JPS6419660A - Ion beam irradiation device - Google Patents
Ion beam irradiation deviceInfo
- Publication number
- JPS6419660A JPS6419660A JP62174341A JP17434187A JPS6419660A JP S6419660 A JPS6419660 A JP S6419660A JP 62174341 A JP62174341 A JP 62174341A JP 17434187 A JP17434187 A JP 17434187A JP S6419660 A JPS6419660 A JP S6419660A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- ion beams
- filament
- enclose
- extending
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 title abstract 7
- 238000009413 insulation Methods 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To make it possible to uniform the space distribution of ion beams extending for a wide sphere by so arranging a filament for emitting thermoelectron as to enclose ion beams drawn out from the ion source ahead in the drawing out direction of the ion beams from the ion source. CONSTITUTION:Plural insulation poles 22 are so provided as to enclose the circumference of a drawing out electrode system 12 at the front of a housing 14 for the ion source 4, and a filament 24 for emitting thermoelectron is so arranged as to enclose ion beams 16 drawn out from the ion source 4 by mounting to this insulation poles 22. To this filament 24 is connected a filament power source 26 for heating it between both ends and an accelerating power source 28 for accelerating thermoelectrons emitted to one end and an earth. Hereby, space distribution of ion beams can be uniformed extending for a wide sphere, accordingly it becomes possible to irradiate ion beams uniformly to a substance to be irradiated extending for a wide sphere inside the face.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62174341A JPS6419660A (en) | 1987-07-13 | 1987-07-13 | Ion beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62174341A JPS6419660A (en) | 1987-07-13 | 1987-07-13 | Ion beam irradiation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6419660A true JPS6419660A (en) | 1989-01-23 |
Family
ID=15976945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62174341A Pending JPS6419660A (en) | 1987-07-13 | 1987-07-13 | Ion beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6419660A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03291375A (en) * | 1990-04-05 | 1991-12-20 | Matsushita Electric Ind Co Ltd | Ion source apparatus and production of continuous vapor deposition medium |
| JP2002518809A (en) * | 1998-06-19 | 2002-06-25 | スプリオン リミテッド | Apparatus and method for charged particles |
-
1987
- 1987-07-13 JP JP62174341A patent/JPS6419660A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03291375A (en) * | 1990-04-05 | 1991-12-20 | Matsushita Electric Ind Co Ltd | Ion source apparatus and production of continuous vapor deposition medium |
| JP2002518809A (en) * | 1998-06-19 | 2002-06-25 | スプリオン リミテッド | Apparatus and method for charged particles |
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