JPS6473203A - Inspection of surface foreign matter - Google Patents

Inspection of surface foreign matter

Info

Publication number
JPS6473203A
JPS6473203A JP23022287A JP23022287A JPS6473203A JP S6473203 A JPS6473203 A JP S6473203A JP 23022287 A JP23022287 A JP 23022287A JP 23022287 A JP23022287 A JP 23022287A JP S6473203 A JPS6473203 A JP S6473203A
Authority
JP
Japan
Prior art keywords
foreign matter
light reflecting
reflecting film
dimension
magnified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23022287A
Other languages
Japanese (ja)
Inventor
Kazuo Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP23022287A priority Critical patent/JPS6473203A/en
Publication of JPS6473203A publication Critical patent/JPS6473203A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To certainly protect foreign matter, by applying and forming a light reflecting film to the surface of an object to be inspected having foreign matter adhered thereto and measuring the foreign matter magnified by said light reflecting film. CONSTITUTION:A wafer 31 being an object to be inspected has a mirror like surface and foreign matter 32 having a dimension L0 is adhered to said surface. A light reflecting film 3 having a predetermined film thickness T0 is applied and formed to the entire surface of the wafer 3 of this state. The dimension of the foreign matter 32 covered with the light reflecting film 33 is apparently magnified to become a dimension L1. The foreign matter 32 thus magnified in its apparent dimension by the attachment of the light reflecting film 33 is detected by an inspection apparatus and the real dimension of the foreign matter 32 not containing the light reflecting film 33 is calculated from the apparent dimension of the foreign matter 32 containing the light reflecting film 33.
JP23022287A 1987-09-14 1987-09-14 Inspection of surface foreign matter Pending JPS6473203A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23022287A JPS6473203A (en) 1987-09-14 1987-09-14 Inspection of surface foreign matter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23022287A JPS6473203A (en) 1987-09-14 1987-09-14 Inspection of surface foreign matter

Publications (1)

Publication Number Publication Date
JPS6473203A true JPS6473203A (en) 1989-03-17

Family

ID=16904467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23022287A Pending JPS6473203A (en) 1987-09-14 1987-09-14 Inspection of surface foreign matter

Country Status (1)

Country Link
JP (1) JPS6473203A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160121410A (en) * 2015-04-09 2016-10-19 도쿄엘렉트론가부시키가이샤 Foreign substance removal apparatus, foreign substance removal method, separation apparatus, foreign substance detection method, and foreign substance detection apparatus
JP2016200480A (en) * 2015-04-09 2016-12-01 東京エレクトロン株式会社 Foreign matter detection method, foreign matter detection device and peeling device
JP2016212009A (en) * 2015-05-12 2016-12-15 信越半導体株式会社 Defect inspection method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160121410A (en) * 2015-04-09 2016-10-19 도쿄엘렉트론가부시키가이샤 Foreign substance removal apparatus, foreign substance removal method, separation apparatus, foreign substance detection method, and foreign substance detection apparatus
JP2016200480A (en) * 2015-04-09 2016-12-01 東京エレクトロン株式会社 Foreign matter detection method, foreign matter detection device and peeling device
US10160015B2 (en) 2015-04-09 2018-12-25 Tokyo Electron Limited Foreign substance removal apparatus and foreign substance detection apparatus
US20190105691A1 (en) * 2015-04-09 2019-04-11 Tokyo Electron Limited Foreign substance removal apparatus and foreign substance detection apparatus
US10946419B2 (en) 2015-04-09 2021-03-16 Tokyo Electron Limited Foreign substance removal apparatus and foreign substance detection apparatus
JP2016212009A (en) * 2015-05-12 2016-12-15 信越半導体株式会社 Defect inspection method

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