加するところ
にある。One or more types selected from 5 parts or less are added.
「作用」
Cu及びCuOは、セラミックグリーンシートとともに
還元又は中性雰囲気で加熱還元されて導体化する。Cu
とCuOとの含有比を上記の一定範囲に限っ九のは還元
工程におけるCuOの還元による体積収縮と脱脂工程に
おけるCuの酸化による体積膨張とを相殺させ、全体の
体積変化を最少限に抑えるためである。"Operation" Cu and CuO are reduced together with the ceramic green sheet or heated and reduced in a neutral atmosphere to become conductive. Cu
The reason why the content ratio of CuO and CuO is limited to the above-mentioned certain range is to offset the volume shrinkage due to the reduction of CuO in the reduction process and the volume expansion due to the oxidation of Cu during the degreasing process, and to minimize the overall volume change. It is.
Pd及びptは、Cu及びCuOとともに必要な導電性
を確保するほか、高温においてもほとんど酸化も還元も
されないため、導体全体としての体積変化率を更に低く
する。但し、それらの含有量がCu等100部に対し2
0部に満たないと゛空隙やクラックが偏在し、80部を
超えると導体抵抗が大きくなって、スμmホーμが数ケ
所も連なるような配線には若干不利となる。Pd and pt, together with Cu and CuO, ensure the necessary conductivity and are hardly oxidized or reduced even at high temperatures, so they further reduce the volume change rate of the conductor as a whole. However, if their content is 2 parts per 100 parts of Cu, etc.
If it is less than 0 parts, voids and cracks will be unevenly distributed, and if it exceeds 80 parts, the conductor resistance will increase, which is somewhat disadvantageous for wiring in which several μm holes are connected.
Mn(hは還元されてMn2O3、MnOないしMnと
なり、基板中のセラミックや結晶化ガラスと銅との濡れ
性を高める。但し、その含有量が12重量qbf:超え
ると銅粒子同志の焼結を妨げ、リーク不良又は抵抗増大
を招来するので12重量−以下とじ九。AgzOは水素
雰囲気中100°Cで還元されてAgとなp、所il[
l銀ろうと称されるCu −Ag合金の液相を銅粒子間
の境界に局部的に形成し、銅粒子同志を緻密に焼結させ
る。Mn (h is reduced to Mn2O3, MnO, or Mn, which improves the wettability of copper with the ceramic or crystallized glass in the substrate. However, if its content exceeds 12 weight qbf: The weight should not be less than 12 mm, as this may cause interference, leakage failure, or increased resistance.
A liquid phase of a Cu--Ag alloy called l-silver solder is locally formed at the boundaries between copper particles, and the copper particles are densely sintered together.
但し、その含有量が8″mt%を超えると上記銀ろうが
基板上で玉となってしまい、基板との密着強度の低下を
招来するので8重量%以上とした。而して、以上のMn
Os及びAgz Oの作用により、基板と導体との間又
は導体自身の内部に気孔が生じるのを防止し、気密性を
高めるのである。However, if the content exceeds 8"mt%, the silver solder will form beads on the substrate, resulting in a decrease in adhesion strength with the substrate, so the content is set at 8% by weight or more. Mn
The action of Os and Agz O prevents the formation of pores between the substrate and the conductor or within the conductor itself, thereby improving airtightness.
「実施例」
1)本出願人の出願に係る特開昭59−92948号公
報記載の発明「結晶化ガラス化」に開示された実施例の
試料−5と同様、重量比でZn04チ、Mg018%、
AhOs 88 %%5loz 58%。"Example" 1) Same as sample-5 of the example disclosed in the invention "Crystallization vitrification" described in Japanese Patent Application Laid-Open No. 59-92948 filed by the present applicant, the weight ratio is Zn04 and Mg018. %,
AhOs 88%%5loz 58%.
B2O3及びhoe各1%の組成となるよう、ZnO。ZnO to have a composition of 1% each of B2O3 and hoe.
MgCO5、Al(OH)s 、 SiO2、HsBO
s及びHIPO4t−秤量、フイカイ機にて混合、アμ
ミナμツボを用いて1450 ’Cにて溶融、水中に投
入、急冷してガラス化した後、アルミナ製ボーμミ〃に
て平均粒径2μに粉砕してフリットを製造。MgCO5, Al(OH)s, SiO2, HsBO
s and HIPO4t-weighed, mixed in a weight machine, aμ
The material was melted at 1450'C using a Mina μ pot, poured into water, rapidly cooled and vitrified, and then ground to an average particle size of 2μ in an alumina Bo μ pot to produce frit.
