JPS6330578A - Epoxy-resin-base resist ink composition - Google Patents
Epoxy-resin-base resist ink compositionInfo
- Publication number
- JPS6330578A JPS6330578A JP61175345A JP17534586A JPS6330578A JP S6330578 A JPS6330578 A JP S6330578A JP 61175345 A JP61175345 A JP 61175345A JP 17534586 A JP17534586 A JP 17534586A JP S6330578 A JPS6330578 A JP S6330578A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- ethyl
- formulas
- ink composition
- resist ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 24
- 239000003822 epoxy resin Substances 0.000 claims abstract description 31
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 31
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 22
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 14
- -1 imidazole compound Chemical class 0.000 claims abstract description 14
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920002732 Polyanhydride Polymers 0.000 claims abstract description 5
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000004593 Epoxy Substances 0.000 claims abstract description 3
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000000126 substance Substances 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000007650 screen-printing Methods 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract description 2
- 239000000976 ink Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 239000010408 film Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 150000002460 imidazoles Chemical class 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 238000007142 ring opening reaction Methods 0.000 description 4
- 238000005829 trimerization reaction Methods 0.000 description 4
- 239000012787 coverlay film Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000013112 stability test Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- ZXTHWIZHGLNEPG-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=CC=C1 ZXTHWIZHGLNEPG-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- YAXXOCZAXKLLCV-UHFFFAOYSA-N 3-dodecyloxolane-2,5-dione Chemical compound CCCCCCCCCCCCC1CC(=O)OC1=O YAXXOCZAXKLLCV-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 239000012028 Fenton's reagent Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MGZTXXNFBIUONY-UHFFFAOYSA-N hydrogen peroxide;iron(2+);sulfuric acid Chemical compound [Fe+2].OO.OS(O)(=O)=O MGZTXXNFBIUONY-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は可撓性、密着性および耐熱性等に優れたフレキ
シブルプリント配線板製造用のエポキシ樹脂系レジスト
インク組成物に関するものであり、特に回路の保護・絶
縁に適するエポキシ樹脂系レジストインク組成物に係る
ものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an epoxy resin-based resist ink composition for manufacturing flexible printed wiring boards that has excellent flexibility, adhesion, heat resistance, etc., and is particularly applicable to circuits. This invention relates to an epoxy resin resist ink composition suitable for protection and insulation.
従来の技術
フレキシブルプリント配線板は、フレキシブル銅張板の
回路以外の不要銅箔をエツチングにより除去するかある
いは導電性インクを使用してベースフィルム上に回路を
印刷または描画する方法によって製造されている。この
ようにして形成された回路は、主としてカバーレイフィ
ルムがその上に熱圧着され、最終的にサンドインチ構造
の形にされて外界から保護される。Conventional Techniques Flexible printed wiring boards are manufactured by removing unnecessary copper foil other than the circuit from a flexible copper clad board by etching, or by printing or drawing a circuit on a base film using conductive ink. . The circuit formed in this way is protected from the outside world by mainly having a coverlay film bonded thereon by thermocompression, and finally into a sandwich structure.
発明が解決しようとする問題点
しかしながら、従来のフレキシブルプリント配線板にお
いては、カバーレイフィルムは高価であり、また回路上
の印刷抵抗器などは熱圧着時に特性変化を起こしやすい
などの問題点をかかえていた。従って、カバーレイフィ
ルムの代わりに安価で可撓性の優れた速硬化性のレジス
トインクの出現が望まれており、事実上記のレジストイ
ンクに可撓性を付与させるために、エポキシ樹脂にポリ
プロピレングリコールやポリエチレングリコールから誘
導される可撓性エポキシ樹脂、ゴム成分、ポリエステル
等を混合する方法が試みられて来たが、いずれも硬化物
の耐湿特性および各種物性の劣化が大きく、満足できる
レジストインクはこれまで出現していない。Problems to be Solved by the Invention However, in conventional flexible printed wiring boards, coverlay films are expensive, and printed resistors on circuits tend to change characteristics during thermocompression bonding. was. Therefore, it is desired that a cheap, flexible, and fast-curing resist ink be developed in place of the coverlay film. Attempts have been made to mix flexible epoxy resins derived from polyethylene glycol, rubber components, polyesters, etc., but in each case, the moisture resistance and various physical properties of the cured product deteriorate significantly, and no satisfactory resist ink has been found. It has not appeared so far.
