JPS6436018A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS6436018A
JPS6436018A JP19200887A JP19200887A JPS6436018A JP S6436018 A JPS6436018 A JP S6436018A JP 19200887 A JP19200887 A JP 19200887A JP 19200887 A JP19200887 A JP 19200887A JP S6436018 A JPS6436018 A JP S6436018A
Authority
JP
Japan
Prior art keywords
ray
carbon
ray absorber
taxcyoz
tantalum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19200887A
Other languages
Japanese (ja)
Inventor
Shigehisa Oki
Akira Yoshikawa
Toshiyuki Horiuchi
Kimikichi Deguchi
Kazuhiko Komatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP19200887A priority Critical patent/JPS6436018A/en
Publication of JPS6436018A publication Critical patent/JPS6436018A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To improve the reproducibility and to keep a low stress value by a method wherein a metal material mainly composed of tantalum and carbon is used as an X-ray absorber. CONSTITUTION:A target composed of tantalum is sputtered in a mixed gas of argon, carbon dioxide and oxygen by a high-frequency reactive sputtering method; a TaxCyOz thin film is deposited. Here, x, y and z satisfy a relationship of x+y+z=7, and they indicate a composition ratio of the respective elements. In this case, a ratio of numbers of atoms of carbon to oxygen is to be between 1/2 and 2. If the TaxCyOz is used as an X-ray absorber in this manner, an X-ray mask whose film stress of the X-ray absorber is low can be manufactured with good reproducibility without spoiling the X-ray absorptive power.
JP19200887A 1987-07-31 1987-07-31 Mask for x-ray exposure Pending JPS6436018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19200887A JPS6436018A (en) 1987-07-31 1987-07-31 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19200887A JPS6436018A (en) 1987-07-31 1987-07-31 Mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS6436018A true JPS6436018A (en) 1989-02-07

Family

ID=16284070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19200887A Pending JPS6436018A (en) 1987-07-31 1987-07-31 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS6436018A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007008400A (en) * 2005-07-04 2007-01-18 Valeo Thermal Systems Japan Corp Vehicular air-conditioner

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63155618A (en) * 1986-12-19 1988-06-28 Hitachi Ltd Mask for x-ray exposure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63155618A (en) * 1986-12-19 1988-06-28 Hitachi Ltd Mask for x-ray exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007008400A (en) * 2005-07-04 2007-01-18 Valeo Thermal Systems Japan Corp Vehicular air-conditioner

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