JPS6436017A - Aligner for semiconductor wafer - Google Patents

Aligner for semiconductor wafer

Info

Publication number
JPS6436017A
JPS6436017A JP19167687A JP19167687A JPS6436017A JP S6436017 A JPS6436017 A JP S6436017A JP 19167687 A JP19167687 A JP 19167687A JP 19167687 A JP19167687 A JP 19167687A JP S6436017 A JPS6436017 A JP S6436017A
Authority
JP
Japan
Prior art keywords
mask
wafer
vacuum
stage
executed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19167687A
Other languages
Japanese (ja)
Inventor
Shinji Akaike
Masami Mizukami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP19167687A priority Critical patent/JPS6436017A/en
Publication of JPS6436017A publication Critical patent/JPS6436017A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To obtain the satisfactory alignment accuracy between a mask and a wafer by a method wherein a vacuum chuck is controlled in accordance with measured signals from a first vacuum sensor and a second vacuum sensor and the mask is transferred between a mask holder and a wafer-mask stage. CONSTITUTION:When a mask 8 is transferred between a mask holder 10 and a mask stage 4, a position of the mask 8 is detected by a change in a degree of vacuum which is measured by using vacuum sensors M1, M2; opening and closing valves 5, 11 are operated by a control device 13; a vacuum chuck is controlled. A wafer 2 and the mask 8 fixed on a wafer-mask stage 1 are trans ferred collectively to an exposure position; an exposure operation is executed. Accordingly, a relative positional relationship between the mask 8 and the wafer 2 is definite; a satisfactory alignment operation can be executed.
JP19167687A 1987-07-31 1987-07-31 Aligner for semiconductor wafer Pending JPS6436017A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19167687A JPS6436017A (en) 1987-07-31 1987-07-31 Aligner for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19167687A JPS6436017A (en) 1987-07-31 1987-07-31 Aligner for semiconductor wafer

Publications (1)

Publication Number Publication Date
JPS6436017A true JPS6436017A (en) 1989-02-07

Family

ID=16278601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19167687A Pending JPS6436017A (en) 1987-07-31 1987-07-31 Aligner for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS6436017A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03130727U (en) * 1990-04-13 1991-12-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03130727U (en) * 1990-04-13 1991-12-27

Similar Documents

Publication Publication Date Title
EP0106511A3 (en) Gap control system for localized vacuum processing
JPS6465848A (en) Alignment
JPS6442128A (en) Semiconductor substrate with alignment mark formed thereon
EP0288233A3 (en) System and method for detecting the center of an integrated circuit wafer
TW373231B (en) Method of sensing access positions of arm
EP0345097A3 (en) Exposure method and apparatus
EP0144183A3 (en) Workpiece holding and positioning mechanism and system
JPS51147179A (en) Method of munufacturing of semiconductor device
JPS6436017A (en) Aligner for semiconductor wafer
EP0358425A3 (en) Position detecting method and apparatus
TW344107B (en) Semiconductor wafer-polishing device
WO2024129160A3 (en) Feed-forward device fabrication
JPS5732629A (en) Mask aligner
JPS5730330A (en) Mask aligner
JPS5672309A (en) Measuring method of three-dimension measuring device and reference point block for its measurement
JPS6446808A (en) Correcting system for position shift of commodity transfer device
JPS5318969A (en) Wafer fixing method
JPS6430242A (en) Pre-alignment of semiconductor wafer
JPS6453545A (en) Semiconductor substrate having alignment mark and alignment using said mark
JPS6456284A (en) Transposing device for vehicle body
JPS56107555A (en) Detection of position of electron beam
JPS57153434A (en) Manufacturing device for semiconductor
JPS56153740A (en) Calibrating method for mask
JPS62299029A (en) Aligner
JPS6468928A (en) Reduction aligner for manufacturing semiconductor device