JPS6411717A - Pulse feed method in electrochemical machine - Google Patents
Pulse feed method in electrochemical machineInfo
- Publication number
- JPS6411717A JPS6411717A JP62167331A JP16733187A JPS6411717A JP S6411717 A JPS6411717 A JP S6411717A JP 62167331 A JP62167331 A JP 62167331A JP 16733187 A JP16733187 A JP 16733187A JP S6411717 A JPS6411717 A JP S6411717A
- Authority
- JP
- Japan
- Prior art keywords
- pulse
- current density
- fed
- finishing process
- supplying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
PURPOSE:To obtain satisfactory surface quality by supplying a third pulse having a current density which is higher than that of a first pulse and which is gradually lowered down to that of the first pulse at the preceding stage of a finishing process and by supplying a second pulse having a high current density at the later stage of the finishing process. CONSTITUTION:At the preceding state of a finishing process, a surface roughness enhancing pulse P1 having a predetermined current density is fed between a workpiece 2 and an electrode 3, and after supply with one to several repetitions, electrolyte flow control section 10 delivers a signal to operate a solenoid valve 21 in a filtering device 13 so as to remove an electrolytic product. Then the pulse P1 is applied. After the above-mentioned steps are repeated by a several cycle number corresponding to data from an input device 12, a pulse P3 having a current density higher than that of the pulse P1 is fed by a less cycle number, and then the current density of the pulse P3 is gradually decreased so as to be turned into the pulse 1 for uniforming a machined surface on which skins or machined chips are stuck. Then, at the later stage of the finish process, a pulse P2 having a high current density is fed so as to obtain a mirror-surface- like glossy surface. Thereby it is possible to obtain satisfactory surface quality.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62167331A JPS6411717A (en) | 1987-07-03 | 1987-07-03 | Pulse feed method in electrochemical machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62167331A JPS6411717A (en) | 1987-07-03 | 1987-07-03 | Pulse feed method in electrochemical machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6411717A true JPS6411717A (en) | 1989-01-17 |
Family
ID=15847759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62167331A Pending JPS6411717A (en) | 1987-07-03 | 1987-07-03 | Pulse feed method in electrochemical machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6411717A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461395A (en) * | 1977-10-21 | 1979-05-17 | Inoue Japax Res Inc | Electric spark machining |
| JPS629823A (en) * | 1985-07-05 | 1987-01-17 | Hitachi Zosen Corp | Electrolytic composite polishing method |
-
1987
- 1987-07-03 JP JP62167331A patent/JPS6411717A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461395A (en) * | 1977-10-21 | 1979-05-17 | Inoue Japax Res Inc | Electric spark machining |
| JPS629823A (en) * | 1985-07-05 | 1987-01-17 | Hitachi Zosen Corp | Electrolytic composite polishing method |
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