JPS6461700A - Synchrotron radiation light exposing device - Google Patents

Synchrotron radiation light exposing device

Info

Publication number
JPS6461700A
JPS6461700A JP62218815A JP21881587A JPS6461700A JP S6461700 A JPS6461700 A JP S6461700A JP 62218815 A JP62218815 A JP 62218815A JP 21881587 A JP21881587 A JP 21881587A JP S6461700 A JPS6461700 A JP S6461700A
Authority
JP
Japan
Prior art keywords
window
valve
sensor
box
radiation light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62218815A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0511920B2 (2
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62218815A priority Critical patent/JPS6461700A/ja
Publication of JPS6461700A publication Critical patent/JPS6461700A/ja
Publication of JPH0511920B2 publication Critical patent/JPH0511920B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62218815A 1987-08-31 1987-08-31 Synchrotron radiation light exposing device Granted JPS6461700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218815A JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218815A JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Publications (2)

Publication Number Publication Date
JPS6461700A true JPS6461700A (en) 1989-03-08
JPH0511920B2 JPH0511920B2 (2) 1993-02-16

Family

ID=16725778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218815A Granted JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Country Status (1)

Country Link
JP (1) JPS6461700A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0422814B1 (en) * 1989-10-02 1999-03-17 Canon Kabushiki Kaisha Exposure apparatus
JP2015526770A (ja) * 2012-09-05 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光装置の光学素子を保護するためのブロック素子

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0422814B1 (en) * 1989-10-02 1999-03-17 Canon Kabushiki Kaisha Exposure apparatus
JP2015526770A (ja) * 2012-09-05 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光装置の光学素子を保護するためのブロック素子

Also Published As

Publication number Publication date
JPH0511920B2 (2) 1993-02-16

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