JPS6415366A - Preparation of composition modified nitrided alloy film - Google Patents

Preparation of composition modified nitrided alloy film

Info

Publication number
JPS6415366A
JPS6415366A JP62171397A JP17139787A JPS6415366A JP S6415366 A JPS6415366 A JP S6415366A JP 62171397 A JP62171397 A JP 62171397A JP 17139787 A JP17139787 A JP 17139787A JP S6415366 A JPS6415366 A JP S6415366A
Authority
JP
Japan
Prior art keywords
compsn
formula
alloy film
nitrided alloy
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62171397A
Other languages
Japanese (ja)
Other versions
JPH089769B2 (en
Inventor
Hiroshi Sakakima
Koichi Osano
Yuji Komata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62171397A priority Critical patent/JPH089769B2/en
Publication of JPS6415366A publication Critical patent/JPS6415366A/en
Publication of JPH089769B2 publication Critical patent/JPH089769B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To efficiently obtain nitrided alloy film having a distinct compsn. modification adequate for a magnetic head, etc., by impressing a negative bias voltage periodically at specified intervals to a substrate at the time of forming the nitrided alloy film by a reactive sputtering method. CONSTITUTION:An alloy target having the atom compsn. ratio expressed by the formula MaTbXc is used and gaseous N2 is mixed with gaseous Ar, then the nitrided alloy film is formed by the reactive sputtering method on the substrate to which the negative bias voltage is periodically impressed at the specified intervals. The compsn. modified nitrided alloy film which is modulated in the compsn. in the film thickness direction and has the average atom compsn. expressed by the formula I is thereby formed. (In the formula, M is Fe, Co, Ni; T is Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn; X is B, Al, C, Si, Ge, Sn; a, b, c are atom compsn. % and satisfy the conditions expressed by the formula; a', b', c' are average atom compsn. % and the numerical values satisfying the conditions expressed by the formula IV - the formula X).
JP62171397A 1987-07-09 1987-07-09 Preparation method of composition-modulated nitrided alloy film Expired - Fee Related JPH089769B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62171397A JPH089769B2 (en) 1987-07-09 1987-07-09 Preparation method of composition-modulated nitrided alloy film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62171397A JPH089769B2 (en) 1987-07-09 1987-07-09 Preparation method of composition-modulated nitrided alloy film

Publications (2)

Publication Number Publication Date
JPS6415366A true JPS6415366A (en) 1989-01-19
JPH089769B2 JPH089769B2 (en) 1996-01-31

Family

ID=15922398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62171397A Expired - Fee Related JPH089769B2 (en) 1987-07-09 1987-07-09 Preparation method of composition-modulated nitrided alloy film

Country Status (1)

Country Link
JP (1) JPH089769B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5429731A (en) * 1990-09-28 1995-07-04 Matsushita Electric Industrial Co., Ltd. Method for forming a soft magnetic nitride layer on a magnetic head

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Method for manufacturing amorphous thin film
JPS5873030A (en) * 1981-10-27 1983-05-02 Kokusai Denshin Denwa Co Ltd <Kdd> Optical magnetic recording medium
JPS5913608A (en) * 1982-07-12 1984-01-24 Nippon Telegr & Teleph Corp <Ntt> Manufacture of thin metallic nitride film
JPS6257144A (en) * 1985-09-06 1987-03-12 Hitachi Ltd Photomagnetic recording medium and its production

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Method for manufacturing amorphous thin film
JPS5873030A (en) * 1981-10-27 1983-05-02 Kokusai Denshin Denwa Co Ltd <Kdd> Optical magnetic recording medium
JPS5913608A (en) * 1982-07-12 1984-01-24 Nippon Telegr & Teleph Corp <Ntt> Manufacture of thin metallic nitride film
JPS6257144A (en) * 1985-09-06 1987-03-12 Hitachi Ltd Photomagnetic recording medium and its production

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5429731A (en) * 1990-09-28 1995-07-04 Matsushita Electric Industrial Co., Ltd. Method for forming a soft magnetic nitride layer on a magnetic head

Also Published As

Publication number Publication date
JPH089769B2 (en) 1996-01-31

Similar Documents

Publication Publication Date Title
EP1452622A3 (en) Target and process for its production, and method for forming a film having a high refractive index
JPS5789450A (en) Amorphous magnetic alloy
EP0788027A4 (en) Phase shift mask blank and production method therefor
EP0391258A3 (en) Magnetic recording medium and method for its production
JPS6415366A (en) Preparation of composition modified nitrided alloy film
JPS5638808A (en) Heat treatment for amorphous magnetic alloy in magnetic field
JPS57202709A (en) Magnetic material and manufacture therefor
JPS6417205A (en) Heat treatment of nitrided alloy film
JPS6424403A (en) Soft magnetic thin film
JPS5573840A (en) High permeability magnetic alloy with superior wear resistance
JPS5762506A (en) Magnetic material for vacuum evaporation
JPS5472715A (en) High permeability amorphous alloy
JPS57198615A (en) Magnetic recording tape
JPS5762505A (en) Magnetic material for vacuum evaporation
JPS57201004A (en) Magnetic recording medium
JPS6413220A (en) Thin metal film type magnetic recording medium
JPS57180110A (en) Manufacture of magnetic recording medium
JPS56150163A (en) Corrosion resistant alloy for molten zinc
JPS54107824A (en) High permeability amorphous alloy
JPS5798624A (en) Manufacture of special malleable cast iron
JPS6479918A (en) Magnetic recording medium and its production
JPS57198614A (en) Magnetic recording tape
JPS64249A (en) Extra thin amorphous alloy combining high magnetic permeability with low iron loss
JPS5672037A (en) Resin composition for metal deposition
JPS55138058A (en) High chromium ferrite stainless steel

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees