JPS6439726A - Contraction projecting aligner - Google Patents

Contraction projecting aligner

Info

Publication number
JPS6439726A
JPS6439726A JP62196819A JP19681987A JPS6439726A JP S6439726 A JPS6439726 A JP S6439726A JP 62196819 A JP62196819 A JP 62196819A JP 19681987 A JP19681987 A JP 19681987A JP S6439726 A JPS6439726 A JP S6439726A
Authority
JP
Japan
Prior art keywords
alignment mark
projecting
mark position
image
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62196819A
Other languages
Japanese (ja)
Inventor
Keiji Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62196819A priority Critical patent/JPS6439726A/en
Publication of JPS6439726A publication Critical patent/JPS6439726A/en
Pending legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide a contraction projecting aligner for automatically correcting the coordinates of a projecting image to those of a designed value on the basis of an alignment mark position and the distortion of a lens. CONSTITUTION:An error amount Q is measured from an alignment mark position A on an ideal lattice image 11 to form a map, and stored in memory means 2a of a computer 2. When detecting means 1 detects the alignment mark position A of a mask image 3a, position data P is fed from the means 1 to correcting amount calculating means 2b in the computer 2. The means 2b reads out the amount Q from the map stored in the means 2a in response to the data P. Then, the means 2b automatically corrects the coordinates of an alignment mark position A1 on a projecting image 12 to output a correction amount R to projecting means 3b.
JP62196819A 1987-08-05 1987-08-05 Contraction projecting aligner Pending JPS6439726A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62196819A JPS6439726A (en) 1987-08-05 1987-08-05 Contraction projecting aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62196819A JPS6439726A (en) 1987-08-05 1987-08-05 Contraction projecting aligner

Publications (1)

Publication Number Publication Date
JPS6439726A true JPS6439726A (en) 1989-02-10

Family

ID=16364190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62196819A Pending JPS6439726A (en) 1987-08-05 1987-08-05 Contraction projecting aligner

Country Status (1)

Country Link
JP (1) JPS6439726A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06245646A (en) * 1993-02-26 1994-09-06 Cosmo Plant Kk Method for culturing mushrooms and device used therefor
US6934004B2 (en) 2002-03-18 2005-08-23 Canon Kabushiki Kaisha Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory
JP2007165684A (en) * 2005-12-15 2007-06-28 Nikon Corp Alignment method, mask pattern design method, mask, device manufacturing method, alignment apparatus, exposure apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224624A (en) * 1985-07-24 1987-02-02 Nippon Kogaku Kk <Nikon> Exposure method and exposure system
JPS6235621A (en) * 1985-08-09 1987-02-16 Nec Kyushu Ltd Reduction projection type exposure
JPS6235619A (en) * 1985-08-09 1987-02-16 Canon Inc Projection exposure device
JPS62100725A (en) * 1985-10-28 1987-05-11 Canon Inc Projection exposing device
JPS62136821A (en) * 1985-12-11 1987-06-19 Nippon Kogaku Kk <Nikon> Projection exposure device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224624A (en) * 1985-07-24 1987-02-02 Nippon Kogaku Kk <Nikon> Exposure method and exposure system
JPS6235621A (en) * 1985-08-09 1987-02-16 Nec Kyushu Ltd Reduction projection type exposure
JPS6235619A (en) * 1985-08-09 1987-02-16 Canon Inc Projection exposure device
JPS62100725A (en) * 1985-10-28 1987-05-11 Canon Inc Projection exposing device
JPS62136821A (en) * 1985-12-11 1987-06-19 Nippon Kogaku Kk <Nikon> Projection exposure device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06245646A (en) * 1993-02-26 1994-09-06 Cosmo Plant Kk Method for culturing mushrooms and device used therefor
US6934004B2 (en) 2002-03-18 2005-08-23 Canon Kabushiki Kaisha Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory
JP2007165684A (en) * 2005-12-15 2007-06-28 Nikon Corp Alignment method, mask pattern design method, mask, device manufacturing method, alignment apparatus, exposure apparatus

Similar Documents

Publication Publication Date Title
DE69107586D1 (en) Device for correcting drift errors of a yaw rate sensor.
EP0146873A3 (en) Method for correcting image distortion due to gradient nonuniformity
MX9707494A (en) Calibration method and system for sheet registration and deskewing.
EP0478005A3 (en) Multiimage forming apparatus
JPH1012544A5 (en)
EP1359439A3 (en) Gamma camera with two sequential correction maps
JPS6439726A (en) Contraction projecting aligner
JPS5654038A (en) Checking device for shape of photomask
JPS64414A (en) Rotating angle detector
JPS5348422A (en) Correcting system of input data
JPS56120264A (en) Picture read-in device
JPS57152073A (en) Original profiling reader
DE69129833D1 (en) Semiconductor memory
JPS5740927A (en) Exposing method of electron beam
JPS57114342A (en) Machining error correcting device
JPH09275066A5 (en)
JPS5572813A (en) Indication system for mask pattern correction point
JPS6177184U (en)
JPS5452950A (en) Error detecting/correcting system
JPS5397348A (en) Correctable timing device
JPS5362936A (en) Memory control device
JPS57191785A (en) Picture input device
JPS535537A (en) Error correction system
JPS6490527A (en) Manufacture of semiconductor device
JPS535610A (en) Error correction method