JPS6465097A - Manufacture of layer structure member made from oxide ceramic superconductive material - Google Patents
Manufacture of layer structure member made from oxide ceramic superconductive materialInfo
- Publication number
- JPS6465097A JPS6465097A JP63194296A JP19429688A JPS6465097A JP S6465097 A JPS6465097 A JP S6465097A JP 63194296 A JP63194296 A JP 63194296A JP 19429688 A JP19429688 A JP 19429688A JP S6465097 A JPS6465097 A JP S6465097A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- layer structure
- member made
- structure member
- oxide ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000463 material Substances 0.000 title 1
- 239000011224 oxide ceramic Substances 0.000 title 1
- 229910052574 oxide ceramic Inorganic materials 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/087—Oxides of copper or solid solutions thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
- H10N60/0688—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/729—Growing single crystal, e.g. epitaxy, bulk
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
- Y10S505/732—Evaporative coating with superconducting material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/742—Annealing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Containers, Films, And Cooling For Superconductive Devices (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19873726016 DE3726016A1 (de) | 1987-08-05 | 1987-08-05 | Verfahren zur herstellung eines schichtartigen aufbaus aus einem oxidkeramischen supralteitermaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6465097A true JPS6465097A (en) | 1989-03-10 |
Family
ID=6333124
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63194296A Pending JPS6465097A (en) | 1987-08-05 | 1988-08-02 | Manufacture of layer structure member made from oxide ceramic superconductive material |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4916114A (ja) |
| EP (1) | EP0302354B1 (ja) |
| JP (1) | JPS6465097A (ja) |
| DE (2) | DE3726016A1 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01164798A (ja) * | 1987-09-30 | 1989-06-28 | Kyocera Corp | 酸化物超電導体及びその製法 |
| JPH05279025A (ja) * | 1987-08-31 | 1993-10-26 | Semiconductor Energy Lab Co Ltd | 酸化物超電導薄膜 |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR910002311B1 (ko) * | 1987-02-27 | 1991-04-11 | 가부시기가이샤 히다찌세이사꾸쇼 | 초전도 디바이스 |
| US5011823A (en) * | 1987-06-12 | 1991-04-30 | At&T Bell Laboratories | Fabrication of oxide superconductors by melt growth method |
| FR2617644B1 (fr) * | 1987-07-03 | 1989-10-20 | Thomson Csf | Procede de realisation de dispositifs en couches minces de materiaux supraconducteurs et dispositifs realises par ce procede |
| DE3815183A1 (de) * | 1987-08-20 | 1989-03-02 | Siemens Ag | Supraleitendes gatterelement fuer eine logische schaltung |
| DE3844630C2 (ja) * | 1987-11-25 | 1990-11-22 | Mitsubishi Denki K.K., Tokio/Tokyo, Jp | |
| DE3834963A1 (de) * | 1988-01-27 | 1989-08-10 | Siemens Ag | Verfahren zur epitaktischen herstellung einer schicht aus einem metalloxidischen supraleitermaterial mit hoher sprungtemperatur |
| FR2629450B1 (fr) * | 1988-04-01 | 1992-04-30 | Rhone Poulenc Chimie | Materiaux supraconducteurs stabilises et leur procede d'obtention |
| US5084436A (en) * | 1989-01-31 | 1992-01-28 | Asahi Glass Company Ltd. | Oriented superconductor containing a dispersed non-superconducting phase |
| EP0385485A3 (en) * | 1989-03-03 | 1991-01-16 | Hitachi, Ltd. | Oxide superconductor, superconducting wire and coil using the same, and method of production thereof |
