JPS6445045A - Process of ion implantation - Google Patents

Process of ion implantation

Info

Publication number: JPS6445045A
Authority: JP; Japan
Prior art keywords: ion implantation; emitter; arsenic; boron; element alloy
Prior art date: 1987-08-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP62200002A

Other languages

English (en)

Other versions

JPH0555969B2 (ja

Inventor

Hisashi Fukuda

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Oki Electric Industry Co Ltd

Original Assignee

Oki Electric Industry Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-08-12

Filing date

1987-08-12

Publication date

1989-02-17

1987-08-12 Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd

1987-08-12 Priority to JP62200002A priority Critical patent/JPS6445045A/ja

1988-08-02 Priority to US07/227,255 priority patent/US4892752A/en

1988-08-11 Priority to DE3855897T priority patent/DE3855897T2/de

1988-08-11 Priority to EP88307442A priority patent/EP0303486B1/en

1988-08-12 Priority to KR1019880010320A priority patent/KR920005348B1/ko

1989-02-17 Publication of JPS6445045A publication Critical patent/JPS6445045A/ja

1989-06-27 Priority to US07/371,976 priority patent/US4946706A/en

1993-08-18 Publication of JPH0555969B2 publication Critical patent/JPH0555969B2/ja

Status Granted legal-status Critical Current

Links

238000005468 ion implantation Methods 0.000 title abstract 4
238000000034 method Methods 0.000 title abstract 3
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 6
229910001325 element alloy Inorganic materials 0.000 abstract 4
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 3
229910052785 arsenic Inorganic materials 0.000 abstract 3
RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 3
229910052796 boron Inorganic materials 0.000 abstract 3
229910052759 nickel Inorganic materials 0.000 abstract 3
239000010949 copper Substances 0.000 abstract 2
230000005684 electric field Effects 0.000 abstract 2
239000000463 material Substances 0.000 abstract 2
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
229910045601 alloy Inorganic materials 0.000 abstract 1
239000000956 alloy Substances 0.000 abstract 1
238000000137 annealing Methods 0.000 abstract 1
229910052802 copper Inorganic materials 0.000 abstract 1
239000013078 crystal Substances 0.000 abstract 1
230000005496 eutectics Effects 0.000 abstract 1
150000002500 ions Chemical class 0.000 abstract 1
230000007774 longterm Effects 0.000 abstract 1
239000010453 quartz Substances 0.000 abstract 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1

Landscapes

Electron Sources, Ion Sources (AREA)

JP62200002A 1987-08-12 1987-08-12 Process of ion implantation Granted JPS6445045A (en)

Priority Applications (6)

Application Number	Priority Date	Filing Date	Title
JP62200002A JPS6445045A (en)	1987-08-12	1987-08-12	Process of ion implantation
US07/227,255 US4892752A (en)	1987-08-12	1988-08-02	Method of ion implantation
DE3855897T DE3855897T2 (de)	1987-08-12	1988-08-11	Verfahren zur Ionenimplantation
EP88307442A EP0303486B1 (en)	1987-08-12	1988-08-11	Method of ion implantation
KR1019880010320A KR920005348B1 (ko)	1987-08-12	1988-08-12	이온주입방법
US07/371,976 US4946706A (en)	1987-08-12	1989-06-27	Method of ion implantation

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP62200002A JPS6445045A (en)	1987-08-12	1987-08-12	Process of ion implantation

Publications (2)

Publication Number	Publication Date
JPS6445045A true JPS6445045A (en)	1989-02-17
JPH0555969B2 JPH0555969B2 (ja)	1993-08-18

Family

ID=16417162

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP62200002A Granted JPS6445045A (en)	1987-08-12	1987-08-12	Process of ion implantation

Country Status (1)

Country	Link
JP (1)	JPS6445045A (ja)

1987
- 1987-08-12 JP JP62200002A patent/JPS6445045A/ja active Granted

Also Published As

Publication number	Publication date
JPH0555969B2 (ja)	1993-08-18

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Legal Events

Date	Code	Title	Description
2007-08-12	EXPY	Cancellation because of completion of term