JPS646735A - Method and apparatus for measuring refractive index distribution - Google Patents
Method and apparatus for measuring refractive index distributionInfo
- Publication number
- JPS646735A JPS646735A JP15960187A JP15960187A JPS646735A JP S646735 A JPS646735 A JP S646735A JP 15960187 A JP15960187 A JP 15960187A JP 15960187 A JP15960187 A JP 15960187A JP S646735 A JPS646735 A JP S646735A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- prism
- medium
- substrate
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910003327 LiNbO3 Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
PURPOSE:To measure a refractive index distribution nondestructively at a high accuracy, by a method wherein a prism integrated with a light receiving element is put tight on a medium to calculate an execution refractive index of a medium at two points from a relationship between an angle of incidence of a laser light into the prism and intensity of reflected light on the bottom surface of the prism and changes in refractive index of the medium are determined by a numerical calculation using the refractive index. CONSTITUTION:A substrate 1 of a refractive index distribution measuring apparatus employs an LiNbO3 crystal to prepare a light waveguide 2 with the refractive index varying continuously in the depth of a substrate 1 by heat diffusion method. A prism 3 is put tightly on the waveguide 2 through an air layer. The prism 3 employs TiO2, is fixed on a holder 5 and the adhesion to the substrate 1 is adjusted with a set screw 7. The substrate 1 and the prism 3 are placed on a turntable 5 of a measuring device and a laser light from a light source 4 is made incident into the prism 3 at a specified angle of incidence to calculate an execution refractive index of the medium at two points from a relationship with intensity of reflection on the bottom surface of the prism 3. Thus, changes in the refractive index of the medium are determined by numerical calculation using the refractive index thus calculated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62159601A JPH0820336B2 (en) | 1987-06-29 | 1987-06-29 | Refractive index distribution measuring method and measuring apparatus therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62159601A JPH0820336B2 (en) | 1987-06-29 | 1987-06-29 | Refractive index distribution measuring method and measuring apparatus therefor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS646735A true JPS646735A (en) | 1989-01-11 |
| JPH0820336B2 JPH0820336B2 (en) | 1996-03-04 |
Family
ID=15697266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62159601A Expired - Lifetime JPH0820336B2 (en) | 1987-06-29 | 1987-06-29 | Refractive index distribution measuring method and measuring apparatus therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0820336B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02244106A (en) * | 1989-03-17 | 1990-09-28 | Hitachi Ltd | Method for measuring thin film optical constants and optical integrated circuits or semiconductor devices fabricated using the method |
| JP2006275568A (en) * | 2005-03-28 | 2006-10-12 | Institute Of Physical & Chemical Research | Method and apparatus for measuring photonic band structure of photonic crystal waveguide |
| CN103884490A (en) * | 2014-03-05 | 2014-06-25 | 内蒙古科技大学 | Method and device for measuring double-prism refractive index on basis of optical levers |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5643529A (en) * | 1979-09-18 | 1981-04-22 | Nec Corp | Measuring method of minute refractive index difference between optical waveguide line and its substrate |
| JPS6212840A (en) * | 1985-07-10 | 1987-01-21 | Morioka Shoji Kk | Method and instrument for measuring concentration of liquid to be examined |
-
1987
- 1987-06-29 JP JP62159601A patent/JPH0820336B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5643529A (en) * | 1979-09-18 | 1981-04-22 | Nec Corp | Measuring method of minute refractive index difference between optical waveguide line and its substrate |
| JPS6212840A (en) * | 1985-07-10 | 1987-01-21 | Morioka Shoji Kk | Method and instrument for measuring concentration of liquid to be examined |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02244106A (en) * | 1989-03-17 | 1990-09-28 | Hitachi Ltd | Method for measuring thin film optical constants and optical integrated circuits or semiconductor devices fabricated using the method |
| JP2006275568A (en) * | 2005-03-28 | 2006-10-12 | Institute Of Physical & Chemical Research | Method and apparatus for measuring photonic band structure of photonic crystal waveguide |
| CN103884490A (en) * | 2014-03-05 | 2014-06-25 | 内蒙古科技大学 | Method and device for measuring double-prism refractive index on basis of optical levers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0820336B2 (en) | 1996-03-04 |
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