JPS6484407A - Manufacture of thin film magnetic head - Google Patents

Manufacture of thin film magnetic head

Info

Publication number
JPS6484407A
JPS6484407A JP24064587A JP24064587A JPS6484407A JP S6484407 A JPS6484407 A JP S6484407A JP 24064587 A JP24064587 A JP 24064587A JP 24064587 A JP24064587 A JP 24064587A JP S6484407 A JPS6484407 A JP S6484407A
Authority
JP
Japan
Prior art keywords
electrode
substrate
holder
insulation
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24064587A
Other languages
Japanese (ja)
Other versions
JPH0715731B2 (en
Inventor
Yoshio Takahashi
Ikuo Ozasa
Kazuo Nakamura
Shoichi Tsutsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62240645A priority Critical patent/JPH0715731B2/en
Publication of JPS6484407A publication Critical patent/JPS6484407A/en
Publication of JPH0715731B2 publication Critical patent/JPH0715731B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To prevent abnormal discharge between a substrate and a holder by performing sputtering while keeping the potentials of the metallic holder and the surface of the insulation substrate nearly equal. CONSTITUTION:A target 23 connected to a high frequency power source 22 is provided in a vacuum housing 21, and an electrode 24 is provided so as to be opposed to it. The electrode 24 is usually earthed through a lead wire 29, and the insulation substrate 25 is placed on the electrode 24, and the substrate 25 is fixed and held to the electrode 24 by the metallic holder 26. In a case that the sputtering is performed, it is performed in the state that the lead wire 29 is cut off at a point X so as to disconnected it from earthing. Thus, the electrode 24 is cut off from electric conduction from an external part together with the insulation substrate 25 and the metallic holder 26, placed on it, and comes into a floating state electrically. By performing the sputtering in this state, a metallic film (or insulation film) 27 is formed on the insulation substrate 25, and an electron 28 is charged on the surface during the formation, but since the electrode 24 is being disconnected from the earthing at that time, the potentials of the mettalic film (insulation film) 27 and the holder 26 on the insulation substrate, placed on the electrode 24, are nearly equal, and the discharge never occurs between both.
JP62240645A 1987-09-28 1987-09-28 Method of manufacturing thin film magnetic head Expired - Fee Related JPH0715731B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62240645A JPH0715731B2 (en) 1987-09-28 1987-09-28 Method of manufacturing thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62240645A JPH0715731B2 (en) 1987-09-28 1987-09-28 Method of manufacturing thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS6484407A true JPS6484407A (en) 1989-03-29
JPH0715731B2 JPH0715731B2 (en) 1995-02-22

Family

ID=17062577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62240645A Expired - Fee Related JPH0715731B2 (en) 1987-09-28 1987-09-28 Method of manufacturing thin film magnetic head

Country Status (1)

Country Link
JP (1) JPH0715731B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3735462B2 (en) * 1998-03-30 2006-01-18 株式会社シンクロン Method and apparatus for forming metal oxide optical thin film
JP3735461B2 (en) * 1998-03-27 2006-01-18 株式会社シンクロン Compound metal compound thin film forming method and thin film forming apparatus therefor
JP3738154B2 (en) * 1999-06-30 2006-01-25 株式会社シンクロン Thin film forming method of composite metal compound and thin film forming apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137148A (en) * 1974-09-25 1976-03-29 Toyo Boseki FUHOWAHORIESUTERUJUSHISOSEIBUTSU
JPS60185656U (en) * 1984-05-21 1985-12-09 株式会社豊田中央研究所 High frequency sputtering device
JPS6145918A (en) * 1984-08-09 1986-03-06 Nec Kansai Ltd Measuring method of thickness of thin film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137148A (en) * 1974-09-25 1976-03-29 Toyo Boseki FUHOWAHORIESUTERUJUSHISOSEIBUTSU
JPS60185656U (en) * 1984-05-21 1985-12-09 株式会社豊田中央研究所 High frequency sputtering device
JPS6145918A (en) * 1984-08-09 1986-03-06 Nec Kansai Ltd Measuring method of thickness of thin film

Also Published As

Publication number Publication date
JPH0715731B2 (en) 1995-02-22

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees