JPS6431998U - - Google Patents

Info

Publication number
JPS6431998U
JPS6431998U JP461688U JP461688U JPS6431998U JP S6431998 U JPS6431998 U JP S6431998U JP 461688 U JP461688 U JP 461688U JP 461688 U JP461688 U JP 461688U JP S6431998 U JPS6431998 U JP S6431998U
Authority
JP
Japan
Prior art keywords
mirror
elliptical
elliptical mirror
receiving
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP461688U
Other languages
Japanese (ja)
Other versions
JPH0211754Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP461688U priority Critical patent/JPH0211754Y2/ja
Publication of JPS6431998U publication Critical patent/JPS6431998U/ja
Application granted granted Critical
Publication of JPH0211754Y2 publication Critical patent/JPH0211754Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Furnace Details (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
  • Control Of Resistance Heating (AREA)
  • Discharge Heating (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案一実施例の原理図、第2図は実
施例(実線)と従来技術(点線)のアークイメー
ジの形状の比較図、第3図は実施例(実線)と従
来技術(点線)のアークイメージの放射強度曲線
の比較図、第4図は従来のクロスオーバー複合楕
円鏡型のアークイメージ炉の原理図、第5図は公
報に記載されたフイラメントランプの反射鏡集光
加熱装置の従来技術の原理図、第6図は公報に記
載されたアークイメージ炉の従来技術の原理図で
ある。 1……受光楕円鏡、1′……放射楕円鏡、2…
…受光楕円鏡の第1焦点、2′……放射楕円鏡の
第1焦点、3……希ガス放電ランプ(アークラン
プ)、4……受光楕円鏡の第2焦点、4′……放
射楕円鏡の第2焦点、5……加熱溶融目的物、6
……反射鏡、11……回転楕円面鏡、12……タ
ングステンフイラメントランプ、13……被加熱
物、14……凹面鏡、15,16……アーク光源
、17,18……第1楕円鏡、19……第2楕円
鏡、20,21……平面鏡、22……試料棒。
Fig. 1 is a principle diagram of an embodiment of the present invention, Fig. 2 is a comparison diagram of the shape of the arc image of the embodiment (solid line) and the prior art (dotted line), and Fig. 3 is a diagram of the embodiment (solid line) and the conventional art (dotted line). A comparison diagram of the radiation intensity curve of the arc image (dotted line), Figure 4 is a principle diagram of a conventional crossover composite elliptical mirror type arc image furnace, and Figure 5 is the condensing heating of the filament lamp reflector described in the publication. FIG. 6 is a diagram showing the principle of the prior art of the arc image furnace described in the publication. 1... Receiving elliptical mirror, 1'... Emitting elliptical mirror, 2...
...First focus of the receiving elliptical mirror, 2'...First focal point of the emitting elliptical mirror, 3...Rare gas discharge lamp (arc lamp), 4...Second focus of the receiving elliptical mirror, 4'...Emitting ellipse Second focal point of mirror, 5... Heating melting object, 6
...Reflecting mirror, 11... Spheroidal mirror, 12... Tungsten filament lamp, 13... Heated object, 14... Concave mirror, 15, 16... Arc light source, 17, 18... First elliptical mirror, 19...Second elliptical mirror, 20, 21...Plane mirror, 22...Sample rod.

Claims (1)

【実用新案登録請求の範囲】 二枚の楕円鏡と一枚の平面反射鏡とより成るク
ロスオーバー双楕円鏡型のアークイメージ炉にお
いて、 一方の楕円鏡に放電ランプを配置して該楕円鏡
の光軸方向へ反射光を出す受光楕円鏡となし、 他方の楕円鏡は、前記受光楕円鏡からの反射光
を、前記平面反射鏡によつて前記受光楕円鏡の光
軸と交わる方向へ再反射された該反射光を集光す
る放射楕円鏡となし、 該受光楕円鏡の倍率と該放射楕円鏡の倍率の比
を、0.25乃至0.8と規定したことを特徴と
するアークイメージ炉。
[Claims for Utility Model Registration] In a cross-over bielliptical mirror type arc image furnace consisting of two elliptical mirrors and one flat reflecting mirror, a discharge lamp is placed on one of the elliptical mirrors, A light-receiving elliptical mirror that emits reflected light in the optical axis direction, and the other elliptical mirror re-reflects the reflected light from the light-receiving elliptical mirror in a direction intersecting the optical axis of the light-receiving elliptical mirror by the flat reflecting mirror. an emitting elliptical mirror that condenses the reflected light, and a ratio of the magnification of the receiving elliptical mirror to the magnification of the emitting elliptical mirror is defined as 0.25 to 0.8. .
JP461688U 1988-01-20 1988-01-20 Expired JPH0211754Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP461688U JPH0211754Y2 (en) 1988-01-20 1988-01-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP461688U JPH0211754Y2 (en) 1988-01-20 1988-01-20

Publications (2)

Publication Number Publication Date
JPS6431998U true JPS6431998U (en) 1989-02-28
JPH0211754Y2 JPH0211754Y2 (en) 1990-03-28

Family

ID=31207283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP461688U Expired JPH0211754Y2 (en) 1988-01-20 1988-01-20

Country Status (1)

Country Link
JP (1) JPH0211754Y2 (en)

Also Published As

Publication number Publication date
JPH0211754Y2 (en) 1990-03-28

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