JPS6436765A - In-line type sputtering device - Google Patents

In-line type sputtering device

Info

Publication number
JPS6436765A
JPS6436765A JP62192908A JP19290887A JPS6436765A JP S6436765 A JPS6436765 A JP S6436765A JP 62192908 A JP62192908 A JP 62192908A JP 19290887 A JP19290887 A JP 19290887A JP S6436765 A JPS6436765 A JP S6436765A
Authority
JP
Japan
Prior art keywords
materials
cathode
providing
formation region
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62192908A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Tsuda
Hidenobu Shintaku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62192908A priority Critical patent/JPS6436765A/en
Publication of JPS6436765A publication Critical patent/JPS6436765A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To continuously form films on coating materials which have various size by providing a film formation region limiting plate between a cathode and the material being carried and providing a means for controlling the opening and closing rate of the limiting plate according to magnitude of the materials. CONSTITUTION:Film formation region limiting plates 10 are provided together with actuators 11 for actuating them between a cathode 7 in a vacuum chamber 1 and coating materials 3. Magnitude of the materials 3 being carried is detected by providing a sensor 12 to a load lock chamber 2 in a conveyance side. This signal is converted into both actuation signals of the actuators 11 and a signal for changing electric power fed to the cathode 7 from a power source 8 in a control part 13. The opening and closing rate of the limiting plates 10 is controlled with this signal and the materials 3 are adjusted to the optimum film formation region. Thereby thin films having a same film thickness distribution profile can be formed on the materials 3 having different magnitude.
JP62192908A 1987-07-31 1987-07-31 In-line type sputtering device Pending JPS6436765A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62192908A JPS6436765A (en) 1987-07-31 1987-07-31 In-line type sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62192908A JPS6436765A (en) 1987-07-31 1987-07-31 In-line type sputtering device

Publications (1)

Publication Number Publication Date
JPS6436765A true JPS6436765A (en) 1989-02-07

Family

ID=16298980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62192908A Pending JPS6436765A (en) 1987-07-31 1987-07-31 In-line type sputtering device

Country Status (1)

Country Link
JP (1) JPS6436765A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4995485A (en) * 1988-08-05 1991-02-26 Nhk Spring Co., Ltd. Sealing structure of an accumulator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4995485A (en) * 1988-08-05 1991-02-26 Nhk Spring Co., Ltd. Sealing structure of an accumulator

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