エポキシ樹脂系レジストインクの一般的な塗布方法はス
クリーン印刷方法であり、この場合硬化剤としてアミン
あるいはポリアミドの如き可使時間の短いものの使用は
困難であった。現在、一部には紫外線硬化型インクを使
用した印刷方法が実用化されているが、可撓性、耐湿性
の点で必ずしも満足できるものではない。特公昭57−
49588号公報によれば、エポキシ樹脂にイミダゾー
ル化合物を硬化剤として使用し、熱硬化性、耐熱性、耐
湿性および耐薬品性等に優れたプリント配線板用ソルダ
レジストインクが開示されており、また特開昭56−1
57471号公報には前記と同様のエポキシ樹脂組成物
からなるメンキレジストインクが記載されている。The general method for applying epoxy resin resist inks is screen printing, and in this case it is difficult to use curing agents that have a short pot life, such as amines or polyamides. Currently, some printing methods using ultraviolet curable inks are in practical use, but they are not always satisfactory in terms of flexibility and moisture resistance. Special Public Service 1977-
49588 discloses a solder resist ink for printed wiring boards that uses an epoxy resin and an imidazole compound as a curing agent and has excellent thermosetting properties, heat resistance, moisture resistance, chemical resistance, etc. Japanese Patent Publication No. 56-1
No. 57471 describes a Menki resist ink made of the same epoxy resin composition as mentioned above.
ところが、近年の電子機器の小型化と軽量化に伴い限ら
れた空間内に部品を密装するためフレキシブルプリント
配vA板の使用が求められるようになり、イミダゾール
化合物を硬化剤として使用したレジストインク組成物の
優れた特徴を損なうことなく、可撓性皮膜を形成する試
みが種々行われたが、まだ未解決の問題を残している。However, as electronic devices have become smaller and lighter in recent years, the use of flexible printed A-plates has become necessary in order to tightly pack components within a limited space. Although various attempts have been made to form flexible coatings without sacrificing the excellent characteristics of the compositions, there remain unresolved problems.
例えばエポキシ樹脂の一部をポリアルキレングリコール
ジグリシジルエーテルあるいはダイマー酸のグリシジル
エステルに置換する方法によれば、硬化速度が遅く且つ
硬化塗膜の耐湿性も充分でないという欠点があり、また
ニトリルゴム変成エポキシ樹脂あるいはブタジェンゴム
変成エポキシ樹脂に買換する方法は、組成物の粘度が非
常に高く、スクリーン印刷ができないなど作業性上の障
害があった。メチルへキサヒドロ無水フタル酸、メチル
テトラヒドロ無水フタル酸あるいはドデシルコハク酸無
水物の如き酸無水物を硬化剤として使用する場合は、可
視性および耐湿性等に優れた塗膜が得られるが、硬化に
高温と長時間を要するため、無水物自体が作業環境中の
水分により変質してスクリーン製版上で固化したり、あ
るいはカルボン酸を生成するため設計どおりの特性が発
揮されない。また、この場合無水物の弯発による環境汚
染が発生する惧れがあった。For example, a method in which a part of the epoxy resin is replaced with polyalkylene glycol diglycidyl ether or glycidyl ester of dimer acid has the drawbacks that the curing speed is slow and the moisture resistance of the cured coating film is insufficient. The method of replacing the resin with an epoxy resin or a butadiene rubber-modified epoxy resin had problems in workability, such as the very high viscosity of the composition and the inability to perform screen printing. When an acid anhydride such as methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride or dodecylsuccinic anhydride is used as a curing agent, a coating film with excellent visibility and moisture resistance can be obtained, but it is difficult to cure. Because high temperatures and long periods of time are required, the anhydride itself may deteriorate due to moisture in the working environment and solidify on the screen plate, or produce carboxylic acid, which prevents the designed properties from being exhibited. In addition, in this case, there was a risk that environmental pollution would occur due to the release of anhydride.
問題点を解決するための手段
本発明者等は、このような事情に鑑み鋭意検討を重ねた
結果、良好な可撓性、密着性および耐熱性等を有するレ
ジストインクに適したエポキシ樹脂系組成物を見い出す
に至った。Means for Solving the Problems In view of the above circumstances, the inventors of the present invention have made extensive studies and have developed an epoxy resin composition suitable for resist inks that has good flexibility, adhesion, and heat resistance. I ended up discovering something.
