JPS6343467B2 - - Google Patents
Info
- Publication number
- JPS6343467B2 JPS6343467B2 JP57123825A JP12382582A JPS6343467B2 JP S6343467 B2 JPS6343467 B2 JP S6343467B2 JP 57123825 A JP57123825 A JP 57123825A JP 12382582 A JP12382582 A JP 12382582A JP S6343467 B2 JPS6343467 B2 JP S6343467B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mesh
- target
- high frequency
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57123825A JPS5914640A (ja) | 1982-07-15 | 1982-07-15 | 高周波スパツタリング法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57123825A JPS5914640A (ja) | 1982-07-15 | 1982-07-15 | 高周波スパツタリング法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5914640A JPS5914640A (ja) | 1984-01-25 |
| JPS6343467B2 true JPS6343467B2 (de) | 1988-08-30 |
Family
ID=14870291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57123825A Granted JPS5914640A (ja) | 1982-07-15 | 1982-07-15 | 高周波スパツタリング法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5914640A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DK1630260T3 (da) * | 2004-08-20 | 2011-10-31 | Jds Uniphase Inc | Magnetisk holdemekanisme til et dampudfældningssystem |
-
1982
- 1982-07-15 JP JP57123825A patent/JPS5914640A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5914640A (ja) | 1984-01-25 |
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