JPS6436764A - Manufacture of thin multicomponent system film by sputtering - Google Patents

Manufacture of thin multicomponent system film by sputtering

Info

Publication number
JPS6436764A
JPS6436764A JP19013787A JP19013787A JPS6436764A JP S6436764 A JPS6436764 A JP S6436764A JP 19013787 A JP19013787 A JP 19013787A JP 19013787 A JP19013787 A JP 19013787A JP S6436764 A JPS6436764 A JP S6436764A
Authority
JP
Japan
Prior art keywords
thin
multicomponent system
sputtering
manufacture
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19013787A
Other languages
Japanese (ja)
Inventor
Misao Hashimoto
Shigeto Takebayashi
Wataru Ito
Shunpei Miyajima
Yasuo Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP19013787A priority Critical patent/JPS6436764A/en
Publication of JPS6436764A publication Critical patent/JPS6436764A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To manufacture a thin multicomponent system film free from dislocation of composition ratio, by using a composite target in which thin film-forming materials are vapor-deposited on a plate in an area ratio so that the required composition ratio is reached. CONSTITUTION:Cu, etc., are used for a plate to be a target. Y1, Ba2, Cu3 etc., as thin film-forming elements, are vapor-deposited onto this Cu substrate 10 by a PVD method into sectorial or other patterns, by which a composite target is prepared. At this time, vapor deposition is carried out in an area ratio in which respective metals as component materials are formed into a composition ratio capable of showing the desired superconducting phenomenon when formed into a thin film. By using this composite target, the thin multicomponent system superconducting film of Y-Ba-Cu-O or other types can be manufactured by means of sputtering.
JP19013787A 1987-07-31 1987-07-31 Manufacture of thin multicomponent system film by sputtering Pending JPS6436764A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19013787A JPS6436764A (en) 1987-07-31 1987-07-31 Manufacture of thin multicomponent system film by sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19013787A JPS6436764A (en) 1987-07-31 1987-07-31 Manufacture of thin multicomponent system film by sputtering

Publications (1)

Publication Number Publication Date
JPS6436764A true JPS6436764A (en) 1989-02-07

Family

ID=16253012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19013787A Pending JPS6436764A (en) 1987-07-31 1987-07-31 Manufacture of thin multicomponent system film by sputtering

Country Status (1)

Country Link
JP (1) JPS6436764A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0561289A1 (en) * 1992-03-19 1993-09-22 MERCK PATENT GmbH Material for vapour deposition for the production of high refractive optical layers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0561289A1 (en) * 1992-03-19 1993-09-22 MERCK PATENT GmbH Material for vapour deposition for the production of high refractive optical layers

Similar Documents

Publication Publication Date Title
DE3764908D1 (en) COMPOSITE WITH AT LEAST ONE SPUTTERING APPLIED BY CATHODE SPRAYING, METHOD FOR THEIR PRODUCTION AND USE THEREOF.
EP0198459A3 (en) Thin film forming method through sputtering and sputtering device
EP0285132A3 (en) Method for producing thin film of oxide superconductor
KR950703799A (en) PROCESS FOR MAKING THIN FILMS BY PULSED EXCIMER LASER EVAPORATION
EP0309294A3 (en) Method and apparatus for the manufacture of superconducting oxide materials
CA2202430A1 (en) Oxide film, laminate and methods for their production
GB1419054A (en) Selectively transparent plate and a method of manufacturing it
EP0302684A3 (en) Thin film deposition process
EP0531236A3 (en) Improved superconductive layer on monocrystalline substrate and process for its preparation
EP0269112A3 (en) Method of forming a thin crystalline metal film
CA2037432A1 (en) Method of and apparatus for preparing oxide superconducting film
WO2003032368A3 (en) Fabrication of high temperature superconductors
JPS57118022A (en) Formation of zinc oxide film
CA2000171A1 (en) Preparation method of amorphous superlattice alloys
CA2003850A1 (en) Process for preparing a perovskite type superconductor film
JPS643917A (en) Manufacture of ceramic superconductive formed body
AU2826089A (en) Method of sputtering
Hieber Radio-Frequency Sputter Deposition of Alloy Films
JPS5435484A (en) High spped cutting tool coated with hard layer
CA2043541A1 (en) Process for preparing high-temperature superconducting thin films
CA2016028A1 (en) Method of fabricating oxide superconducting film
JPS6442576A (en) Composite sputtering target
JPS6468463A (en) Method for vapor deposition by sputtering
JPS5435176A (en) Depositing method by vacuum evaporation
JPS6445180A (en) Manufacture of superconductive thin film using composite target