JPS6436766A - Formation of rigid carbon film - Google Patents
Formation of rigid carbon filmInfo
- Publication number
- JPS6436766A JPS6436766A JP62156090A JP15609087A JPS6436766A JP S6436766 A JPS6436766 A JP S6436766A JP 62156090 A JP62156090 A JP 62156090A JP 15609087 A JP15609087 A JP 15609087A JP S6436766 A JPS6436766 A JP S6436766A
- Authority
- JP
- Japan
- Prior art keywords
- source component
- carbon film
- film
- carbon source
- base body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title abstract 11
- 229910052799 carbon Inorganic materials 0.000 title abstract 11
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 2
- 229910003460 diamond Inorganic materials 0.000 abstract 1
- 239000010432 diamond Substances 0.000 abstract 1
- 230000005281 excited state Effects 0.000 abstract 1
- 239000007792 gaseous phase Substances 0.000 abstract 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To improve adhesion of carbon film to a base body by decomposing carbon source component in a gaseous phase to form the rigid carbon film on the base body and heat-treating the formed film. CONSTITUTION:A base body 5 is placed on a placing stand 6 thereof in a plasma generation chamber 1. Carbon source component is introduced into the plasma generation chamber 1 from a reactive gas feeder 3 and the gas in the device is substituted with the carbon source component. Microwave is fed to the plasma generation chamber 1 through a waveguide 10 by actuating a microwave oscillator 2 and the carbon source component is made to an excited state and at least one part thereof is made to a plasma state. The carbon source component being a plasma state is deposited on the surface of the base body 5 and a rigid carbon film of a diamond film or a diamond-like carbon film is formed. This rigid carbon film is heat-treated at the temp. not higher than about 1,500 deg.C in the time out less than about 5min by utilizing a built-in heater 7 of the placing stand 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62156090A JPS6436766A (en) | 1987-06-23 | 1987-06-23 | Formation of rigid carbon film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62156090A JPS6436766A (en) | 1987-06-23 | 1987-06-23 | Formation of rigid carbon film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6436766A true JPS6436766A (en) | 1989-02-07 |
Family
ID=15620088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62156090A Pending JPS6436766A (en) | 1987-06-23 | 1987-06-23 | Formation of rigid carbon film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6436766A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03273611A (en) * | 1990-03-23 | 1991-12-04 | Nec Corp | Mask for x-ray lithography and manufacture thereof |
| JP2011252179A (en) * | 2010-05-31 | 2011-12-15 | Jtekt Corp | Method of producing coated member |
-
1987
- 1987-06-23 JP JP62156090A patent/JPS6436766A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03273611A (en) * | 1990-03-23 | 1991-12-04 | Nec Corp | Mask for x-ray lithography and manufacture thereof |
| JP2011252179A (en) * | 2010-05-31 | 2011-12-15 | Jtekt Corp | Method of producing coated member |
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