JPS6434657A - Gaseous pressure type polishing device - Google Patents

Gaseous pressure type polishing device

Info

Publication number
JPS6434657A
JPS6434657A JP19112087A JP19112087A JPS6434657A JP S6434657 A JPS6434657 A JP S6434657A JP 19112087 A JP19112087 A JP 19112087A JP 19112087 A JP19112087 A JP 19112087A JP S6434657 A JPS6434657 A JP S6434657A
Authority
JP
Japan
Prior art keywords
flexible membrane
polishing material
workpiece
material surface
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19112087A
Other languages
Japanese (ja)
Inventor
Shigeru Tani
Motoyuki Kuroiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP19112087A priority Critical patent/JPS6434657A/en
Publication of JPS6434657A publication Critical patent/JPS6434657A/en
Pending legal-status Critical Current

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To carry out working under a uniform condition over the entire surface of a workpiece in the manufacture of a magnetic disk medium by transmitting the pressure in a pressure gas chamber on the polishing material surface via a flexible membrane so as to press the polishing material surface to the surface of the workpiece. CONSTITUTION:The flexible membrane 38 fitted on an arm 40 being a supporting member is abutted on the surface of a magnetic disk medium 1 via a polish tape 30, and pressurized gas is introduced into the pressure gas chamber 37 inside the flexible membrane 38. By the pressure inside the flexible membrane 38, the polishing material surface 39 of the polish tape 30 is uniformly pressed on over all the surface of the medium 1. While the medium 1 is rotated and the polish tape 30 is moved, polishing work is carried out by the polishing material surface 39. Thus, working can be carried out under a uniform condition over the entire surface of the workpiece.
JP19112087A 1987-07-29 1987-07-29 Gaseous pressure type polishing device Pending JPS6434657A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19112087A JPS6434657A (en) 1987-07-29 1987-07-29 Gaseous pressure type polishing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19112087A JPS6434657A (en) 1987-07-29 1987-07-29 Gaseous pressure type polishing device

Publications (1)

Publication Number Publication Date
JPS6434657A true JPS6434657A (en) 1989-02-06

Family

ID=16269199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19112087A Pending JPS6434657A (en) 1987-07-29 1987-07-29 Gaseous pressure type polishing device

Country Status (1)

Country Link
JP (1) JPS6434657A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6470923A (en) * 1987-09-10 1989-03-16 Hitachi Electr Eng Surface treating device for disk substrate
JPH11232644A (en) * 1998-02-12 1999-08-27 Yac Co Ltd Working apparatus for magnetic disk
WO2000021715A3 (en) * 1998-10-09 2000-07-06 Speedfam Ipec Corp Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head
USRE41344E1 (en) * 2002-09-27 2010-05-25 Kubota Corporation Swirl chamber used in association with a combustion chamber for diesel engines
WO2022080013A1 (en) * 2020-10-12 2022-04-21 株式会社荏原製作所 Substrate cleaning device and substrate cleaning method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6470923A (en) * 1987-09-10 1989-03-16 Hitachi Electr Eng Surface treating device for disk substrate
JPH11232644A (en) * 1998-02-12 1999-08-27 Yac Co Ltd Working apparatus for magnetic disk
WO2000021715A3 (en) * 1998-10-09 2000-07-06 Speedfam Ipec Corp Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head
USRE41344E1 (en) * 2002-09-27 2010-05-25 Kubota Corporation Swirl chamber used in association with a combustion chamber for diesel engines
WO2022080013A1 (en) * 2020-10-12 2022-04-21 株式会社荏原製作所 Substrate cleaning device and substrate cleaning method
JP2022063417A (en) * 2020-10-12 2022-04-22 株式会社荏原製作所 Substrate cleaning device and substrate cleaning method

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