JPS637156U - - Google Patents
Info
- Publication number
- JPS637156U JPS637156U JP9951286U JP9951286U JPS637156U JP S637156 U JPS637156 U JP S637156U JP 9951286 U JP9951286 U JP 9951286U JP 9951286 U JP9951286 U JP 9951286U JP S637156 U JPS637156 U JP S637156U
- Authority
- JP
- Japan
- Prior art keywords
- guide
- heater
- forming material
- substrate
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 8
- 229920006254 polymer film Polymers 0.000 claims description 5
- 239000000463 material Substances 0.000 claims 4
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の実施例に係る高分子薄膜の作
成装置の概略図、第２図は従来の高分子薄膜の作
成装置の概略図である。
１０，６０……真空槽、１１，６１……排気口
、２０，７０……容器、２１，７１……開口部、
３０，８０……基板ホルダ、３１，８１……基板
、４０……誘導部材、４１……ガイド部、Ｈ１，
Ｈ１１……第１ヒータ、Ｈ２，Ｈ１２……第２ヒ
ータ、Ｈ３……第３ヒータ。
FIG. 1 is a schematic diagram of an apparatus for producing a thin polymer film according to an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional apparatus for producing a thin polymer film. 10,60...Vacuum chamber, 11,61...Exhaust port, 20,70...Container, 21,71...Opening part,
30, 80... Substrate holder, 31, 81... Substrate, 40... Guide member, 41... Guide portion, H1,
H11...first heater, H2, H12...second heater, H3...third heater.
Claims (1)
、 該真空槽内に配置され少なくとも１つの開口部
と投入された膜形成材料を所定の温度に加熱する
第１ヒータとを有する容器と、 該開口部と一定間隔をへだてて対向配置される
基板を保持し該基板を所定の温度に加熱する第２
ヒータを有する基板ホルダと、 該開口部と該基板ホルダとを結ぶ誘導通路を形
成するガイド部と該誘導通路を通る該膜形成材料
を所定の温度に維持する第３ヒータとを有する誘
導部材とからなり、 該開口部から蒸発し該基板ホルダに保持された
基板に衝突する該膜形成材料を誘導しその温度を
制御する構成としたことを特徴とする高分子薄膜
の作成装置。 (2) 誘導部材は、第１ヒータにより加熱されて
蒸発する膜成形材料の温度とほぼ同一の温度にガ
イド部を加熱するための第３ヒータを制御する制
御部をもつ実用新案登録請求の範囲第１項記載の
高分子薄膜の作成装置。 (3) ガイド部は、筒状でその内側に誘導通路を
形成している実用新案登録請求の範囲第１項記載
の高分子薄膜の作成装置。[Claims for Utility Model Registration] (1) A vacuum chamber that maintains a high vacuum state under reduced pressure, and at least one opening placed in the vacuum chamber and a film-forming material introduced therein that are heated to a predetermined temperature. a second container that holds a substrate and heats the substrate to a predetermined temperature;
A guide member having a substrate holder having a heater, a guide portion forming a guide passage connecting the opening and the substrate holder, and a third heater maintaining the film forming material passing through the guide passage at a predetermined temperature. An apparatus for producing a thin polymer film, comprising: guiding the film-forming material that evaporates from the opening and colliding with the substrate held by the substrate holder to control its temperature. (2) The guide member has a control section that controls a third heater to heat the guide section to approximately the same temperature as the temperature of the film forming material that is heated and evaporated by the first heater. 2. The apparatus for producing a thin polymer film according to item 1. (3) The apparatus for producing a thin polymer film according to claim 1, wherein the guide part is cylindrical and has a guide passage formed inside the guide part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9951286U JPS637156U (en) | 1986-06-27 | 1986-06-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9951286U JPS637156U (en) | 1986-06-27 | 1986-06-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS637156U true JPS637156U (en) | 1988-01-18 |
Family
ID=30968454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9951286U Pending JPS637156U (en) | 1986-06-27 | 1986-06-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS637156U (en) |
-
1986
- 1986-06-27 JP JP9951286U patent/JPS637156U/ja active Pending
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