すなわち、エポキシ樹脂に硬化剤としてイミダゾール化
合物と長鎖二塩基酸無水物(炭素数12〜22の分子間
ポリ酸ポリ無水物)を必須成分として配合することによ
り、高度の可撓性、ゴム弾性、適度な硬化速度及びスク
リーン印刷性を併せ持つ有用なエポキシ樹脂系レジスト
インク組成物を見い出したものである。In other words, by blending an imidazole compound and a long-chain dibasic acid anhydride (intermolecular polyacid polyanhydride with 12 to 22 carbon atoms) as essential components as a curing agent to the epoxy resin, a high degree of flexibility and rubber elasticity can be achieved. We have discovered a useful epoxy resin resist ink composition that has both appropriate curing speed and screen printability.
本発明の実施に適するエポキシ樹脂は、室温で液状の多
価フェノールのポリグリシジルエーテル、例えばビスフ
ェノールAのジグリシジルエーテル、ビスフェノールF
のジグリシジルエーテルであり、その他エポキシ化フェ
ノールノポラ、り樹脂やエポキシ化タレゾールノボラッ
ク樹脂または固体エポキシ樹脂を溶剤で溶解したもの等
である。Epoxy resins suitable for the practice of the invention include polyglycidyl ethers of polyhydric phenols that are liquid at room temperature, such as diglycidyl ether of bisphenol A, bisphenol F
Other examples include epoxidized phenol nopola resin, epoxidized talesol novolak resin, or solid epoxy resin dissolved in a solvent.
本発明の実施に適するイミダゾール化合物は、2−メチ
ルイミダゾール、2−エチル−4−メチルイミダゾール
、2−フェニルイミダゾール、2−ウンデシルイミダゾ
ール、2−ヘプタデシルイミダゾール(以下C,ffZ
と略す)、2−フェニル−4−メチルイミダゾールおよ
びこれら2−置換イミダゾール化合物の1−位シアノエ
チル化物、例えばl−シアノエチル−2−エチル−4−
メチルイミダゾール(以下2E4MZ CNと略す)
、これらイミダゾール化合物のカルボン酸塩や、2.4
−ジアミノ−6−(2−メチルイミダゾリル−(1))
−エチル−3−トリアジン(以下2MAと略す) 、
2.4−ジアミノ−6−(2−エチル−4−メチルイミ
ダゾリル−(1))′−エチルーs−トリアジン、2,
4−ジアミノ−6−(2−ウンデシルイミダゾリル−(
1)) −エチル−s−トリアジン、2.4−ジアミノ
−6−(2−メチルイミダゾリル−(1))−エチル−
3−トリアジン・イソシアヌル酸付加物(以下2MA−
OKと略す)、2−フェニル−4゜5−ジヒドロキシメ
チルイミダゾール(以下2PH2と略す)、2−フェニ
ル−4−メチル−5−ヒドロキシメチルイミダゾール(
以下2P4MH2と略す)などである。特に潜在性の高
いイミダゾール化合物、例えばC1t Z −2M Z
、 2 M A−OK、2PH2,2P4MH2など
の使用により、−液性エポキシ樹脂レジストインク組成
物を得ることもできる。Imidazole compounds suitable for carrying out the present invention include 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole (hereinafter referred to as C, ffZ
), 2-phenyl-4-methylimidazole and 1-position cyanoethylated products of these 2-substituted imidazole compounds, such as l-cyanoethyl-2-ethyl-4-
Methylimidazole (hereinafter abbreviated as 2E4MZ CN)
, carboxylates of these imidazole compounds, 2.4
-diamino-6-(2-methylimidazolyl-(1))
-ethyl-3-triazine (hereinafter abbreviated as 2MA),
2.4-diamino-6-(2-ethyl-4-methylimidazolyl-(1))'-ethyl-s-triazine, 2,
4-diamino-6-(2-undecylimidazolyl-(
1)) -ethyl-s-triazine, 2,4-diamino-6-(2-methylimidazolyl-(1))-ethyl-
3-triazine isocyanuric acid adduct (hereinafter referred to as 2MA-
OK), 2-phenyl-4゜5-dihydroxymethylimidazole (hereinafter abbreviated as 2PH2), 2-phenyl-4-methyl-5-hydroxymethylimidazole (
(hereinafter abbreviated as 2P4MH2). Particularly latent imidazole compounds, such as C1t Z -2M Z
, 2MA-OK, 2PH2, 2P4MH2, etc., it is also possible to obtain a -liquid epoxy resin resist ink composition.
