JPS64738A - Heat treatment of semiconductor wafer - Google Patents

Heat treatment of semiconductor wafer

Info

Publication number
JPS64738A
JPS64738A JP63121704A JP12170488A JPS64738A JP S64738 A JPS64738 A JP S64738A JP 63121704 A JP63121704 A JP 63121704A JP 12170488 A JP12170488 A JP 12170488A JP S64738 A JPS64738 A JP S64738A
Authority
JP
Japan
Prior art keywords
chamber
flowed
baking chamber
gas
baking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63121704A
Other languages
Japanese (ja)
Other versions
JPH0424855B2 (en
JPH01738A (en
Inventor
Haruo Amada
Hiroshi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63-121704A priority Critical patent/JPH01738A/en
Priority claimed from JP63-121704A external-priority patent/JPH01738A/en
Publication of JPS64738A publication Critical patent/JPS64738A/en
Publication of JPH01738A publication Critical patent/JPH01738A/en
Publication of JPH0424855B2 publication Critical patent/JPH0424855B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent the adhesion of a foreign matter onto a photo-resist film formed to a semiconductor wafer, and to conduct heat treatment having excellent yield by expelling a foreign matter in a drive section outside a treating chamber while obviating the intrusion of the outside air into the treating chamber.
CONSTITUTION: An inert gas fed into a circulating chamber 8 from a gas supply pipe 4 is admitted into a ventilating chamber 7 through a prefilter 14, and purified through a main filter 15 and flowed through a baking chamber 8. A gas flow is flowed downward by the action of a mesh plate 5 in the baking chamber 8, and changed into the so-called downflow. Foreign matters generated from a drive section for a carrying means 16 are carried by a flow and moved to a lower section at that time, flowed through an exhaust chamber 9 through a mead plate 6, and flowed through a circulating chamber 3 again. The gas is circulated by the same path again, and flowed into the baking chamber 8 while being respectively purified by the prefilter 14 and the main filter 15, thus removing foreign matters in the baking chamber 8.
COPYRIGHT: (C)1989,JPO&Japio
JP63-121704A 1988-05-20 Heat treatment method for semiconductor wafers Granted JPH01738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63-121704A JPH01738A (en) 1988-05-20 Heat treatment method for semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63-121704A JPH01738A (en) 1988-05-20 Heat treatment method for semiconductor wafers

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11019880A Division JPS5735319A (en) 1980-08-13 1980-08-13 Heat treatment device

Publications (3)

Publication Number Publication Date
JPS64738A true JPS64738A (en) 1989-01-05
JPH01738A JPH01738A (en) 1989-01-05
JPH0424855B2 JPH0424855B2 (en) 1992-04-28

Family

ID=

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007158088A (en) * 2005-12-06 2007-06-21 Tokyo Electron Ltd Heat treatment apparatus, heat treatment method, control program, computer-readable storage medium
WO2012141081A1 (en) * 2011-04-14 2012-10-18 シャープ株式会社 Apparatus for producing display panel substrate
KR20150048806A (en) * 2012-08-31 2015-05-07 오엘리콘 썰피스 솔루션즈 아게, 츠르바크 System for the radiation treatment of substrates

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (en) * 1972-03-21 1973-12-07
JPS5148969U (en) * 1974-10-11 1976-04-13
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS5218665U (en) * 1975-07-25 1977-02-09
JPS52104067A (en) * 1976-02-27 1977-09-01 Hitachi Ltd Dust proof baking method
JPS5320867A (en) * 1976-08-11 1978-02-25 Hitachi Ltd Housing and conveying machine of articles
JPS5427770A (en) * 1977-08-04 1979-03-02 Takasago Thermal Engineering Constant temperature clean bench
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895638A (en) * 1972-03-21 1973-12-07
JPS5148969U (en) * 1974-10-11 1976-04-13
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS5218665U (en) * 1975-07-25 1977-02-09
JPS52104067A (en) * 1976-02-27 1977-09-01 Hitachi Ltd Dust proof baking method
JPS5320867A (en) * 1976-08-11 1978-02-25 Hitachi Ltd Housing and conveying machine of articles
JPS5427770A (en) * 1977-08-04 1979-03-02 Takasago Thermal Engineering Constant temperature clean bench
JPS54158445A (en) * 1978-06-05 1979-12-14 Mitsubishi Electric Corp Sintering of photosensitive resin
JPS5595332A (en) * 1979-01-12 1980-07-19 Toshiba Corp Dust removing system for conveyor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007158088A (en) * 2005-12-06 2007-06-21 Tokyo Electron Ltd Heat treatment apparatus, heat treatment method, control program, computer-readable storage medium
WO2012141081A1 (en) * 2011-04-14 2012-10-18 シャープ株式会社 Apparatus for producing display panel substrate
KR20150048806A (en) * 2012-08-31 2015-05-07 오엘리콘 썰피스 솔루션즈 아게, 츠르바크 System for the radiation treatment of substrates
JP2015536809A (en) * 2012-08-31 2015-12-24 エリコン サーフェス ソリューションズ アーゲー、 トリュープバッハ Substrate irradiation processing equipment

Also Published As

Publication number Publication date
JPH0424855B2 (en) 1992-04-28

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