JPS6480962A - Method and device for development processing of photosensitive planographic plate - Google Patents

Method and device for development processing of photosensitive planographic plate

Info

Publication number
JPS6480962A
JPS6480962A JP23954087A JP23954087A JPS6480962A JP S6480962 A JPS6480962 A JP S6480962A JP 23954087 A JP23954087 A JP 23954087A JP 23954087 A JP23954087 A JP 23954087A JP S6480962 A JPS6480962 A JP S6480962A
Authority
JP
Japan
Prior art keywords
plate
development processing
temp
section
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23954087A
Other languages
Japanese (ja)
Inventor
Mieji Nakano
Masabumi Uehara
Akira Nogami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP23954087A priority Critical patent/JPS6480962A/en
Publication of JPS6480962A publication Critical patent/JPS6480962A/en
Pending legal-status Critical Current

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Landscapes

  • Rotary Presses (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain a PS plate having stable and good finish regardless of the temp. of the outdoor air by using a pair of rollers to heat the PS plate prior to development of an exposed photosensitive planographic printing plate (PS plate). CONSTITUTION:A pair of rollers 3, 3 having heating means are provided in front of a developing section 1' of a development processing device consisting of the developing section 1', a rinsing section 2' and a nonsensitizing section 3'. The influence by the various outdoor air temp. is suppressed by adequately controlling the temp. of the PS plates carried into the device. The influence on the liquid temp. of the developing soln. coated on the development processing surface of the PS plate is thereby eliminated and the decrease of the liquid temp. by the latent heat of the evaporation of the developing soln. is suppressed and, therefore, the fluctuation in the quality of the PS plate after the development processing is eliminated and the PS plate having the stable quality is obtd.
JP23954087A 1987-09-24 1987-09-24 Method and device for development processing of photosensitive planographic plate Pending JPS6480962A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23954087A JPS6480962A (en) 1987-09-24 1987-09-24 Method and device for development processing of photosensitive planographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23954087A JPS6480962A (en) 1987-09-24 1987-09-24 Method and device for development processing of photosensitive planographic plate

Publications (1)

Publication Number Publication Date
JPS6480962A true JPS6480962A (en) 1989-03-27

Family

ID=17046328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23954087A Pending JPS6480962A (en) 1987-09-24 1987-09-24 Method and device for development processing of photosensitive planographic plate

Country Status (1)

Country Link
JP (1) JPS6480962A (en)

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