JPS6447845A - Film forming method for metallic film or metallic oxide film onto substrate - Google Patents

Film forming method for metallic film or metallic oxide film onto substrate

Info

Publication number
JPS6447845A
JPS6447845A JP62205535A JP20553587A JPS6447845A JP S6447845 A JPS6447845 A JP S6447845A JP 62205535 A JP62205535 A JP 62205535A JP 20553587 A JP20553587 A JP 20553587A JP S6447845 A JPS6447845 A JP S6447845A
Authority
JP
Japan
Prior art keywords
film
metallic
thin film
thin
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62205535A
Other languages
Japanese (ja)
Other versions
JP2552676B2 (en
Inventor
Shinji Tanigawara
Junji Manaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Seiki Co Ltd
Ricoh Co Ltd
Original Assignee
Ricoh Seiki Co Ltd
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Seiki Co Ltd, Ricoh Co Ltd filed Critical Ricoh Seiki Co Ltd
Priority to JP62205535A priority Critical patent/JP2552676B2/en
Publication of JPS6447845A publication Critical patent/JPS6447845A/en
Application granted granted Critical
Publication of JP2552676B2 publication Critical patent/JP2552676B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Formation Of Insulating Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To form a good thin film having relaxed surface tension by forming a metal into the specific thickness of film onto the surface of a substrate under the presence of a surface active agent thin layer and oxidizing the thin film layer at need. CONSTITUTION:The surface active agent thin layer of anion series, etc., is layed on the surface of the substrate. The metal such as Sn, etc., is formed into a film as the connected thin film layer having about 0.03-1.0mum thickness thereon by a vacuum evaporation method, sputtering method, ion plating method, etc. The thin film layer is oxidized, if required, by heating under the presence of an oxygen gas, etc. In this way, the thin metallic film or metallic oxide thin film having a good surface condition can be formed.
JP62205535A 1987-08-18 1987-08-18 Method for forming metal film or metal oxide film on substrate and half mirror Expired - Lifetime JP2552676B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62205535A JP2552676B2 (en) 1987-08-18 1987-08-18 Method for forming metal film or metal oxide film on substrate and half mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62205535A JP2552676B2 (en) 1987-08-18 1987-08-18 Method for forming metal film or metal oxide film on substrate and half mirror

Publications (2)

Publication Number Publication Date
JPS6447845A true JPS6447845A (en) 1989-02-22
JP2552676B2 JP2552676B2 (en) 1996-11-13

Family

ID=16508498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62205535A Expired - Lifetime JP2552676B2 (en) 1987-08-18 1987-08-18 Method for forming metal film or metal oxide film on substrate and half mirror

Country Status (1)

Country Link
JP (1) JP2552676B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110029310A (en) * 2018-01-12 2019-07-19 北京优美科巨玻薄膜产品有限公司 A kind of structural evaporation coating film material NbO2 and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110029310A (en) * 2018-01-12 2019-07-19 北京优美科巨玻薄膜产品有限公司 A kind of structural evaporation coating film material NbO2 and preparation method thereof

Also Published As

Publication number Publication date
JP2552676B2 (en) 1996-11-13

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