JPS64258U - - Google Patents
Info
- Publication number
- JPS64258U JPS64258U JP9459987U JP9459987U JPS64258U JP S64258 U JPS64258 U JP S64258U JP 9459987 U JP9459987 U JP 9459987U JP 9459987 U JP9459987 U JP 9459987U JP S64258 U JPS64258 U JP S64258U
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- electron
- electron microscope
- optimum exposure
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は本考案の一実施例で、透過型電子顕微
鏡の試料および結像系のレンズ群と電子線パスに
対する露出計の位置関係を示す図、第２図は本考
案の効果を試料および視野制限絞りを用いて示し
た略図である。
３……試料、４……試料からの透過電子線、５
……視野制限可動絞り、８……電子線検出器（測
光用）、９……露出計、１０……シヤツター、１
１……感光材料、１２……視野制限絞り駆動部。
Figure 1 shows an example of the present invention, and shows the positional relationship of a transmission electron microscope sample, the lens group of the imaging system, and the exposure meter with respect to the electron beam path. Figure 2 shows the effect of the present invention on the sample and 1 is a schematic diagram using a field-limiting diaphragm; 3...Sample, 4...Transmitted electron beam from the sample, 5
...Visual field limiting movable aperture, 8...Electron beam detector (for photometry), 9...Exposure meter, 10...Shutter, 1
1...Photosensitive material, 12...Field-limiting diaphragm drive unit.
Claims (1)
によつて拡大し、その像を直接感光材料に露出す
ることができるカメラ室を持つた透過型電子顕微
鏡において、任意に開口部の面積を変えられる可
動型の絞りと、その絞りによつて制限された領域
からの電子線を受ける検出器の出力から最適露出
量を計算し、それに従つて自動的に最適露出が行
なえることを特徴とする透過型電子顕微鏡用自動
露出計。 A transmission electron microscope has a camera chamber that magnifies the electron beam that passes through a thin sample using an electron lens and exposes the image directly onto a photosensitive material, and the area of the aperture can be changed at will. A transmission device that is characterized by a movable aperture and the output of a detector that receives electron beams from an area limited by the aperture to calculate the optimum exposure amount, and automatically perform the optimum exposure accordingly. Automatic exposure meter for type electron microscope.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9459987U JPS64258U (en) | 1987-06-22 | 1987-06-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9459987U JPS64258U (en) | 1987-06-22 | 1987-06-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS64258U true JPS64258U (en) | 1989-01-05 |
Family
ID=30958222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9459987U Pending JPS64258U (en) | 1987-06-22 | 1987-06-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64258U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH063531U (en) * | 1992-06-15 | 1994-01-18 | 松本機械工業株式会社 | Rotary table |
-
1987
- 1987-06-22 JP JP9459987U patent/JPS64258U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH063531U (en) * | 1992-06-15 | 1994-01-18 | 松本機械工業株式会社 | Rotary table |
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