JPS6482032A - Photosensitive resin composition for screen printing - Google Patents

Photosensitive resin composition for screen printing

Info

Publication number
JPS6482032A
JPS6482032A JP24051287A JP24051287A JPS6482032A JP S6482032 A JPS6482032 A JP S6482032A JP 24051287 A JP24051287 A JP 24051287A JP 24051287 A JP24051287 A JP 24051287A JP S6482032 A JPS6482032 A JP S6482032A
Authority
JP
Japan
Prior art keywords
formulas
100pts
resin composition
group
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24051287A
Other languages
Japanese (ja)
Inventor
Susumu Ueno
Noboru Nakanishi
Morizo Nakazato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP24051287A priority Critical patent/JPS6482032A/en
Publication of JPS6482032A publication Critical patent/JPS6482032A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To improve the printability, the water resisting property and the shelf-life stability of a printing plate by incorporating a specified organopolysiloxane in the titled composition. CONSTITUTION:Said organopolysiloxane contains one or more of each siloxane unit shown by formulas I and II in a molecule. In the formulas, R<1> is alkylene group, R<2> and R<3> are each a (un)substd. monovalent hydrocarbon group, (a) and (b) are each 0, 1 or 2, (c) is 1, 2 or 3. The titled composition comprises 100pts.wt. a resin mixture which is composed of 0.1-50wt.% said polysiloxane and 99.9-50wt.% polyvinyl alcohol, 1-100pts.wt. of a nonsilicone type compd. contg. an active hydrogen atom. and an unsatd. group (such as tetramethylol methane triacrylate), 0.01-20pts.wt. a photocrosslinking agent (such as diazo resin), 0-10pts.wt. an optical sensitizer (such as ethylbenzophenone) and 40-800 pts.wt. water.
JP24051287A 1987-09-25 1987-09-25 Photosensitive resin composition for screen printing Pending JPS6482032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24051287A JPS6482032A (en) 1987-09-25 1987-09-25 Photosensitive resin composition for screen printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24051287A JPS6482032A (en) 1987-09-25 1987-09-25 Photosensitive resin composition for screen printing

Publications (1)

Publication Number Publication Date
JPS6482032A true JPS6482032A (en) 1989-03-28

Family

ID=17060620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24051287A Pending JPS6482032A (en) 1987-09-25 1987-09-25 Photosensitive resin composition for screen printing

Country Status (1)

Country Link
JP (1) JPS6482032A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0375653A (en) * 1989-08-17 1991-03-29 Aisero Kagaku Kk Photosensitive resin composition
JPH10319597A (en) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp Photosensitive silicone ladder resin composition, pattern transfer method for transferring a pattern to the resin composition, and semiconductor device using the above resin composition
JP2008233669A (en) * 2007-03-22 2008-10-02 Murakami:Kk Photosensitive resin composition, photosensitive film, and stencil for screen printing
US20100305231A1 (en) * 2009-06-02 2010-12-02 The University Of Akron Polymer networks, process for producing same, and products made therefrom

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52150103A (en) * 1976-06-07 1977-12-13 Shinetsu Chemical Co Method of producing lithographic printing form and press plate
JPS539602A (en) * 1976-07-14 1978-01-28 Dainippon Printing Co Ltd Lithographic press plate
JPS5317405A (en) * 1976-07-30 1978-02-17 Dainippon Printing Co Ltd Lithographic press plate
JPS5351004A (en) * 1976-10-18 1978-05-10 Aicello Chemical Co Composition of photosensitive resin plate
JPS6010245A (en) * 1983-06-30 1985-01-19 Agency Of Ind Science & Technol Photosensitive resin composition
JPS60108841A (en) * 1983-11-18 1985-06-14 Mitsubishi Electric Corp Photosensitive heat resistant material

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52150103A (en) * 1976-06-07 1977-12-13 Shinetsu Chemical Co Method of producing lithographic printing form and press plate
JPS539602A (en) * 1976-07-14 1978-01-28 Dainippon Printing Co Ltd Lithographic press plate
JPS5317405A (en) * 1976-07-30 1978-02-17 Dainippon Printing Co Ltd Lithographic press plate
JPS5351004A (en) * 1976-10-18 1978-05-10 Aicello Chemical Co Composition of photosensitive resin plate
JPS6010245A (en) * 1983-06-30 1985-01-19 Agency Of Ind Science & Technol Photosensitive resin composition
JPS60108841A (en) * 1983-11-18 1985-06-14 Mitsubishi Electric Corp Photosensitive heat resistant material

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0375653A (en) * 1989-08-17 1991-03-29 Aisero Kagaku Kk Photosensitive resin composition
JPH10319597A (en) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp Photosensitive silicone ladder resin composition, pattern transfer method for transferring a pattern to the resin composition, and semiconductor device using the above resin composition
JP2008233669A (en) * 2007-03-22 2008-10-02 Murakami:Kk Photosensitive resin composition, photosensitive film, and stencil for screen printing
US20100305231A1 (en) * 2009-06-02 2010-12-02 The University Of Akron Polymer networks, process for producing same, and products made therefrom
US8258200B2 (en) * 2009-06-02 2012-09-04 The University Of Akron Polymer networks, process for producing same, and products made therefrom

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