JPS6476720A - Illumination optical system for semiconductor exposure device - Google Patents

Illumination optical system for semiconductor exposure device

Info

Publication number
JPS6476720A
JPS6476720A JP62233493A JP23349387A JPS6476720A JP S6476720 A JPS6476720 A JP S6476720A JP 62233493 A JP62233493 A JP 62233493A JP 23349387 A JP23349387 A JP 23349387A JP S6476720 A JPS6476720 A JP S6476720A
Authority
JP
Japan
Prior art keywords
integrator
illumination
reticle
optical axis
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62233493A
Other languages
English (en)
Other versions
JPH07105330B2 (ja
Inventor
Yoichi Iba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP62233493A priority Critical patent/JPH07105330B2/ja
Publication of JPS6476720A publication Critical patent/JPS6476720A/ja
Publication of JPH07105330B2 publication Critical patent/JPH07105330B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
JP62233493A 1987-09-17 1987-09-17 半導体露光装置の照明光学系 Expired - Fee Related JPH07105330B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62233493A JPH07105330B2 (ja) 1987-09-17 1987-09-17 半導体露光装置の照明光学系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62233493A JPH07105330B2 (ja) 1987-09-17 1987-09-17 半導体露光装置の照明光学系

Publications (2)

Publication Number Publication Date
JPS6476720A true JPS6476720A (en) 1989-03-22
JPH07105330B2 JPH07105330B2 (ja) 1995-11-13

Family

ID=16955880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62233493A Expired - Fee Related JPH07105330B2 (ja) 1987-09-17 1987-09-17 半導体露光装置の照明光学系

Country Status (1)

Country Link
JP (1) JPH07105330B2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5763853A (en) * 1994-04-20 1998-06-09 Hitachi Construction Machinery Co., Ltd. Laser processing apparatus, laser processing method and dam bar processing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332555A (ja) * 1986-07-25 1988-02-12 Nippon Telegr & Teleph Corp <Ntt> 露光装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332555A (ja) * 1986-07-25 1988-02-12 Nippon Telegr & Teleph Corp <Ntt> 露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5763853A (en) * 1994-04-20 1998-06-09 Hitachi Construction Machinery Co., Ltd. Laser processing apparatus, laser processing method and dam bar processing method

Also Published As

Publication number Publication date
JPH07105330B2 (ja) 1995-11-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees