JPS64563A - Writing retouch solution - Google Patents
Writing retouch solutionInfo
- Publication number
- JPS64563A JPS64563A JP2891088A JP2891088A JPS64563A JP S64563 A JPS64563 A JP S64563A JP 2891088 A JP2891088 A JP 2891088A JP 2891088 A JP2891088 A JP 2891088A JP S64563 A JPS64563 A JP S64563A
- Authority
- JP
- Japan
- Prior art keywords
- resist pattern
- solution
- retouching
- titled solution
- titled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- 229920001577 copolymer Polymers 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To obtain the titled solution of a resist pattern having excellent acid resisting property by incorporating a specified copolymer in the titled solution.
CONSTITUTION: The titled solution contains the copolymer obtd. by copolymerizing a rosiny substance and at least one kind of the compd. selected from methacrylic acid and/or acrylic acid, a methacrylic acid derivative, an acrylic acid derivative, styrene and its derivative. Thus, as the titled solution has the high sticking property to the resist pattern, and is not affected with the resist pattern, even if an erroneous retouching is carried out, the repeatedly retouching enables. And, as the film of the titled solution can be peeled at the same condition to that of the resist pattern, the retouch working of the faulty portion of the resist pattern is remarkably simplified, thereby improving the workability of the retouching.
COPYRIGHT: (C)1989,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2891088A JP2554910B2 (en) | 1987-03-20 | 1988-02-12 | Correction fluid |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6627487 | 1987-03-20 | ||
| JP62-66274 | 1987-03-20 | ||
| JP2891088A JP2554910B2 (en) | 1987-03-20 | 1988-02-12 | Correction fluid |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH01563A JPH01563A (en) | 1989-01-05 |
| JPS64563A true JPS64563A (en) | 1989-01-05 |
| JP2554910B2 JP2554910B2 (en) | 1996-11-20 |
Family
ID=26367058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2891088A Expired - Lifetime JP2554910B2 (en) | 1987-03-20 | 1988-02-12 | Correction fluid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2554910B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4514321A (en) * | 1983-08-25 | 1985-04-30 | E. I. Du Pont De Nemours And Company | Thick film conductor compositions |
| US4540604A (en) * | 1983-08-25 | 1985-09-10 | E. I. Du Pont De Nemours And Company | Thick film conductor compositions |
-
1988
- 1988-02-12 JP JP2891088A patent/JP2554910B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4514321A (en) * | 1983-08-25 | 1985-04-30 | E. I. Du Pont De Nemours And Company | Thick film conductor compositions |
| US4540604A (en) * | 1983-08-25 | 1985-09-10 | E. I. Du Pont De Nemours And Company | Thick film conductor compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2554910B2 (en) | 1996-11-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20080822 |