JPS6484407A - Manufacture of thin film magnetic head - Google Patents
Manufacture of thin film magnetic headInfo
- Publication number
- JPS6484407A JPS6484407A JP24064587A JP24064587A JPS6484407A JP S6484407 A JPS6484407 A JP S6484407A JP 24064587 A JP24064587 A JP 24064587A JP 24064587 A JP24064587 A JP 24064587A JP S6484407 A JPS6484407 A JP S6484407A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- substrate
- holder
- insulation
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
Abstract
PURPOSE:To prevent abnormal discharge between a substrate and a holder by performing sputtering while keeping the potentials of the metallic holder and the surface of the insulation substrate nearly equal. CONSTITUTION:A target 23 connected to a high frequency power source 22 is provided in a vacuum housing 21, and an electrode 24 is provided so as to be opposed to it. The electrode 24 is usually earthed through a lead wire 29, and the insulation substrate 25 is placed on the electrode 24, and the substrate 25 is fixed and held to the electrode 24 by the metallic holder 26. In a case that the sputtering is performed, it is performed in the state that the lead wire 29 is cut off at a point X so as to disconnected it from earthing. Thus, the electrode 24 is cut off from electric conduction from an external part together with the insulation substrate 25 and the metallic holder 26, placed on it, and comes into a floating state electrically. By performing the sputtering in this state, a metallic film (or insulation film) 27 is formed on the insulation substrate 25, and an electron 28 is charged on the surface during the formation, but since the electrode 24 is being disconnected from the earthing at that time, the potentials of the mettalic film (insulation film) 27 and the holder 26 on the insulation substrate, placed on the electrode 24, are nearly equal, and the discharge never occurs between both.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62240645A JPH0715731B2 (en) | 1987-09-28 | 1987-09-28 | Method of manufacturing thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62240645A JPH0715731B2 (en) | 1987-09-28 | 1987-09-28 | Method of manufacturing thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6484407A true JPS6484407A (en) | 1989-03-29 |
| JPH0715731B2 JPH0715731B2 (en) | 1995-02-22 |
Family
ID=17062577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62240645A Expired - Fee Related JPH0715731B2 (en) | 1987-09-28 | 1987-09-28 | Method of manufacturing thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0715731B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3735462B2 (en) * | 1998-03-30 | 2006-01-18 | 株式会社シンクロン | Method and apparatus for forming metal oxide optical thin film |
| JP3735461B2 (en) * | 1998-03-27 | 2006-01-18 | 株式会社シンクロン | Compound metal compound thin film forming method and thin film forming apparatus therefor |
| JP3738154B2 (en) * | 1999-06-30 | 2006-01-25 | 株式会社シンクロン | Thin film forming method of composite metal compound and thin film forming apparatus |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5137148A (en) * | 1974-09-25 | 1976-03-29 | Toyo Boseki | FUHOWAHORIESUTERUJUSHISOSEIBUTSU |
| JPS60185656U (en) * | 1984-05-21 | 1985-12-09 | 株式会社豊田中央研究所 | High frequency sputtering device |
| JPS6145918A (en) * | 1984-08-09 | 1986-03-06 | Nec Kansai Ltd | Measuring method of thickness of thin film |
-
1987
- 1987-09-28 JP JP62240645A patent/JPH0715731B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5137148A (en) * | 1974-09-25 | 1976-03-29 | Toyo Boseki | FUHOWAHORIESUTERUJUSHISOSEIBUTSU |
| JPS60185656U (en) * | 1984-05-21 | 1985-12-09 | 株式会社豊田中央研究所 | High frequency sputtering device |
| JPS6145918A (en) * | 1984-08-09 | 1986-03-06 | Nec Kansai Ltd | Measuring method of thickness of thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0715731B2 (en) | 1995-02-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |