JPS644219A - Treatment equipment of waste gas for dry etching device - Google Patents

Treatment equipment of waste gas for dry etching device

Info

Publication number
JPS644219A
JPS644219A JP62160616A JP16061687A JPS644219A JP S644219 A JPS644219 A JP S644219A JP 62160616 A JP62160616 A JP 62160616A JP 16061687 A JP16061687 A JP 16061687A JP S644219 A JPS644219 A JP S644219A
Authority
JP
Japan
Prior art keywords
waste gas
treatment cylinder
dry etching
etching device
adsorbent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62160616A
Other languages
Japanese (ja)
Inventor
Hideo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62160616A priority Critical patent/JPS644219A/en
Publication of JPS644219A publication Critical patent/JPS644219A/en
Pending legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To facilitate detection of reactive gas which is not adsorbed to an adsorbent of a waste gas treatment cylinder and is discharged by providing both a reaction tank in which the waste gas sent from the waste gas treatment cylinder is allowed to react with water and a smoke sensor for detecting white smoke. CONSTITUTION:A treatment equipment of waste gas which consists of a waste gas treatment cylinder 7, a reaction tank 9 and a smoke sensor 12 is connected with a rotary pump 6 of a dry etching device used for production of a semiconductor device. The waste gas sent from the dry etching device is introduced into the treatment cylinder 7 and reactive gas or the like is adsorbed and removed with an adsorbent 18 packed to the inside of the treatment cylinder 7 and thereafter discarded to an exhaust duct. The reactive gas is sucked with a suction pump 10 through a gas suction pipe 13 buried in the upper part of the treatment cylinder 7 and bubbled in reaction liquid 14 of the reaction tank 9. Since the reactive gas such as BCl3 is allowed to react with water and white smoke is generated, a smoke sensor 12 is actuated in case white smoke is generated and a patrol lamp 8 is turned on a light and the break-through of the adsorbent 18 is automatically detected.
JP62160616A 1987-06-26 1987-06-26 Treatment equipment of waste gas for dry etching device Pending JPS644219A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62160616A JPS644219A (en) 1987-06-26 1987-06-26 Treatment equipment of waste gas for dry etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62160616A JPS644219A (en) 1987-06-26 1987-06-26 Treatment equipment of waste gas for dry etching device

Publications (1)

Publication Number Publication Date
JPS644219A true JPS644219A (en) 1989-01-09

Family

ID=15718783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62160616A Pending JPS644219A (en) 1987-06-26 1987-06-26 Treatment equipment of waste gas for dry etching device

Country Status (1)

Country Link
JP (1) JPS644219A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106861360A (en) * 2017-03-02 2017-06-20 合肥杰通环境技术有限公司 A kind of cleaning treatment system of smoking room

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106861360A (en) * 2017-03-02 2017-06-20 合肥杰通环境技术有限公司 A kind of cleaning treatment system of smoking room

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