JPS6461908A - Mask for thin-film formation - Google Patents
Mask for thin-film formationInfo
- Publication number
- JPS6461908A JPS6461908A JP62219847A JP21984787A JPS6461908A JP S6461908 A JPS6461908 A JP S6461908A JP 62219847 A JP62219847 A JP 62219847A JP 21984787 A JP21984787 A JP 21984787A JP S6461908 A JPS6461908 A JP S6461908A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask
- film
- film formation
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To reduce the deflection of a mask at the time of the heating of a metallic substrate, and to prevent creeping between the mask and the surface, on which a film is formed, of the substrate of a deposit by coating both surfaces of the substrate with ceramic layers having a small thermal expansion coefficient. CONSTITUTION:Both surfaces of a mask substrate 1 composed of stainless steel, etc., are coated with ceramic films 2 consisting of nickel phosphide (PNi), boron nitride (BN), nickel oxide (NiO2), aluminum oxide (Al2O3), etc. A dipping method, in which the substrate is dipped into a solution and pulled up, an electroplating method or a vacuum deposition method is used as a coating method. A mask for film formation is loaded onto a susceptor 3 for a substrate, on which a film is shaped, the substrate 4, on which the film is shaped, such as glass is placed onto the susceptor 3, and lastly a hold-down plate 5 composed of stainless steel, etc., is superposed, thus fast sticking the substrate 4 and the mask 1 for film formation coated with the ceramic film 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62219847A JPH0666276B2 (en) | 1987-09-02 | 1987-09-02 | Mask for thin film production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62219847A JPH0666276B2 (en) | 1987-09-02 | 1987-09-02 | Mask for thin film production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6461908A true JPS6461908A (en) | 1989-03-08 |
| JPH0666276B2 JPH0666276B2 (en) | 1994-08-24 |
Family
ID=16741995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62219847A Expired - Lifetime JPH0666276B2 (en) | 1987-09-02 | 1987-09-02 | Mask for thin film production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0666276B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011501293A (en) * | 2007-10-21 | 2011-01-06 | ジーイー・インテリジェント・プラットフォームズ・インコーポレイテッド | Method and system for satisfying termination condition in motion control system |
| JP2014214366A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
| JP2014214367A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59177921A (en) * | 1983-03-28 | 1984-10-08 | Sanyo Electric Co Ltd | How to apply the film |
-
1987
- 1987-09-02 JP JP62219847A patent/JPH0666276B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59177921A (en) * | 1983-03-28 | 1984-10-08 | Sanyo Electric Co Ltd | How to apply the film |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011501293A (en) * | 2007-10-21 | 2011-01-06 | ジーイー・インテリジェント・プラットフォームズ・インコーポレイテッド | Method and system for satisfying termination condition in motion control system |
| JP2014214366A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
| JP2014214367A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0666276B2 (en) | 1994-08-24 |
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Legal Events
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| EXPY | Cancellation because of completion of term | ||
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