| US5116810A (en) * | 1989-10-16 | 1992-05-26 | American Superconductor Corporation | Process for making electrical connections to high temperature superconductors using a metallic precursor and the product made thereby |
| FR2656956B1 (fr) * | 1990-01-05 | 1997-01-24 | Centre Nat Rech Scient | Element de circuit electrique en materiau supraconducteur de type 2. |
| EP0671764A2 (en) * | 1990-10-31 | 1995-09-13 | Sumitomo Electric Industries, Ltd. | A process for fabricating a superconducting circuit |
| US5268530A (en) * | 1990-11-30 | 1993-12-07 | Ngk Insulators, Ltd. | Superconductive tube for magnetic shielding and manufacturing method therefor |
| EP0502787B1 (en) * | 1991-03-04 | 1996-08-14 | Sumitomo Electric Industries, Ltd. | A thin film of oxide superconductor possessing locally different crystal orientations and a processes for preparing the same |
| DE69302572T2 (de) * | 1992-03-13 | 1996-12-05 | Du Pont | Verfahren zur Herstellung von dünnen Ueberzügen aus anorganischen Oxiden kontrollierter Stöchiometrie |
| US5308800A (en) * | 1992-03-23 | 1994-05-03 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus and method for forming textured bulk high temperature superconducting materials |
| JP3008970B2 (ja) * | 1993-07-27 | 2000-02-14 | 財団法人国際超電導産業技術研究センター | Y123型結晶構造を有する酸化物結晶膜 |
| US6133050A (en) * | 1992-10-23 | 2000-10-17 | Symetrix Corporation | UV radiation process for making electronic devices having low-leakage-current and low-polarization fatigue |
| US5356474A (en) * | 1992-11-27 | 1994-10-18 | General Electric Company | Apparatus and method for making aligned Hi-Tc tape superconductors |
| EP0645621A3 (de) * | 1993-09-28 | 1995-11-08 | Siemens Ag | Sensoranordnung. |
| US5677265A (en) * | 1995-03-03 | 1997-10-14 | Northeastern University | Process for oxygenation of ceramic high Tc superconductors |
| US5578226A (en) * | 1995-07-18 | 1996-11-26 | Trw Inc. | Multi-layered superconductive interconnects |
| EP1104033B1 (de) * | 1999-11-26 | 2007-02-21 | European High Temperature Superconductors GmbH & Co. KG | Verfahren zur Erzeugung einer supraleitfähigen Schicht |
| DE60045370D1 (de) * | 1999-11-29 | 2011-01-27 | Fujikura Ltd | Polykristalliner dünner film und verfahren zu dessen herstellung, und supraleitendes oxid und verfahren zu dessen herstellung |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4316785A (en) * | 1979-11-05 | 1982-02-23 | Nippon Telegraph & Telephone Public Corporation | Oxide superconductor Josephson junction and fabrication method therefor |
| JPS61168530A (ja) * | 1985-01-21 | 1986-07-30 | Nippon Telegr & Teleph Corp <Ntt> | 酸化物超伝導材料およびその製造方法 |
-
1987
- 1987-08-05 DE DE19873726016 patent/DE3726016A1/de not_active Withdrawn
-
1988
- 1988-07-25 DE DE88111977T patent/DE3885367D1/de not_active Expired - Fee Related
- 1988-07-25 EP EP88111977A patent/EP0302354B1/de not_active Expired - Lifetime
- 1988-08-02 JP JP63194296A patent/JPS6465097A/ja active Pending
- 1988-08-02 US US07/227,365 patent/US4916114A/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05279025A (ja) * | 1987-08-31 | 1993-10-26 | Semiconductor Energy Lab Co Ltd | 酸化物超電導薄膜 |
| JPH01164798A (ja) * | 1987-09-30 | 1989-06-28 | Kyocera Corp | 酸化物超電導体及びその製法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4916114A (en) | 1990-04-10 |
| EP0302354B1 (de) | 1993-11-03 |
| EP0302354A3 (en) | 1990-04-18 |
| DE3726016A1 (de) | 1989-02-16 |
| EP0302354A2 (de) | 1989-02-08 |
| DE3885367D1 (de) | 1993-12-09 |
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