JPS6369764A - Aluminum nitride sintered body and manufacture - Google Patents

Aluminum nitride sintered body and manufacture

Info

Publication number
JPS6369764A
JPS6369764A JP61213988A JP21398886A JPS6369764A JP S6369764 A JPS6369764 A JP S6369764A JP 61213988 A JP61213988 A JP 61213988A JP 21398886 A JP21398886 A JP 21398886A JP S6369764 A JPS6369764 A JP S6369764A
Authority
JP
Japan
Prior art keywords
sintered body
aluminum nitride
thermal conductivity
nitride sintered
aun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61213988A
Other languages
Japanese (ja)
Inventor
羽鳥 雅一
水野谷 信幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP61213988A priority Critical patent/JPS6369764A/en
Publication of JPS6369764A publication Critical patent/JPS6369764A/en
Pending legal-status Critical Current

Links

Landscapes

  • Ceramic Products (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、窒化アルミニウム(A I N)焼結体及び
その製造方法に関し、更に詳しくは、熱伝導率が100
W/m11に以上と高熱伝導性を有するので半導体用放
熱板の素材に用いて有効なAIN焼結体及びその製造方
法に関する。
Detailed Description of the Invention [Objective of the Invention] (Industrial Application Field) The present invention relates to an aluminum nitride (A I N) sintered body and a method for manufacturing the same, and more specifically, a sintered body with a thermal conductivity of 100.
The present invention relates to an AIN sintered body that is effective as a material for semiconductor heat sinks because it has a high thermal conductivity of W/m11 or more, and a method for manufacturing the same.

(従来の技術) A文N焼結体は、絶縁性、耐腐食性および耐熱衝撃性に
優れ、高い高温強度を有すると共に、高い熱伝導性を有
するため、各種構造材、各種電子、電気部品などの素材
として、また、特に近年では放熱性が充分でないアルミ
ナCAnz Os )や毒性があるため取扱いが繁雑な
ベリリア(B e O)に代わる半導体用放熱板の素材
として注目されている。
(Prior art) A-shaped N sintered bodies have excellent insulation, corrosion resistance, and thermal shock resistance, and have high high-temperature strength and high thermal conductivity, so they are used in various structural materials and various electronic and electrical parts. In recent years, it has been attracting attention as a material for heat sinks for semiconductors, replacing alumina (CAnzOs), which does not have sufficient heat dissipation properties, and beryllia (B e O), which is difficult to handle due to its toxicity.

このようなAIN焼結体は次のようにして製造されてい
る。まず1例えば、AIN粉末に酸化イツトリウム(Y
203)のような焼結助剤を所定量配合し、更にバイン
ダーを加えて成形した後、窒素ガス気流中で加熱して、
バインダーを除去したのち、所定の焼結温度で所定の時
間加熱して焼結する。このようにして得られたAIN焼
結体は通常、その熱伝導率が高くても原料中の02量が
、3重量%以上あると、70W/m−に程度である。
Such an AIN sintered body is manufactured as follows. First, for example, yttrium oxide (Y
After blending a predetermined amount of a sintering aid such as 203), adding a binder and molding, heating in a nitrogen gas stream,
After removing the binder, sintering is performed by heating at a predetermined sintering temperature for a predetermined time. Even if the AIN sintered body thus obtained has a high thermal conductivity, if the amount of 02 in the raw material is 3% by weight or more, the thermal conductivity is about 70 W/m-.

ところで、AfLNa!結体を半導体用の放熱板とする
場合には、焼結した大型のAIN板を所定寸法に裁断し
て使用する。したがって放熱性に優れたAIN放熱板を
製作するためには、その前提として熱伝導率の高いAu
N焼結体(板)をその素材として製造することが必要と
なる。
By the way, AfLNa! When the body is used as a heat sink for semiconductors, a large sintered AIN plate is cut into predetermined dimensions and used. Therefore, in order to manufacture an AIN heat sink with excellent heat dissipation, it is necessary to use Au, which has high thermal conductivity.
It is necessary to manufacture the N sintered body (plate) as the material.

(発明が解決しようとする問題点) AuN焼結体を放熱板として使用する場合には、このA
uN焼結体の熱伝導率は高ければ高いほど良い。
(Problem to be solved by the invention) When using an AuN sintered body as a heat sink, this A
The higher the thermal conductivity of the uN sintered body, the better.

それゆえ、本発明者らは熱伝導率の高いAuN焼結体の
製造に関して鋭意努力を重ねてきたが、熱伝導率が高く
なるにつれてAuN焼結体は透明性を増し、その結果、
予期しない問題が生ずることを見出すに至った。
Therefore, the present inventors have made extensive efforts to manufacture AuN sintered bodies with high thermal conductivity, but as the thermal conductivity increases, the AuN sintered bodies become more transparent, and as a result,
It has been discovered that an unexpected problem arises.

すなわち、今までは視認できなかった網目状の「偏析線
」がAuN焼結体に生じていることが、全体が透光性に
なることによって視認されるという事実である。この「
偏析線」は、その組織、生成機構は未だに解明されてい
ないが、何らかの偏析物であり、いずれにしても他の透
光性の領域とは別種の組織であり、したがって熱伝導率
のような特性も他の領域とは異なるものである。
That is, the fact that network-like "segregation lines" that were not visible until now are generated in the AuN sintered body is now visible because the entire body becomes translucent. this"
Although the structure and generation mechanism of "segregation lines" have not yet been elucidated, they are some sort of segregation. Its characteristics are also different from other areas.

つまり、得られたAuN焼結体の各種の特性は、同じ焼
結体でも場所によって、ばらつきがあると言うことがで
きる。この事実は、透光性すなわち熱伝導率が高いAu
N焼結体を製造し得たからこそ見出された知見である。
In other words, it can be said that the various properties of the obtained AuN sintered body vary depending on the location even in the same sintered body. This fact is due to the fact that Au has high translucency and high thermal conductivity.
This knowledge was discovered because we were able to manufacture a N sintered body.

したがって、このような偏析物が縦横に縞状に走るAu
N焼結体から放熱用の基板を裁断した場合、この「偏析
線」を含む基板と含まない基板とではその熱伝導率が異
なることになり、同一の設計基準の下では使用すること
ができなくなる。
Therefore, such segregated substances run vertically and horizontally in a striped manner
When a heat dissipation board is cut from a N sintered body, the thermal conductivity of the board will be different between the board that contains this "segregation line" and the board that does not, so they cannot be used under the same design standard. It disappears.

本発明は、上記した問題点を解決し、熱伝導率が100
W/m−に以上であって、上記した「偏析線」が存在し
ないので特性のばらつきの少ないAuN焼結体及びその
製造方法を提供することを目的とする。
The present invention solves the above problems and has a thermal conductivity of 100.
It is an object of the present invention to provide an AuN sintered body having a W/m- or more and having less variation in properties since the above-mentioned "segregation line" does not exist, and a method for manufacturing the same.

[発明の構成〕 (問題点を解決するための手段) 本発明者らは、上記目的を達成すべく鋭意研究を重ねた
結果、後述する条件下でAuN圧粉体を焼結すると、こ
の偏析物が固溶して偏析物を形成することがないとの事
実を見出し本発明を完成するに至った。
[Structure of the Invention] (Means for Solving the Problems) As a result of extensive research to achieve the above object, the present inventors found that when an AuN green compact is sintered under the conditions described below, this segregation The present invention was completed based on the discovery that substances do not dissolve in solid solution to form segregated substances.

すなわち、本発明の窒化アルミニウム焼結体は、熱伝導
率が1100WZ拳に以上であり、偏析物が固溶してい
ることを特徴とし、その製造方法は、窒化アルミニウム
粉末を加圧成形して得られた圧粉体を焼結して窒化アル
ミニウム焼結体を製造する方法において、焼結温度を保
持する間、雰囲気圧を加圧することを特徴とする。
That is, the aluminum nitride sintered body of the present invention is characterized by having a thermal conductivity of 1100 WZ or higher and containing segregated substances as a solid solution, and the method for manufacturing the same includes press-molding aluminum nitride powder. The method for producing an aluminum nitride sintered body by sintering the obtained green compact is characterized in that atmospheric pressure is increased while the sintering temperature is maintained.

本発明のA文N焼結体は、熱伝導率が100W/mφに
以上であり、偏析物が固溶して均一な組織になっている
焼結体である。このようにAuN焼結体の熱伝導率を1
00W/m・に以上とするためには、原料となるAuN
粉末のAM/Nモル比を1に近づけ、かつ含有されるF
e。
The A-N sintered body of the present invention has a thermal conductivity of 100 W/mφ or more, and has a uniform structure in which segregated substances are dissolved in solid solution. In this way, the thermal conductivity of the AuN sintered body is reduced to 1
In order to achieve 00 W/m or more, the raw material AuN
The AM/N molar ratio of the powder approaches 1, and the contained F
e.