また、エポキシ樹脂との反応性の高いイミダゾール化合
物を使用することにより、低温硬化性の良い組成物を得
ることも出来る。二液性エポキシ樹脂レジストインク組
成物の場合、通常イミダゾール化合物は長鎖二塩基酸無
水物に溶解または分散させて使用されるが、潜在性の比
較的高いイミダゾール化合物の使用の場合はエポキシ樹
脂側に分散させても良(、また硬化剤側へ分散させても
良い。Furthermore, by using an imidazole compound that is highly reactive with epoxy resins, it is also possible to obtain a composition that has good low-temperature curability. In the case of a two-component epoxy resin resist ink composition, the imidazole compound is usually dissolved or dispersed in a long-chain dibasic acid anhydride, but in the case of using an imidazole compound with relatively high latency, the epoxy resin side is used. (Also, it may be dispersed to the curing agent side.)
本発明の実施におけるイミダゾール化合物の添加量は、
エポキシ樹脂100重量部に対して1〜15重量部であ
り、好ましくは3〜10重量部である。The amount of imidazole compound added in carrying out the present invention is
The amount is 1 to 15 parts by weight, preferably 3 to 10 parts by weight, based on 100 parts by weight of the epoxy resin.
イミダゾール化合物の添加量がこの範囲を超える場合に
は、耐湿性の悪い硬化塗膜を与え、またポットライフも
著しく短(なる。イミダゾール化合物の添加量がこの範
囲より過少の場合には、硬化に著しく時間がかかり、実
用性がなくなる。また適当な反応性を得るために2種類
以上のイミダゾール化合物を併用しても差し支えない。If the amount of the imidazole compound added exceeds this range, a cured coating film with poor moisture resistance will be obtained, and the pot life will also be extremely short. It is extremely time consuming and impractical.In addition, two or more types of imidazole compounds may be used in combination to obtain appropriate reactivity.
また接着性をさらに向上させるためジシアンジアミドな
どを併用してもよい。In addition, dicyandiamide or the like may be used in combination to further improve adhesiveness.
本発明の実施に適する硬化剤としての長鎖二塩基酸無水
物は、シクロヘキサノンをフェントン試薬により開環三
量化した二塩基酸またはこの反応をオレフィンの存在下
に行いオレフィン分子を1〜2分子間にはさんだ形の二
塩基酸、またはさらに水添した二塩基酸を分子間脱水縮
合して得られる分子間ポリ酸ポリ無水物であり、その代
表的なものは下式の■ないし■で示されるものであって
、特に式■で示される分子間ポリ酸ポリ無水物は常温に
おいて液状であるため使用に好適である。The long-chain dibasic acid anhydride as a curing agent suitable for carrying out the present invention is a dibasic acid obtained by ring-opening trimerization of cyclohexanone with Fenton's reagent, or a dibasic acid obtained by ring-opening trimerization of cyclohexanone, or a dibasic acid obtained by ring-opening trimerization of cyclohexanone, or a dibasic acid obtained by ring-opening trimerization of cyclohexanone, or a dibasic acid obtained by performing this reaction in the presence of an olefin to form olefin molecules between 1 to 2 molecules. It is an intermolecular polyacid polyanhydride obtained by intermolecular dehydration condensation of a sandwiched dibasic acid or a further hydrogenated dibasic acid, and representative examples thereof are shown by ■ to ■ in the formula below. In particular, the intermolecular polyacid polyanhydride represented by formula (1) is suitable for use because it is liquid at room temperature.
本発明の実施における長鎖二塩基酸無水物の添加量は、
エポキシ樹脂1当量に対してO,OS〜0.g当量であ
り、好ましくは0.1〜0.7当量である。The amount of long chain dibasic acid anhydride added in the practice of the present invention is
O,OS~0.0 for 1 equivalent of epoxy resin. g equivalent, preferably 0.1 to 0.7 equivalent.
