JPS6414849A - Gas phase ion source - Google Patents

Gas phase ion source

Info

Publication number
JPS6414849A
JPS6414849A JP62170429A JP17042987A JPS6414849A JP S6414849 A JPS6414849 A JP S6414849A JP 62170429 A JP62170429 A JP 62170429A JP 17042987 A JP17042987 A JP 17042987A JP S6414849 A JPS6414849 A JP S6414849A
Authority
JP
Japan
Prior art keywords
electric field
connection
field relaxation
ring
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62170429A
Other languages
Japanese (ja)
Inventor
Ryuzo Aihara
Yoshizo Sakuma
Tadayoshi Nagafune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP62170429A priority Critical patent/JPS6414849A/en
Publication of JPS6414849A publication Critical patent/JPS6414849A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To prevent a streamer phenomenon due to a gas leak via simple constitution by positioning an electric field relaxation ring in such a way as to surround a connection part between a gas introduction pipe and a connection pipe. CONSTITUTION:An electric field relaxation ring 12 is so arranged as to surround a connection part between a connection pipe 7 and a gas introduction pipe B, or an engagement part between a projection part 11a and the receiver groove 11b thereof. The electric field relaxation ring 12 is electrically in contact with a presser screw 10 and kept at the same potential as said presser screw 10 and connection pipe 7, or a pullout electrode 5. According to the aforesaid construction, a space exposed to a helium gas leak comes to have the same potential as a connection member via the ring 12. As a result, the electric field is almost free from disturbance, even if helium gas leaks and a streamer phenomenon does not occur.
JP62170429A 1987-07-08 1987-07-08 Gas phase ion source Pending JPS6414849A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62170429A JPS6414849A (en) 1987-07-08 1987-07-08 Gas phase ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62170429A JPS6414849A (en) 1987-07-08 1987-07-08 Gas phase ion source

Publications (1)

Publication Number Publication Date
JPS6414849A true JPS6414849A (en) 1989-01-19

Family

ID=15904753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62170429A Pending JPS6414849A (en) 1987-07-08 1987-07-08 Gas phase ion source

Country Status (1)

Country Link
JP (1) JPS6414849A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011528489A (en) * 2008-07-16 2011-11-17 カール ツァイス エヌティーエス エルエルシー Current increase in charged particle sources and systems.
EP2341525A3 (en) * 2009-12-30 2012-03-07 FEI Company Plasma source for charged particle beam system
US8642974B2 (en) 2009-12-30 2014-02-04 Fei Company Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
US8987678B2 (en) 2009-12-30 2015-03-24 Fei Company Encapsulation of electrodes in solid media
US9818584B2 (en) 2011-10-19 2017-11-14 Fei Company Internal split faraday shield for a plasma source

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011528489A (en) * 2008-07-16 2011-11-17 カール ツァイス エヌティーエス エルエルシー Current increase in charged particle sources and systems.
EP2341525A3 (en) * 2009-12-30 2012-03-07 FEI Company Plasma source for charged particle beam system
US8642974B2 (en) 2009-12-30 2014-02-04 Fei Company Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
US8987678B2 (en) 2009-12-30 2015-03-24 Fei Company Encapsulation of electrodes in solid media
US9196451B2 (en) 2009-12-30 2015-11-24 Fei Company Plasma source for charged particle beam system
US9818584B2 (en) 2011-10-19 2017-11-14 Fei Company Internal split faraday shield for a plasma source

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