JPS6413536A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6413536A
JPS6413536A JP16874287A JP16874287A JPS6413536A JP S6413536 A JPS6413536 A JP S6413536A JP 16874287 A JP16874287 A JP 16874287A JP 16874287 A JP16874287 A JP 16874287A JP S6413536 A JPS6413536 A JP S6413536A
Authority
JP
Japan
Prior art keywords
layer
org
compd
pattern
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16874287A
Other languages
Japanese (ja)
Inventor
Michiaki Hashimoto
Takao Iwayagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP16874287A priority Critical patent/JPS6413536A/en
Publication of JPS6413536A publication Critical patent/JPS6413536A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To form a fine pattern having high dimensional precision by forming a layer of an org. material contg. a specified compd. on a substrate having stages on the surface. CONSTITUTION:A layer 3 of an org. material contg. at least an aromatic sulfonylazide compd., a high molecular compd., and a compd. expressed by formula I is used for a layer for smoothening a substrate in a multilayer resist process, thus, the layer 3 of the org. material is heat-treated. A mask pattern 5 having a desired shape and consisting of a material having higher dry etching resistance than the org. material layer is formed thereon, and a pattern is formed after removing the mask pattern by dry etching. In formula I, x is 1-3; R is H, or halogen, etc. By this method, a pattern having high dimensional precision and satisfactory good shape is obtd.
JP16874287A 1987-07-08 1987-07-08 Pattern forming method Pending JPS6413536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16874287A JPS6413536A (en) 1987-07-08 1987-07-08 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16874287A JPS6413536A (en) 1987-07-08 1987-07-08 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS6413536A true JPS6413536A (en) 1989-01-18

Family

ID=15873573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16874287A Pending JPS6413536A (en) 1987-07-08 1987-07-08 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS6413536A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009121721A (en) * 2007-11-13 2009-06-04 Mitsubishi Electric Building Techno Service Co Ltd Personal air conditioning system
JP2016166296A (en) * 2015-03-10 2016-09-15 大日精化工業株式会社 Pigment dispersant, pigment composition, and pigment colorant
JP2016169356A (en) * 2015-03-10 2016-09-23 大日精化工業株式会社 Pigment dispersant, pigment composition, and pigment colorant
JP2018168240A (en) * 2017-03-29 2018-11-01 日本化薬株式会社 Azo compound or salt thereof, and pigment composition containing the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009121721A (en) * 2007-11-13 2009-06-04 Mitsubishi Electric Building Techno Service Co Ltd Personal air conditioning system
JP2016166296A (en) * 2015-03-10 2016-09-15 大日精化工業株式会社 Pigment dispersant, pigment composition, and pigment colorant
JP2016169356A (en) * 2015-03-10 2016-09-23 大日精化工業株式会社 Pigment dispersant, pigment composition, and pigment colorant
JP2018168240A (en) * 2017-03-29 2018-11-01 日本化薬株式会社 Azo compound or salt thereof, and pigment composition containing the same

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