JPS6488400A - Synchrotron radiation light exposing device - Google Patents

Synchrotron radiation light exposing device

Info

Publication number
JPS6488400A
JPS6488400A JP62248355A JP24835587A JPS6488400A JP S6488400 A JPS6488400 A JP S6488400A JP 62248355 A JP62248355 A JP 62248355A JP 24835587 A JP24835587 A JP 24835587A JP S6488400 A JPS6488400 A JP S6488400A
Authority
JP
Japan
Prior art keywords
radiation light
atmosphere
window
synchrotron radiation
filled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62248355A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0511651B2 (2
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62248355A priority Critical patent/JPS6488400A/ja
Publication of JPS6488400A publication Critical patent/JPS6488400A/ja
Publication of JPH0511651B2 publication Critical patent/JPH0511651B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
JP62248355A 1987-09-30 1987-09-30 Synchrotron radiation light exposing device Granted JPS6488400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62248355A JPS6488400A (en) 1987-09-30 1987-09-30 Synchrotron radiation light exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62248355A JPS6488400A (en) 1987-09-30 1987-09-30 Synchrotron radiation light exposing device

Publications (2)

Publication Number Publication Date
JPS6488400A true JPS6488400A (en) 1989-04-03
JPH0511651B2 JPH0511651B2 (2) 1993-02-16

Family

ID=17176868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62248355A Granted JPS6488400A (en) 1987-09-30 1987-09-30 Synchrotron radiation light exposing device

Country Status (1)

Country Link
JP (1) JPS6488400A (2)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034255A (ja) * 1983-08-01 1985-02-21 Daifuku Co Ltd 搬送ワ−クに対する作業方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034255A (ja) * 1983-08-01 1985-02-21 Daifuku Co Ltd 搬送ワ−クに対する作業方法

Also Published As

Publication number Publication date
JPH0511651B2 (2) 1993-02-16

Similar Documents

Publication Publication Date Title
GB8827511D0 (en) Method & apparatus for blowing optical fibre member
JPS57109235A (en) Sealing work
GB1533201A (en) Respiratory apparatus
DE3272265D1 (en) Method of stabilizing a balloon at altitude, and atmospheric balloons adapted for putting this method into use
ES548787A0 (es) Aparato para el tratamiento de las deficiencias respirato- rias de un paciente
JPS6488400A (en) Synchrotron radiation light exposing device
GB1530546A (en) Device for measuring the concentration of gas
ES2085128T3 (es) Procedimiento y dispositivo de distribucion de dosis de liquidos, principalmente de gas licuado.
JPS52100277A (en) Absorption photometer
ES439878A1 (es) Procedimiento de tratamiento de una mezcla de aire con gasesraros.
JPS6461700A (en) Synchrotron radiation light exposing device
DE3167941D1 (en) Process and apparatus for adding small measured amounts of a harmful gas to a carrier gas
JPS5338716A (en) Surface treatment of inorganic fiber
JPS5614933A (en) Sample inspecting device
JPS5421524A (en) Gas monitoring device for transformer
EP0363913A3 (en) Reusable oxygen inhaler
SU1815889A1 (ru) Способ газолазерной резки
JPH0334196Y2 (2)
JPS543700A (en) Processing method of radioactive gas contaminated air emitted from desalting unit
JPS52129834A (en) Air fuel ratio feedback controller
JPS52129140A (en) Controlling apparatus for elevators
JPS5235175A (en) Low temperature adsorption apparatus
JPS5390507A (en) Exhaust gas energy recovery apparatus
GB2006014A (en) Method and apparatus for reducing the concentration of ozone
JPS52129835A (en) Air fuel ratio feedback device