長鎖二塩基酸無水物の添加量が増すに連れて可撓性が増
し、やわらかい硬化塗膜が得られるが、前記範囲を超え
る場合には塗膜表面の硬化不良を引き起こしやすくなり
、また過少の場合には硬化塗膜が硬(なりすぎ、いずれ
も所期の目的を達成できない。As the amount of long-chain dibasic acid anhydride added increases, flexibility increases and a soft cured coating film is obtained, but if it exceeds the above range, curing failure on the coating film surface is likely to occur, In this case, the cured coating becomes too hard and cannot achieve the intended purpose.
本発明組成物においては、必要に応じて顔料、充填剤、
溶剤、可塑剤、反応性希釈剤、レベリング剤、その他添
加剤等を添加することが出来る。In the composition of the present invention, pigments, fillers,
Solvents, plasticizers, reactive diluents, leveling agents, and other additives can be added.
実施例及び比較例
エポキシ樹脂、イミダゾール化合物、長鎖二塩基酸無水
物及びその他の添加剤を表−1及び表−2に示した比率
で配合し、三本ロールミルを用いて粒子の大きさが10
ミクロン以下となるように均一に分散、混練してレジス
トインク組成物を製造した。Examples and Comparative Examples Epoxy resins, imidazole compounds, long-chain dibasic acid anhydrides, and other additives were blended in the ratios shown in Tables 1 and 2, and the particle size was determined using a three-roll mill. 10
A resist ink composition was manufactured by uniformly dispersing and kneading the resist ink composition to a size of microns or less.
各実施例及び比較例の調合により得られた組成物につい
て保存安定性及び性能試験を行ったところ、その結果は
表−3に示したとおりであった。Storage stability and performance tests were conducted on the compositions obtained by the formulations of each Example and Comparative Example, and the results were as shown in Table 3.
なお、表−1及び表−2における数値単位は、重量部を
もって示したものである。The numerical units in Tables 1 and 2 are parts by weight.
注)(1)は油化シェルエポキシ側、(2)はダウケミ
カル、(3)及び(4)は四国化成工業側、(5)及び
(6)は間材製油■、(7)は日本アエロジル工業■及
び(8)は信越化学■の製品であり、(5)のIPU−
22AHは前記式■で示される長鎖二塩基酸無水物、(
6)の5L−20AHは前記式■で示される長鎖二塩基
酸無水物である。Note: (1) is from Yuka Shell Epoxy, (2) is from Dow Chemical, (3) and (4) are from Shikoku Chemical Industry, (5) and (6) are from Intermediate Oil Manufacturing, and (7) is from Japan. Aerosil Kogyo ■ and (8) are products of Shin-Etsu Chemical ■, and (5) IPU-
22AH is a long-chain dibasic acid anhydride represented by the formula (■), (
5L-20AH in 6) is a long chain dibasic acid anhydride represented by the above formula (1).
注)表中、+llないしく8)は表〜1と同じであり、
(9)は四国化成工業−の製品を用いた。Note) In the table, +ll or 8) is the same as Table ~1,
In (9), a product manufactured by Shikoku Kasei Kogyo was used.
表−3保存安定性及び硬化物の性能試験但し、スクリー
ン印刷により、PETフィルム上に20ミクロン厚の塗
膜を形成し、これを120’C130分間加熱して硬化
させたものである。Table 3 Storage stability and performance test of cured product However, a coating film with a thickness of 20 microns was formed on a PET film by screen printing, and this was cured by heating at 120'C for 130 minutes.
注)α[11JIS−D−0202に従ってクロスカッ
トピーリングテストを実施した。Note) Cross-cut peeling test was conducted according to α[11 JIS-D-0202.
αυ JIS−に−5400に従って鉛筆硬度を測定し
た。Pencil hardness was measured according to αυ JIS-5400.
αδ JIS−に−5400に従って塗膜の形成された
基板フィルムを屈曲試験器で50回折りまげて、塗膜に
ヒビ割れがないかどうかを目視にて確認した。The substrate film on which the coating film was formed according to αδ JIS-5400 was folded 50 times using a bending tester, and it was visually confirmed whether there were any cracks in the coating film.