2)上記フリットに有機質の結合剤と溶剤を混合してス
フリー化し、ドクターブレード法によりて厚さ0,6■
のグリーンシートを製造。2) Mix the above frit with an organic binder and a solvent to make it into a fleece, and use the doctor blade method to make it to a thickness of 0.6mm.
Manufactures green sheets.
8)平均粒径5μのCu01同15μのCus同8μの
Pd、同8μのPt 1Mn0鵞粉末及びAgzO粉末
を第1表の組成に混合し、有機質結合剤と溶剤を配合し
てメタライズペーストを製造。8) Cu01 with an average particle size of 5μ, Cu with a mean particle size of 15μ, Pd with an average particle diameter of 8μ, Pt with an average particle diameter of 8μ, 1Mn0, 1Mn0, and AgzO powder are mixed in the composition shown in Table 1, and an organic binder and a solvent are mixed to produce a metallized paste. .
4)前記2)のグリーンシートの表面に、Pd及びpt
を含有していないことを除くほかは上記3)のメタフイ
ズペーストと同質のペーストを厚さ20μmで、長さ4
0M1幅0.5 wmの帯状に1■間隔で40条の導電
層となるパターンをスクリーン印刷。4) Pd and pt are added to the surface of the green sheet of 2) above.
A paste with a thickness of 20 μm and a length of 4
Screen print a pattern that will become a conductive layer with 40 strips at 1 inch intervals in a strip shape of 0M1 width 0.5 wm.
5)上記帯状のパターンの200箇所に800μφの貫
通孔を設け、この貫通孔に上記8)のメタフイズペース
ト′を充填し、上記帯状のパターンに対して直角方向で
上記貫通孔を通る位置に同じ帯状のパターンを上記4)
のペーストでスクリーン印刷。5) Provide 800 μΦ through holes at 200 locations in the strip pattern, fill these through holes with the Metafize Paste of 8) above, and place the holes through the through holes in a direction perpendicular to the strip pattern. Add the same strip pattern to 4) above.
Screen print with paste.
6)スクリーン印刷したグリーンシートを6枚とベース
となる肉厚のシート1枚を積層し、熱圧着したのち、5
0X50■に切断。6) After laminating 6 screen-printed green sheets and 1 thick base sheet and bonding them with heat, 5
Cut to 0x50■.
7)切断した積層体を大気中8時間で760℃まで昇温
、加熱1.0.2〜1.0時間保持。7) The temperature of the cut laminate was raised to 760° C. in the atmosphere for 8 hours, and the heating was maintained for 1.0.2 to 1.0 hours.
8)次いで積Jfl1体を水素雰囲気中に移し、常温よ
ジ昇温速度0.5°C/分で850°Cまで加熱し、0
.5〜1.5時間保持したのち、水素雰囲気中950
”Oで焼成。8) Next, transfer one product Jfl into a hydrogen atmosphere and heat it from room temperature to 850°C at a temperature increase rate of 0.5°C/min.
.. After holding for 5 to 1.5 hours, 950
``Fired in O.
以上1)〜8)の工程によって第1図に示すように各層
のパターン1.1・・・1が貫通孔2.2・・・を通じ
て電気的に導通した、7枚の絶縁基板からなる多層基板
8を製造し九。Through the steps 1) to 8) above, the patterns 1.1...1 of each layer are electrically connected through the through holes 2.2... as shown in Figure 1. 9. Manufacturing the substrate 8.
多層基板8についてHeディテクターを用いて気密性を
測定したところメタフィズペーストNc&l、rk2い
ずれの場合もI X 10−cc/ std ・sea
以下であった。When the airtightness of the multilayer substrate 8 was measured using a He detector, it was I
It was below.
「効果」 導体部の気密性が向上する。"effect" The airtightness of the conductor part is improved.