Si、C,Mg、Ca、酸素などの不純物を少なくする
ことが好ましい。特に、A文N粉末の酸素含有量を2重
量%以下とすることが重要である。
It is preferable to reduce impurities such as Si, C, Mg, Ca, and oxygen. In particular, it is important that the oxygen content of the A-mon powder is 2% by weight or less.

好ましくは1〜2重量%である。Preferably it is 1 to 2% by weight.

次に、本発明のAuN焼結体の製造方法について述べる
。まず、AuN粉末としては、上記したように熱伝導率
を考慮して酸素を2重量%以下含有するものを用意し、
このAuN粉末に焼結助剤を所定量添加したのち、ボー
ルミル等で混合する。なお、このときに使用する焼結助
剤としては、一般に使用されるものであればよく、例え
ば、酸化イツトリウム(Y2O2)をあげることができ
、その添加量としては1〜5重量%、好ましくは3〜5
重量%とする。
Next, a method for manufacturing an AuN sintered body of the present invention will be described. First, as the AuN powder, one containing 2% by weight or less of oxygen is prepared in consideration of thermal conductivity as described above.
A predetermined amount of sintering aid is added to this AuN powder, and then mixed using a ball mill or the like. The sintering aid used at this time may be any commonly used one, such as yttrium oxide (Y2O2), and the amount added is 1 to 5% by weight, preferably 3-5
Weight%.

次に、この混合粉末に通常使用されるパラフィン系バイ
ンダーのようなバインダーを加えたのち、混練、造粒、
整粒を行ない、加圧成型する。
Next, a binder such as a commonly used paraffin binder is added to this mixed powder, followed by kneading, granulation,
The particles are sized and pressure molded.

得られたAuN圧粉体を炉内に配置した後、常圧にてN
2などの雰囲気中で昇温してバインダーを除去する。
After placing the obtained AuN powder compact in a furnace, N was heated at normal pressure.
The binder is removed by raising the temperature in an atmosphere such as 2.

更に、Aj2N圧粉体を別の焼結炉内に移してN2など
の雰囲気中で最適な焼結温度まで昇温する。このときの
昇温速度は100〜500”C/ h r、好ましくは
100〜bる。最適な焼結温度に達した時点で、この温
度を保持しつづけると同時に炉内雰囲気を加圧してこの
状態を保持したままでA!;LN圧粉体を焼結する。こ
の時の雰囲気圧が5Kg/cmを超えると偏析績が消失
し、外観上均一な焼結体となり、2Kg/ cm未満で
あると偏析績が析出し、外観上、不均一な焼結体となる
ので2〜9Kg/cmとする。好ましくは4〜5Kg/
dである。焼結時間は0.5〜4時間、好ましくは1〜
3時間である。その後、雰囲気を常圧にして冷却する。
Furthermore, the Aj2N powder compact is transferred to another sintering furnace and heated to the optimum sintering temperature in an atmosphere such as N2. The temperature increase rate at this time is 100 to 500"C/hr, preferably 100 to 100"C/hr.When the optimum sintering temperature is reached, this temperature is maintained and the atmosphere in the furnace is pressurized at the same time. Sinter the LN compact while maintaining the state A!; If the atmospheric pressure at this time exceeds 5 kg/cm, the segregation will disappear and the sintered compact will be uniform in appearance, and if the atmospheric pressure is less than 2 kg/cm If there is, segregation will precipitate, resulting in a sintered body that is non-uniform in appearance, so it is set at 2 to 9 Kg/cm.Preferably 4 to 5 Kg/cm.
It is d. Sintering time is 0.5-4 hours, preferably 1-4 hours.
It is 3 hours. Thereafter, the atmosphere is brought to normal pressure and cooled.

このときの降温速度は、格別限定さらないが通常100
〜500℃/hr、好ましくは200〜300°C/h
rである。
The temperature decreasing rate at this time is not particularly limited, but is usually 100%.
~500°C/hr, preferably 200-300°C/h
It is r.