α1260℃の溶融ハンダ浴に30秒浸漬した後、塗膜
の外観上のふくれ、はがれを観察し、JIS−D−02
02に従ってクロスカットピーリングテストを実施した
。α After immersing in a molten solder bath at 1260°C for 30 seconds, the appearance of the coating film was observed for blistering and peeling, and JIS-D-02
A cross-cut peeling test was conducted according to 02.
α荀 初期粘度の2倍になるまでの日数を測定した。α荀 The number of days until the viscosity reached twice the initial viscosity was measured.
発明の効果
本発明エポキシ樹脂系レジストインク組成物は、機械的
及び電気的な特性が優れており、また適度な硬化速度を
有し且つスクリーン印刷が可能であるため、プリント配
線板、特にフレキシブルプリント配線板の保護及び絶縁
塗料として、大きな手続補正書(自発)
昭和61年8月公日 (。Effects of the Invention The epoxy resin resist ink composition of the present invention has excellent mechanical and electrical properties, has an appropriate curing speed, and can be screen printed, so it is suitable for printed wiring boards, especially flexible printing. As a protection and insulation coating for wiring boards, a major procedural amendment (voluntary) was published in August 1986 (.
Claims (5)
基酸無水物(炭素数12〜22の分子間ポリ酸ポリ無水
物)を必須成分として含有することを特徴とするエポキ
シ樹脂系レジストインク組成物。(1) An epoxy resin-based resist ink composition containing an epoxy resin, an imidazole compound, and a long-chain dibasic acid anhydride (intermolecular polyacid polyanhydride having 12 to 22 carbon atoms) as essential components.
チルイミダゾール、1−シアノエチル−2−エチル−4
−メチルイミダゾール、2,4−ジアミノ−6−{2−
メチルイミダゾリル−(1)}−エチル−s−トリアジ
ンまたは2,4−ジアミノ−6−{2−エチル−4−メ
チルイミダゾール−(1)}−エチル−s−トリアジン
・イソシアヌル酸付加物からなる群から選ばれたものを
用いてなる特許請求の範囲(1)に記載のエポキシ樹脂
系レジストインク組成物。(2) As an imidazole compound, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-ethyl-4
-methylimidazole, 2,4-diamino-6-{2-
A group consisting of methylimidazolyl-(1)}-ethyl-s-triazine or 2,4-diamino-6-{2-ethyl-4-methylimidazole-(1)}-ethyl-s-triazine/isocyanuric acid adduct The epoxy resin resist ink composition according to claim (1), which uses an ink selected from the following.
6)で示される化合物を1種あるいは2種以上用いてな
る特許請求の範囲(1)に記載のエポキシ樹脂系レジス
トインク組成物。 式(1)▲数式、化学式、表等があります▼ 式(2)▲数式、化学式、表等があります▼ 式(3)▲数式、化学式、表等があります▼ 式(4)▲数式、化学式、表等があります▼ 式(5)▲数式、化学式、表等があります▼ 式(6)▲数式、化学式、表等があります▼ [但し、上記式(1)ないし式(6)の中のnは、いず
れも3ないし10の範囲にある数値を示す。](3) As the long chain dibasic acid anhydride, the following formulas (1) to (
The epoxy resin resist ink composition according to claim (1), which uses one or more of the compounds represented by (6). Formula (1) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Formula (2) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Formula (3) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Formula (4) ▲ Mathematical formulas, chemical formulas , tables, etc. ▼ Formula (5) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Formula (6) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [However, any of the above formulas (1) to (6) Each n represents a numerical value in the range of 3 to 10. ]
化合物を1〜15重量部の割合としてなる特許請求の範
囲(1)に記載のエポキシ樹脂系レジストインク組成物
。(4) The epoxy resin resist ink composition according to claim (1), wherein the imidazo compound is contained in a proportion of 1 to 15 parts by weight based on 100 parts by weight of the epoxy resin.