第1図は、本発明の一実施例に係る製造法に従って製造
された多層基板の断面図を示す。
手続補正書(自発)
昭和62年7月a日
1、事件の表示
昭和62年特許願 第129441号
2、発明の名称
メタフイズ組成物
3、補正をする者
事件との関係 特許出願人
〔住所〕 郵便番号 467−91
名古屋市瑞穂区高辻町14番18号
4、補正の対象
明細書中、特許請求の範囲の欄及び発明の詳細な5、補
正の内容
(1)本願、特許請求の範囲を別紙の通り訂正します。
(2)明細書第1頁下から第5行目中、「スμmホーμ
内壁」を「スルーホール内部」に訂正します。
(8)同第8頁第8行目中、
[AgOJをr Ag、o Jに訂正します。
(4)同第5頁下から第5行目中、
[5μのCuOJを[1,5μのCuOJに訂正します
。
以上
(特許請求の範囲)
「重量基準で、CuO50〜90%及びCu10〜60
%よりなる主成分100部に対し、Pd及びPtのうち
から選ばれる一種以上20〜80部並びにMn0210
部以下及びAggO5部以下のうちから選ばれる一種以
上を添加してなるメタフイズ組成物。」FIG. 1 shows a cross-sectional view of a multilayer substrate manufactured according to a manufacturing method according to an embodiment of the present invention. Procedural amendment (voluntary) July a, 1985 1, Indication of the case 1988 Patent Application No. 129441 2, Name of the invention Metaphys Composition 3, Person making the amendment Relationship to the case Patent applicant [address] Postal Code 467-91 4-14-18 Takatsuji-cho, Mizuho-ku, Nagoya City, In the specification to be amended, the scope of claims and details of the invention 5. Contents of the amendment (1) The present application and the scope of claims. I will correct it as shown in the attached sheet. (2) In the 5th line from the bottom of the first page of the specification, “Sμm hole μ
Correct "Inner wall" to "Inside through hole". (8) On page 8, line 8, [AgOJ is corrected to r Ag, o J. (4) In the fifth line from the bottom of page 5, [5μ CuOJ is corrected to [1.5μ CuOJ]. Above (Claims) "On a weight basis, CuO50-90% and Cu10-60%"
%, 20 to 80 parts of one or more selected from Pd and Pt, and Mn0210
A Metaphys composition comprising at least one selected from the group consisting of 5 parts or less of AggO and 5 parts or less of AggO. ”
Claims (1)
よりなる主成分100部に対し、Pd及びPtのうちか
ら選ばれる一種以上20〜80部並びにMnO_210
部以下及びAgO5部以下のうちから選ばれる一種以上
を添加してなるメタライズ組成物。By weight, CuO 50-90% and Cu 10-50%
20 to 80 parts of one or more selected from Pd and Pt and MnO_210 per 100 parts of the main component consisting of
A metallizing composition comprising at least one selected from the group consisting of 5 parts or less of AgO and 5 parts or less of AgO.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12944187A JPS63295491A (en) | 1987-05-26 | 1987-05-26 | Metallizing composition |
| US07/133,817 US4871608A (en) | 1986-12-10 | 1987-12-10 | High-density wiring multilayered substrate |
| US07/196,408 US4837408A (en) | 1987-05-21 | 1988-05-20 | High density multilayer wiring board and the manufacturing thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12944187A JPS63295491A (en) | 1987-05-26 | 1987-05-26 | Metallizing composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63295491A true JPS63295491A (en) | 1988-12-01 |
| JPH0534311B2 JPH0534311B2 (en) | 1993-05-21 |
Family
ID=15009543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12944187A Granted JPS63295491A (en) | 1986-12-10 | 1987-05-26 | Metallizing composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63295491A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5120473A (en) * | 1987-10-12 | 1992-06-09 | Ngk Spark Plug Co., Ltd. | Metallizing composition for use with ceramics |
| US7083745B2 (en) * | 2000-12-28 | 2006-08-01 | Denso Corporation | Production method for laminate type dielectric device and electrode paste material |
-
1987
- 1987-05-26 JP JP12944187A patent/JPS63295491A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5120473A (en) * | 1987-10-12 | 1992-06-09 | Ngk Spark Plug Co., Ltd. | Metallizing composition for use with ceramics |
| US7083745B2 (en) * | 2000-12-28 | 2006-08-01 | Denso Corporation | Production method for laminate type dielectric device and electrode paste material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0534311B2 (en) | 1993-05-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |