JPS6420726U - - Google Patents
Info
- Publication number
- JPS6420726U JPS6420726U JP11470387U JP11470387U JPS6420726U JP S6420726 U JPS6420726 U JP S6420726U JP 11470387 U JP11470387 U JP 11470387U JP 11470387 U JP11470387 U JP 11470387U JP S6420726 U JPS6420726 U JP S6420726U
- Authority
- JP
- Japan
- Prior art keywords
- brush
- rotating brush
- semiconductor wafer
- scrubber device
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Cleaning In General (AREA)
Description
第１図は本考案の第１の実施例を示す平面図、
第２図は同縦断面図、第３図は本考案の第２の実
施例を示す縦断面図、第４図は従来のスクラバー
装置におけるブラシ洗浄機構の平面図、第５図は
同縦断面図である。
１…ブラシ、２…スプレーノズル、３…エアー
シリンダー、４…水洗槽、５…ブラシ回転モータ
ー、６…ブラシカバー、７…洗浄ノズル、８…排
出口。
FIG. 1 is a plan view showing a first embodiment of the present invention;
Fig. 2 is a longitudinal sectional view of the same, Fig. 3 is a longitudinal sectional view showing a second embodiment of the present invention, Fig. 4 is a plan view of a brush cleaning mechanism in a conventional scrubber device, and Fig. 5 is a longitudinal sectional view of the same. It is a diagram. 1... Brush, 2... Spray nozzle, 3... Air cylinder, 4... Washing tank, 5... Brush rotation motor, 6... Brush cover, 7... Washing nozzle, 8... Discharge port.
Claims (1)
しつつ該半導体ウエーハを回転ブラシにてスクラ
ブ洗浄を行なうスクラバー装置において、ウエー
ハのスクラブ洗浄後の前記回転ブラシに付着した
汚物を除去するブラシ洗浄部に、回転ブラシの長
手方向又は回転方向に往復動可能なスプレーノズ
ルを装備したことを特徴とするスクラバー装置。 In a scrubber device that scrubs a semiconductor wafer with a rotating brush while supplying a cleaning liquid to the semiconductor wafer rotated at high speed, a rotating brush is installed in a brush cleaning section that removes dirt attached to the rotating brush after scrubbing the wafer. A scrubber device characterized by being equipped with a spray nozzle that can reciprocate in the longitudinal direction or rotational direction of the brush.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11470387U JPS6420726U (en) | 1987-07-27 | 1987-07-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11470387U JPS6420726U (en) | 1987-07-27 | 1987-07-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6420726U true JPS6420726U (en) | 1989-02-01 |
Family
ID=31355693
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11470387U Pending JPS6420726U (en) | 1987-07-27 | 1987-07-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6420726U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5544780A (en) * | 1978-09-27 | 1980-03-29 | Toshiba Corp | Cleaning device for semiconductor wafer |
-
1987
- 1987-07-27 JP JP11470387U patent/JPS6420726U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5544780A (en) * | 1978-09-27 | 1980-03-29 | Toshiba Corp | Cleaning device for semiconductor wafer |
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