JPS6421883U - - Google Patents

Info

Publication number
JPS6421883U
JPS6421883U JP11751787U JP11751787U JPS6421883U JP S6421883 U JPS6421883 U JP S6421883U JP 11751787 U JP11751787 U JP 11751787U JP 11751787 U JP11751787 U JP 11751787U JP S6421883 U JPS6421883 U JP S6421883U
Authority
JP
Japan
Prior art keywords
flow path
gas flow
carrier gas
valve
gas introduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11751787U
Other languages
English (en)
Other versions
JPH0538307Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987117517U priority Critical patent/JPH0538307Y2/ja
Publication of JPS6421883U publication Critical patent/JPS6421883U/ja
Application granted granted Critical
Publication of JPH0538307Y2 publication Critical patent/JPH0538307Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

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  • Details Of Valves (AREA)

Description

【図面の簡単な説明】
第１図は本考案の多重弁の一実施例を示す断面
図、第２図は従来の多重弁の一例を示す斜視図で
ある。 １……キヤリアガス流路、２……弁箱、３１，
３２……ガス導入弁、１０……シーズヒータ。

Claims (1)

    【実用新案登録請求の範囲】
  1. 多角柱体の内部に中心軸に沿つてキヤリアガス
    流路を形成してなる弁箱の外面に、複数のガス導
    入弁を設けて各ガス導入弁の吐出部を前記キヤリ
    アガス流路に連通すると共に、該弁箱の内部に前
    記キヤリアガス流路と平行に加熱棒を近接配置し
    たことを特徴とする多重弁。
JP1987117517U 1987-07-31 1987-07-31 Expired - Lifetime JPH0538307Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987117517U JPH0538307Y2 (ja) 1987-07-31 1987-07-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987117517U JPH0538307Y2 (ja) 1987-07-31 1987-07-31

Publications (2)

Publication Number Publication Date
JPS6421883U true JPS6421883U (ja) 1989-02-03
JPH0538307Y2 JPH0538307Y2 (ja) 1993-09-28

Family

ID=31361042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987117517U Expired - Lifetime JPH0538307Y2 (ja) 1987-07-31 1987-07-31

Country Status (1)

Country Link
JP (1) JPH0538307Y2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010116627A (ja) * 2009-12-25 2010-05-27 Hitachi Kokusai Electric Inc 半導体製造装置及び弁装置並びに半導体製造装置を用いたｃｖｄ処理方法及び半導体の製造方法
JP2010159492A (ja) * 2009-12-25 2010-07-22 Hitachi Kokusai Electric Inc 半導体製造装置及び弁装置並びに半導体製造装置を用いたｃｖｄ処理方法及び半導体の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5022344U (ja) * 1973-06-19 1975-03-13

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5022344U (ja) * 1973-06-19 1975-03-13

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010116627A (ja) * 2009-12-25 2010-05-27 Hitachi Kokusai Electric Inc 半導体製造装置及び弁装置並びに半導体製造装置を用いたｃｖｄ処理方法及び半導体の製造方法
JP2010159492A (ja) * 2009-12-25 2010-07-22 Hitachi Kokusai Electric Inc 半導体製造装置及び弁装置並びに半導体製造装置を用いたｃｖｄ処理方法及び半導体の製造方法

Also Published As

Publication number Publication date
JPH0538307Y2 (ja) 1993-09-28

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