JPS6373359U - - Google Patents

Info

Publication number
JPS6373359U
JPS6373359U JP16786386U JP16786386U JPS6373359U JP S6373359 U JPS6373359 U JP S6373359U JP 16786386 U JP16786386 U JP 16786386U JP 16786386 U JP16786386 U JP 16786386U JP S6373359 U JPS6373359 U JP S6373359U
Authority
JP
Japan
Prior art keywords
substrate holder
target
substrate
insulating layer
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16786386U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16786386U priority Critical patent/JPS6373359U/ja
Publication of JPS6373359U publication Critical patent/JPS6373359U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係る基板押えを適用したスパ
ツタ装置の概略構成図、第2図は基板を基板ホル
ダーに取付けた状態の斜視図である。 尚、図面中1はチヤンバー、6は高周波電源、
7はバツキングプレート、10はターゲツト、1
2は基板ホルダー、13は基板、14は基板受け
、15は基板押え、17は絶縁層である。
FIG. 1 is a schematic configuration diagram of a sputtering apparatus to which a substrate holder according to the present invention is applied, and FIG. 2 is a perspective view of a state in which a substrate is attached to a substrate holder. In addition, in the drawing, 1 is a chamber, 6 is a high frequency power supply,
7 is the bucking plate, 10 is the target, 1
2 is a substrate holder, 13 is a substrate, 14 is a substrate holder, 15 is a substrate holder, and 17 is an insulating layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] チヤンバー内にてターゲツトに対向するように
基板を基板ホルダーに対して保持する基板押えに
おいて、この基板ホルダーは金属材料からなり、
ターゲツトに対向する面には絶縁層が形成されて
いることを特徴とするスパツタ装置における基板
押え。
In a substrate holder that holds a substrate against a substrate holder in a chamber so as to face a target, the substrate holder is made of a metal material,
1. A substrate holder for a sputtering apparatus, characterized in that an insulating layer is formed on a surface facing a target.
JP16786386U 1986-10-31 1986-10-31 Pending JPS6373359U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16786386U JPS6373359U (en) 1986-10-31 1986-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16786386U JPS6373359U (en) 1986-10-31 1986-10-31

Publications (1)

Publication Number Publication Date
JPS6373359U true JPS6373359U (en) 1988-05-16

Family

ID=31100197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16786386U Pending JPS6373359U (en) 1986-10-31 1986-10-31

Country Status (1)

Country Link
JP (1) JPS6373359U (en)

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