JPS6417366A - Electron beam and x-ray detector - Google Patents
Electron beam and x-ray detectorInfo
- Publication number
- JPS6417366A JPS6417366A JP62162552A JP16255287A JPS6417366A JP S6417366 A JPS6417366 A JP S6417366A JP 62162552 A JP62162552 A JP 62162552A JP 16255287 A JP16255287 A JP 16255287A JP S6417366 A JPS6417366 A JP S6417366A
- Authority
- JP
- Japan
- Prior art keywords
- detector
- probe
- shutter means
- control
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title 1
- 239000000523 sample Substances 0.000 abstract 4
- 230000005855 radiation Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Landscapes
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE: To avoid a detector from excessive radiation exposure by providing a shutter means at the end on the detector side of a probe, to control the shutter means form the outside of an envelope located remote from the detector. CONSTITUTION: An electron and X-ray detecting device has a probe 2 stored in an envelope 7 and guided into an electron microscope and a semiconductor detector 1 mounted at one end of the probe 2. It is provided with a shutter means, arranged at the end on the detector 1 side of the probe 2, to completely or partially cover the detector 1 and a control means arranged remotely from the detector 1 to control the covering of the shutter means. In this way, damages to the detector 1, when exposed to excessive radiation, are prevented.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62162552A JPS6417366A (en) | 1987-07-01 | 1987-07-01 | Electron beam and x-ray detector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62162552A JPS6417366A (en) | 1987-07-01 | 1987-07-01 | Electron beam and x-ray detector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6417366A true JPS6417366A (en) | 1989-01-20 |
Family
ID=15756761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62162552A Pending JPS6417366A (en) | 1987-07-01 | 1987-07-01 | Electron beam and x-ray detector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6417366A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0295150U (en) * | 1989-01-13 | 1990-07-30 | ||
| JP2013513215A (en) * | 2009-12-07 | 2013-04-18 | オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド | X-ray analyzer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57143252A (en) * | 1981-01-30 | 1982-09-04 | Philips Nv | Electron microscope |
-
1987
- 1987-07-01 JP JP62162552A patent/JPS6417366A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57143252A (en) * | 1981-01-30 | 1982-09-04 | Philips Nv | Electron microscope |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0295150U (en) * | 1989-01-13 | 1990-07-30 | ||
| JP2013513215A (en) * | 2009-12-07 | 2013-04-18 | オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド | X-ray analyzer |
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