JPS6415733A - Photosensitive composition and pattern forming method with said composition - Google Patents

Photosensitive composition and pattern forming method with said composition

Info

Publication number
JPS6415733A
JPS6415733A JP62170889A JP17088987A JPS6415733A JP S6415733 A JPS6415733 A JP S6415733A JP 62170889 A JP62170889 A JP 62170889A JP 17088987 A JP17088987 A JP 17088987A JP S6415733 A JPS6415733 A JP S6415733A
Authority
JP
Japan
Prior art keywords
composition
compsn
compd
polymer
forming method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62170889A
Other languages
Japanese (ja)
Inventor
Shuzo Hattori
Norio Ishikawa
Masao Miyazaki
Hayato Katsuragi
Kiyoto Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanto Chemical Co Inc
Original Assignee
Kanto Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanto Chemical Co Inc filed Critical Kanto Chemical Co Inc
Priority to JP62170889A priority Critical patent/JPS6415733A/en
Publication of JPS6415733A publication Critical patent/JPS6415733A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable the treatment of an Si-contg. resist with oxygen plasma by using a specified compsn. CONSTITUTION:The titled compsn. contains a polymer (A) having carbon-carbon unsaturated bonds, a compd. (B) having an Si-H group and subliming or gasifying from the solid state at room temp. when heat treated and an optical radical generator (C). A resist film is formed with the compsn., patternwise exposed, heat treated and treated with oxygen plasma to form a pattern. The polymer A may be used polydiallyl phthalate, the compd. B may be used triphenylsilane and the radical generator C may be used benzophenone. Cellosolve acetate may be used as a solvent and a sensitizer may be used in combination with those components as desired.
JP62170889A 1987-07-10 1987-07-10 Photosensitive composition and pattern forming method with said composition Pending JPS6415733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62170889A JPS6415733A (en) 1987-07-10 1987-07-10 Photosensitive composition and pattern forming method with said composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62170889A JPS6415733A (en) 1987-07-10 1987-07-10 Photosensitive composition and pattern forming method with said composition

Publications (1)

Publication Number Publication Date
JPS6415733A true JPS6415733A (en) 1989-01-19

Family

ID=15913198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62170889A Pending JPS6415733A (en) 1987-07-10 1987-07-10 Photosensitive composition and pattern forming method with said composition

Country Status (1)

Country Link
JP (1) JPS6415733A (en)

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