(実施例) 実施例 不純物として酸素を1.0重量%含有するA文N粉末に
焼結助剤としてY2O3を3重量%添加し、ボールミル
を用いて粉砕、混合を行ない原料を調製した。次いで、
この原料にバインダーとしてパラフィン系バインダーを
12重量%添加して造粒したのち、800Kg/dの圧
力でプレス成形して、35.0X35 、OXI Om
mの圧粉体とした。この圧粉体をN2雰囲気中、昇温速
度100℃/分で700 ’Oまで昇温してバインダー
を除去した。更に、別の焼結炉内に移し昇温速度150
℃/分で昇温した後、N2雰囲気中1770℃において
雰囲気圧を6Kg/cmに加圧した状態のまま2時間焼
結した。その後、雰囲気圧を常圧に戻して降温速度35
0°C/分で冷却した。
(Example) Example A raw material was prepared by adding 3% by weight of Y2O3 as a sintering aid to AN powder containing 1.0% by weight of oxygen as an impurity, and grinding and mixing using a ball mill. Then,
After adding 12% by weight of a paraffin binder to this raw material and granulating it, it was press-molded at a pressure of 800 kg/d to form a 35.0X35, OXI Om.
It was made into a green compact of m. This green compact was heated to 700'O in a N2 atmosphere at a heating rate of 100°C/min to remove the binder. Furthermore, it was transferred to another sintering furnace and the temperature increase rate was 150
After increasing the temperature at a rate of .degree. C./min, sintering was carried out for 2 hours at 1770.degree. C. in a N2 atmosphere while maintaining the atmospheric pressure at 6 kg/cm. After that, the atmospheric pressure is returned to normal pressure and the temperature decrease rate is 35.
Cooled at 0°C/min.

得られた29.lX29.IXo、8mmのA文N焼結
体を切断して29.lX29.IXO,2mmの半導体
用放熱板を4個得た。この中で偏析物を一部でも含まな
い半導体用放熱板は4個であり、製品歩留りは100%
であった。また、得られた放熱板を直径10mm、厚さ
2mmの円板に研削し、これを試験片としてレーザフラ
ッシュ法により熱伝導率を測定し、それらを平均したと
ころ130W/m・にであった。
Obtained 29. lX29. IXo, cut the 8mm A pattern N sintered body 29. lX29. Four IXO, 2 mm heat sinks for semiconductors were obtained. Among these, there are 4 heat sinks for semiconductors that do not contain even a part of segregated substances, and the product yield is 100%.
Met. In addition, the obtained heat sink was ground into a disk with a diameter of 10 mm and a thickness of 2 mm, and this was used as a test piece to measure the thermal conductivity by the laser flash method.The average of the results was 130 W/m. .

比較例1 雰囲気圧を常圧のままで、AIN圧粉体を焼結したこと
を除いては、実施例と同様にしてAIN焼結体を製造し
、半導体用放熱板を得た。
Comparative Example 1 An AIN sintered body was manufactured in the same manner as in the example except that the AIN green compact was sintered while the atmospheric pressure remained at normal pressure, and a heat sink for a semiconductor was obtained.

この中で偏析物を一部でも含まない半導体用放熱板は、
4個中0個であり、製品歩留りは0%であった。また、
実施例と同様にして熱伝導率を測定したところL30W
/m・kであった。
Among these, heat sinks for semiconductors that do not contain even a part of segregated substances are
There were 0 out of 4, and the product yield was 0%. Also,
When the thermal conductivity was measured in the same manner as in the example, it was L30W.
/m・k.

比較例2 酸素含有量が3重量%であるAJJN粉末を用いたこと
を除いては実施例と同様にしてAuN焼結対を製造し、
半導体用放熱板を得た。この中で偏析物を一部でも含ま
ない半導体用放熱板は10個中4個であり、製品歩留り
は40%であった。また、実施例と同様にして熱伝導率
を測定したところ工OOW/m・kであった。
Comparative Example 2 An AuN sintered pair was produced in the same manner as in the example except that AJJN powder with an oxygen content of 3% by weight was used,
A heat sink for semiconductors was obtained. Among these, 4 out of 10 heat sinks for semiconductors did not contain even a part of segregated substances, and the product yield was 40%. Further, when the thermal conductivity was measured in the same manner as in the example, it was OOW/m·k.

[発明の効果] 以上の説明から明らかなように1本発明のAIN焼結体
は、高熱伝導率を有する優れたものであり、かつ、偏析
物が固溶して均一なものであるため、半導体用の放熱板
として裁断した場合でもその製品の歩留りが低下するこ
とはない。したがって、その工業的価値は極めて高く、
特に半導体用放熱板の素材として有用である。
[Effects of the Invention] As is clear from the above description, the AIN sintered body of the present invention has an excellent high thermal conductivity, and is uniform in that segregated substances are dissolved in solid solution. Even if it is cut into heat sinks for semiconductors, the yield of the product will not decrease. Therefore, its industrial value is extremely high.
It is particularly useful as a material for heat sinks for semiconductors.

Claims (1)

【特許請求の範囲】 1、熱伝導率が100W/m・k以上であり偏析物が固
溶していることを特徴とする窒化アルミニウム焼結体。 2、窒化アルミニウム粉末を加圧成形して得られた圧粉
体を焼結して窒化アルミニウム焼結体を製造する方法に
おいて、焼結温度を保持する間雰囲気圧を加圧すること
を特徴とする窒化アルミニウム焼結体の製造方法。 3、窒化アルミニウム粉末の酸素含有量が2重量%以下
である特許請求の範囲第2項記載の窒化アルミニウム焼
結体の製造方法。
[Claims] 1. An aluminum nitride sintered body characterized by having a thermal conductivity of 100 W/m·k or more and containing segregated substances in solid solution. 2. A method for producing an aluminum nitride sintered body by sintering a green compact obtained by pressure-molding aluminum nitride powder, characterized in that the atmospheric pressure is increased while the sintering temperature is maintained. A method for producing an aluminum nitride sintered body. 3. The method for producing an aluminum nitride sintered body according to claim 2, wherein the aluminum nitride powder has an oxygen content of 2% by weight or less.
JP61213988A 1986-09-12 1986-09-12 Aluminum nitride sintered body and manufacture Pending JPS6369764A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61213988A JPS6369764A (en) 1986-09-12 1986-09-12 Aluminum nitride sintered body and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61213988A JPS6369764A (en) 1986-09-12 1986-09-12 Aluminum nitride sintered body and manufacture

Publications (1)

Publication Number Publication Date
JPS6369764A true JPS6369764A (en) 1988-03-29

Family

ID=16648392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61213988A Pending JPS6369764A (en) 1986-09-12 1986-09-12 Aluminum nitride sintered body and manufacture

Country Status (1)

Country Link
JP (1) JPS6369764A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01138174A (en) * 1987-11-20 1989-05-31 Ibiden Co Ltd Production of sintered aluminum nitride
US5683529A (en) * 1991-05-21 1997-11-04 Fujitsu Limited Process of producing aluminum nitride multiple-layer circuit board

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6121978A (en) * 1984-07-09 1986-01-30 株式会社トクヤマ Manufacturing method of aluminum nitride sintered body
JPS6163571A (en) * 1984-09-03 1986-04-01 株式会社トクヤマ Manufacturing method of aluminum nitride sintered body
JPS62275069A (en) * 1986-05-22 1987-11-30 日立金属株式会社 Manufacture of aln ceramics

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6121978A (en) * 1984-07-09 1986-01-30 株式会社トクヤマ Manufacturing method of aluminum nitride sintered body
JPS6163571A (en) * 1984-09-03 1986-04-01 株式会社トクヤマ Manufacturing method of aluminum nitride sintered body
JPS62275069A (en) * 1986-05-22 1987-11-30 日立金属株式会社 Manufacture of aln ceramics

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01138174A (en) * 1987-11-20 1989-05-31 Ibiden Co Ltd Production of sintered aluminum nitride
US5683529A (en) * 1991-05-21 1997-11-04 Fujitsu Limited Process of producing aluminum nitride multiple-layer circuit board

Similar Documents

Publication Publication Date Title
US4671912A (en) Method of manufacturing sintered ceramic body
EP0400090B1 (en) High strength silicon nitride
JPH0450107A (en) Aluminum nitride granule and production thereof
JPS63277567A (en) Sintered aluminum nitride having high thermal conductivity
JPS6369764A (en) Aluminum nitride sintered body and manufacture
JPS6036333A (en) Arsenate doping agent compound
JPH06279124A (en) Production of silicon nitride sintered compact
JP3141505B2 (en) Aluminum nitride sintered body and method for producing the same
JPS63295479A (en) Sintered aluminum nitride body and its production
JP2772580B2 (en) Method for producing aluminum nitride sintered body
JP3942280B2 (en) Method for producing hexagonal boron nitride sintered body
JPS61183174A (en) Aluminum nitride aintered body
JPH04292467A (en) Bn-aln-based compound sintered compact and its production
JPH046162A (en) Aln-bn-based composite sintered body and production thereof
JPH046161A (en) Production of aln sintered body
JPS60231469A (en) Thermally hydrostatic press formation for soft ferrite
JPS63277571A (en) Production of sintered aluminum nitride having high thermal conductivity
JPS62252008A (en) Manufacture of microwave dielectric material
JPH02307871A (en) Production of ceramic sintered compact
JPH03242379A (en) Production of sintered body of aluminum nitride and granulated powder of aluminum nitride
JPS62275069A (en) Manufacture of aln ceramics
JPH092879A (en) Aluminum nitride granules and method for producing the same
JPH0788256B2 (en) Method for manufacturing aluminum nitride sintered body
JPH05310475A (en) Method for manufacturing aluminum nitride sintered body
JPS5978972A (en) Manufacturing method of alumina sintered body