基酸無水物を0.05〜0.9当量の割合としてなる特
許請求の範囲(1)に記載のエポキシ樹脂系レジストイ
ンク組成物。(5) The epoxy resin-based resist ink composition according to claim (1), wherein the long-chain dibasic acid anhydride is contained in a ratio of 0.05 to 0.9 equivalents per 1 epoxy equivalent of the epoxy resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61175345A JPS6330578A (en) | 1986-07-24 | 1986-07-24 | Epoxy-resin-base resist ink composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61175345A JPS6330578A (en) | 1986-07-24 | 1986-07-24 | Epoxy-resin-base resist ink composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6330578A true JPS6330578A (en) | 1988-02-09 |
| JPH0575032B2 JPH0575032B2 (en) | 1993-10-19 |
Family
ID=15994441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61175345A Granted JPS6330578A (en) | 1986-07-24 | 1986-07-24 | Epoxy-resin-base resist ink composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6330578A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11302401A (en) * | 1998-04-17 | 1999-11-02 | Matsushita Electric Works Ltd | Epoxy resin composition and insulating substrate using the same |
| WO2006038262A1 (en) * | 2004-09-30 | 2006-04-13 | Ceramission Co., Ltd. | Solder resist coating, cured product therefrom and printed wiring board having coating film therefrom |
| WO2006088230A1 (en) * | 2005-02-21 | 2006-08-24 | Showa Denko K.K. | Thermosetting composition for solder resist and cured product thereof |
| JP2017143155A (en) * | 2016-02-09 | 2017-08-17 | 株式会社ナノマテックス | Clamping jig, and method for manufacturing clamping jig |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6343439B2 (en) | 2013-09-30 | 2018-06-13 | 太陽インキ製造株式会社 | Curable composition for printed wiring board, cured coating film using the same, and printed wiring board |
-
1986
- 1986-07-24 JP JP61175345A patent/JPS6330578A/en active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11302401A (en) * | 1998-04-17 | 1999-11-02 | Matsushita Electric Works Ltd | Epoxy resin composition and insulating substrate using the same |
| WO2006038262A1 (en) * | 2004-09-30 | 2006-04-13 | Ceramission Co., Ltd. | Solder resist coating, cured product therefrom and printed wiring board having coating film therefrom |
| WO2006088230A1 (en) * | 2005-02-21 | 2006-08-24 | Showa Denko K.K. | Thermosetting composition for solder resist and cured product thereof |
| JP2017143155A (en) * | 2016-02-09 | 2017-08-17 | 株式会社ナノマテックス | Clamping jig, and method for manufacturing clamping jig |
| WO2017138266A1 (en) * | 2016-02-09 | 2017-08-17 | 株式会社ナノマテックス | Clamping jig, method for manufacturing clamping jig, and resin |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0575032B2 (en) | 1993-10-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103814098B (en) | Comprise the electroconductive binder of the particle through silver coating | |
| WO2016158828A1 (en) | Resin composition, electroconductive resin composition, adhesive, electroconductive adhesive, paste for forming electrodes, and semiconductor device | |
| JP5534682B2 (en) | Thermosetting adhesive for electronic components and method for manufacturing electronic component-embedded substrate using this adhesive | |
| JPH08315885A (en) | Circuit connecting material | |
| EP3315573A1 (en) | Heat dissipation material adhering composition, heat dissipation material having adhesive, inlay substrate, and method for manufacturing same | |
| JP4883842B2 (en) | Additive for epoxy resin composition and epoxy resin composition thereof | |
| JPS6330578A (en) | Epoxy-resin-base resist ink composition | |
| US4593069A (en) | Epoxy resin composition | |
| JP4872220B2 (en) | Conductive adhesive | |
| JP6777548B2 (en) | Conductive paste | |
| WO2016087613A1 (en) | Conductive adhesive composition | |
| JPS61179224A (en) | Epoxy resin composition | |
| JPH0529667B2 (en) | ||
| JPS6249293B2 (en) | ||
| JP2007277384A (en) | Conductive adhesive | |
| JPH1161073A (en) | Adhesive composition | |
| JPS62207322A (en) | Thermosetting resin composition | |
| JPS6251971B2 (en) | ||
| JPH08104737A (en) | Epoxy resin composition and prepreg using the same | |
| JP2001214147A (en) | Interlayer insulating adhesive for multi-layered printed-wiring board | |
| JP3339240B2 (en) | Manufacturing method of prepreg | |
| JP2654987B2 (en) | Flexible epoxy resin composition | |
| JPH06145303A (en) | Liquid epoxy resin composition and its curing | |
| JPH05239426A (en) | Adhesive composition | |
| JPH0717736B2 (en) | Epoxy resin composition |