JPS6471133A - Device for manufacturing semiconductor - Google Patents

Device for manufacturing semiconductor

Info

Publication number
JPS6471133A
JPS6471133A JP22649687A JP22649687A JPS6471133A JP S6471133 A JPS6471133 A JP S6471133A JP 22649687 A JP22649687 A JP 22649687A JP 22649687 A JP22649687 A JP 22649687A JP S6471133 A JPS6471133 A JP S6471133A
Authority
JP
Japan
Prior art keywords
tank
pure water
resistivity
solenoid valve
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22649687A
Other languages
Japanese (ja)
Inventor
Hideaki Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP22649687A priority Critical patent/JPS6471133A/en
Publication of JPS6471133A publication Critical patent/JPS6471133A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To reduce the usage of pure water in the pure water washing of a wafer, and to obtain a positive washing effect by controlling the quantity of pure water supplied in a water washing tank on the basis of resistivity detected by a resistivity detecting cell. CONSTITUTION:A first tank 102 adjusts the temperature of chemicals injected at a fixed temperature by a heater 123 for the first tank and a liquid- temperature detecting sensor 124 for the first tank. The bottom of the tank 102 is provided with a drainage means opened and closed by a drainage solenoid valve 121 for the first tank. When a carrier is carried into a second tank 103, a pure water supply solenoid valve 118 for the second tank and a pure water saving solenoid valve 119 for the second tank are turned ON and operated. A resistivity/conductivity detecting cell 13 measures the data of pure water in the tank 103 until the carrier is carried out after a time when pure water in the tank 103 overflows. When the result of measurement higher than resistivity recovery data is acquired, the valve 118 is turned OFF, and pure water is fed only by a pure water saving solenoid valve 11 for the second tank. Accordingly, a positive washing effect is obtained.
JP22649687A 1987-09-11 1987-09-11 Device for manufacturing semiconductor Pending JPS6471133A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22649687A JPS6471133A (en) 1987-09-11 1987-09-11 Device for manufacturing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22649687A JPS6471133A (en) 1987-09-11 1987-09-11 Device for manufacturing semiconductor

Publications (1)

Publication Number Publication Date
JPS6471133A true JPS6471133A (en) 1989-03-16

Family

ID=16846018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22649687A Pending JPS6471133A (en) 1987-09-11 1987-09-11 Device for manufacturing semiconductor

Country Status (1)

Country Link
JP (1) JPS6471133A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02285635A (en) * 1989-04-26 1990-11-22 Matsushita Electric Ind Co Ltd Semiconductor wafer carrier cleaning device
JP2016049534A (en) * 2014-08-29 2016-04-11 AvanStrate株式会社 Manufacturing method of glass substrate, and manufacturing device of the glass substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02285635A (en) * 1989-04-26 1990-11-22 Matsushita Electric Ind Co Ltd Semiconductor wafer carrier cleaning device
JP2016049534A (en) * 2014-08-29 2016-04-11 AvanStrate株式会社 Manufacturing method of glass substrate, and manufacturing device of the glass substrate

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