JPS6431989A - Electrocasting method for producing porous film - Google Patents

Electrocasting method for producing porous film

Info

Publication number
JPS6431989A
JPS6431989A JP18842587A JP18842587A JPS6431989A JP S6431989 A JPS6431989 A JP S6431989A JP 18842587 A JP18842587 A JP 18842587A JP 18842587 A JP18842587 A JP 18842587A JP S6431989 A JPS6431989 A JP S6431989A
Authority
JP
Japan
Prior art keywords
electrocast
porous film
sheet
metallic
thin sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18842587A
Other languages
Japanese (ja)
Inventor
Toshihiro Aoki
Kenjiro Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP18842587A priority Critical patent/JPS6431989A/en
Publication of JPS6431989A publication Critical patent/JPS6431989A/en
Pending legal-status Critical Current

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  • Printing Plates And Materials Therefor (AREA)

Abstract

PURPOSE:To produce a porous film having an excellent dimensional characteristic by utilizing improved photomechanical technique and electrocasting method at the time of producing the porous film to be used for the printing part of a printing machine, etc. CONSTITUTION:The thin sheet material of a Be-Cu alloy is oxidized in the air, for example, at 200 deg.C for 30min to form a releasing layer, and a solvent-type dry film is adhered to the back to protect the back. A resist film 2 is then formed on a Be-Cu metallic thin sheet 1, a plating 4 is formed in 6mum thickness on one side with respect to the specified diameter 3 of 15mum of the electrocast thin sheet metal 10, pores having an outer diameter S of 27mum are photographically produced with a pitch 6 of 50mum and a gap 7 of 23mum, and a glass original plate for exposure is obtained. The plate is brought into contact with the metallic sheet 1, vacuumexposed, developed, and fixed. The sheet is then electrocast in an electrocasting bath consisting of an Ni anode 8, a cathode of the metallic sheet 1, and a plating bath 9, the electrocast layer is locally released, the electrocast layer can be released to the opposite side while bending the metallic sheet, and a porous film having excellent dimensional characteristics such as thickness, pitch, and pore diameter is produced.
JP18842587A 1987-07-28 1987-07-28 Electrocasting method for producing porous film Pending JPS6431989A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18842587A JPS6431989A (en) 1987-07-28 1987-07-28 Electrocasting method for producing porous film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18842587A JPS6431989A (en) 1987-07-28 1987-07-28 Electrocasting method for producing porous film

Publications (1)

Publication Number Publication Date
JPS6431989A true JPS6431989A (en) 1989-02-02

Family

ID=16223445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18842587A Pending JPS6431989A (en) 1987-07-28 1987-07-28 Electrocasting method for producing porous film

Country Status (1)

Country Link
JP (1) JPS6431989A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019094520A (en) * 2017-11-20 2019-06-20 株式会社プロセス・ラボ・ミクロン Fine pattern nickel film and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019094520A (en) * 2017-11-20 2019-06-20 株式会社プロセス・ラボ・ミクロン Fine pattern nickel film and method for manufacturing the same

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